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    • 7. 发明授权
    • Image recording material
    • 图像记录材料
    • US07288360B2
    • 2007-10-30
    • US10828172
    • 2004-04-21
    • Kazuto KunitaRyuki Kakino
    • Kazuto KunitaRyuki Kakino
    • G03F7/004
    • B41C1/1008B41C1/1016B41C2201/04B41C2210/02B41C2210/06B41C2210/14B41C2210/22B41C2210/24B41C2210/262
    • The infrared laser-compatible positive-type image recording materials according to the present invention include a support and a photo/thermosensitive layer formed on the support; and the photo/thermosensitive layer contains an alkali-soluble resin (A), a photothermal converting substance (B) and an ester compound (C) represented by the following General Formula (I), and increases solubility thereof to an alkaline developer as a result exposure to an infrared laser. In the following formula, R1 represents a hydrocarbon group having a pKa of R1OH in a range of 3 to 10; and R2 represents a hydrocarbon group or a substituted carbonyl group. The invention provides image recording materials compatible with high-output lasers that enable highly-sensitive direct plate making by using digital data from a computer or the like, and provide images excellent in development latitude, contrast, and resolution
    • 根据本发明的红外激光兼容正型图像记录材料包括支撑体和形成在支撑体上的光/热敏层; 光敏层包含由以下通式(I)表示的碱溶性树脂(A),光热转换物质(B)和酯化合物(C),并且其对碱性显影剂的溶解度增加为 结果暴露于红外激光。 在下式中,R 1表示具有3至10个范围内的R 0 OH的pKa的烃基; R 2表示烃基或取代的羰基。 本发明提供与高输出激光器兼容的图像记录材料,其通过使用来自计算机等的数字数据实现高灵敏度的直接制版,并且提供优异的显影纬度,对比度和分辨率的图像
    • 10. 发明申请
    • RESIST COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH
    • 耐腐蚀组合物及其形成方法
    • US20100028804A1
    • 2010-02-04
    • US12535240
    • 2009-08-04
    • Kaoru IWATOKazuto Kunita
    • Kaoru IWATOKazuto Kunita
    • G03F7/20G03F7/004
    • G03F7/0046G03F7/0045G03F7/0397G03F7/0757G03F7/0758G03F7/2041G03F7/30
    • A resist composition comprises two or more polymers containing a first polymer and a second polymer and a compound that when exposed to actinic rays or radiation, generates an acid, wherein when the resist composition is formed into a dry resist film, the mixing ratios of at least the first and second polymers in the resist film exhibit a gradient distribution such that the mixing ratios continuously change in entirety or partially in the direction of the depth from the surface of the resist film on the air side toward a support, and wherein the mixing ratio of the first polymer at a superior portion of the resist film is higher than that of the second polymer, while the mixing ratio of the second polymer at an inferior portion of the resist film is higher than that of the first polymer.
    • 抗蚀剂组合物包括含有第一聚合物和第二聚合物的两种或更多种聚合物和当暴露于光化射线或辐射时产生酸的化合物,其中当抗蚀剂组合物形成干燥抗蚀剂膜时, 抗蚀剂膜中的第一和第二聚合物的至少表现出梯度分布,使得混合比在空气侧的抗蚀剂膜的表面朝向载体的深度方向全部或部分地连续变化,并且其中混合 抗蚀剂膜的上部的第一聚合物的比例高于第二聚合物,而抗蚀剂膜的下部的第二聚合物的混合比高于第一聚合物的比例。