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1. 发明授权

US06763839B2 Substrate cleaning system 失效
标题翻译：基材清洗系统
公开(公告)号：US06763839B2
公开(公告)日：2004-07-20
申请号：US09871250
申请日：2001-06-01
申请人： Ryoichi Ohkura , Yuji Ono , Hiroshi Yamaguchi , Miyuki Takaishi , Hideo Kamikochi
发明人： Ryoichi Ohkura , Yuji Ono , Hiroshi Yamaguchi , Miyuki Takaishi , Hideo Kamikochi
IPC分类号： B08B300
CPC分类号： H01L21/67196 , H01L21/67017 , H01L21/67766 , H01L21/67781 , Y10S134/902
摘要： A substrate cleaning system for cleaning wafers using a sheet-type wet cleaning treatment. The system has a sealable system body, a loading/unloading booth having a substrate carry-in section in which a plurality of substances are stocked to be carried in before a cleaning treatment is applied to them and a substrate carry-out section in which a plurality of substrates are stocked to be carried out after the cleaning treatment is applied, a processing booth provided with at least one sheet-type substrate cleaning chamber in which the cleaning treatment can be applied to a plurality of substrates by a plurality of cleaning solutions, and a robot booth provided with a transport robot for transporting the substrates one by one between the processing booth and the loading/unloading booth, the respective booths having partition walls.
摘要翻译：一种用于使用片式湿式清洗处理来清洗晶片的基板清洁系统。该系统具有可密封的系统主体，一个装载/卸载舱，具有一个基板输入部分，在该部分中多个物质被储存在其上施加清洁处理之前被运载;以及基板执行部分，其中在施加清洁处理之后，多个基板被储存以进行，设置有至少一个片状基板清洁室的处理室，其中可以通过多个清洁溶液将清洁处理应用于多个基板，以及设置有运送机器人的机器人展位台，用于在处理室和装卸台之间逐一运送基板，各个展位具有分隔壁。

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