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    • 1. 发明授权
    • SRAM based one-time-programmable memory
    • 基于SRAM的一次可编程存储器
    • US07869251B2
    • 2011-01-11
    • US12239469
    • 2008-09-26
    • Ramnath VenkatramanRuggero CastagnettiSubramanian Ramesh
    • Ramnath VenkatramanRuggero CastagnettiSubramanian Ramesh
    • G11C17/00
    • G11C17/16G11C17/18
    • Disclosed is a method and device for providing fast-response One-Time-Programmable (OTP) memory based on SRAM memory technology and the inherent breakdown characteristics of a MOS transistor. Each memory cell of an SRAM memory cell circuit is connected to a programming circuit. The programming circuit is comprised of two groups of MOS transistors connected to the storage nodes (SN and SNB, where SNB is the complementary value of SN) of the two cross-coupled inverters of the SRAM memory circuit. A desired data set is loaded into the circuit and then is burned-in by applying and repeatedly cycling a “burn-in” voltage across the source and drain of the MOS transistors of the programming circuit that approaches the ON STATE trigger voltage of the characteristic bipolar junction transistor contained within the MOS transistors. Upon repeated cycling of the source-to-drain voltage, the targeted MOS transistor within the programming circuit breaks down and shorts across the gate, drain, and/or source of the transistor. When the system is returned to normal operation, the programming circuits will be connected to ground, Vdd or Vss and one of the two nodes of the SRAM cell circuit will be shorted through the programming circuit to ground, Vdd or Vss, thus, forcing a retention of the programmed data state.
    • 公开了一种用于提供基于SRAM存储器技术的快速响应一次可编程(OTP)存储器和MOS晶体管的固有击穿特性的方法和装置。 SRAM存储单元电路的每个存储单元连接到编程电路。 编程电路由连接到SRAM存储器电路的两个交叉耦合反相器的存储节点(SN和SNB,其中SNB是SN的互补值)的两组MOS晶体管组成。 将期望的数据组加载到电路中,然后通过施加并重复地循环编程电路的MOS晶体管的源极和漏极上的“老化”电压并接近特性的ON状态触发电压而被烧录 双极结晶体管包含在MOS晶体管内。 在重复循环源极至漏极电压之后,编程电路内的目标MOS晶体管在晶体管的栅极,漏极和/或源极之间分解和短路。 当系统恢复正常运行时,编程电路将连接到地,Vdd或Vss,SRAM单元电路的两个节点之一将通过编程电路短路到地Vdd或Vss,从而强制 保留编程数据状态。
    • 4. 发明授权
    • Memory cell architecture
    • 存储单元架构
    • US07006370B1
    • 2006-02-28
    • US10716259
    • 2003-11-18
    • Subramanian RameshRuggero CastagnettiRamnath Venkatraman
    • Subramanian RameshRuggero CastagnettiRamnath Venkatraman
    • G11C5/06
    • G11C11/412H01L27/1104
    • A memory cell architecture is provided herein for increasing memory speed, performance and robustness within a highly compact memory cell layout. Though only a few embodiments are provided herein, a feature common to all embodiments includes a novel means for sharing one or more contact structures between vertically adjacent memory cells. In particular, one or more contact structures may be shared unequally between two vertically adjacent memory cells for reducing a vertical dimension, or length, of the memory cell. Other features are disclosed for producing the highly compact memory cell layout. The various features of the present invention may be combined to produce high-performance, high-density memory arrays.
    • 本文提供了一种存储单元架构,用于在高度紧凑的存储器单元布局内提高存储器速度,性能和鲁棒性。 虽然本文仅提供了几个实施例,但是所有实施例共同的特征包括用于在垂直相邻的存储器单元之间共享一个或多个接触结构的新型装置。 特别地,一个或多个接触结构可以在两个垂直相邻的存储器单元之间被不平等地共享,以减小存储单元的垂直尺寸或长度。 公开了用于产生高度紧凑的存储单元布局的其它特征。 本发明的各种特征可以组合以产生高性能,高密度的存储阵列。
    • 6. 发明申请
    • SRAM BASED ONE-TIME-PROGRAMMABLE MEMORY
    • 基于SRAM的一次可编程存储器
    • US20100080035A1
    • 2010-04-01
    • US12239469
    • 2008-09-26
    • Ramnath VenkatramanRuggero CastagnettiSubramanian Ramesh
    • Ramnath VenkatramanRuggero CastagnettiSubramanian Ramesh
    • G11C17/08
    • G11C17/16G11C17/18
    • Disclosed is a method and device for providing fast-response One-Time-Programmable (OTP) memory based on SRAM memory technology and the inherent breakdown characteristics of a MOS transistor. Each memory cell of an SRAM memory cell circuit is connected to a programming circuit. The programming circuit is comprised of two groups of MOS transistors connected to the storage nodes (SN and SNB, where SNB is the complementary value of SN) of the two cross-coupled inverters of the SRAM memory circuit. A desired data set is loaded into the circuit and then is burned-in by applying and repeatedly cycling a “burn-in” voltage across the source and drain of the MOS transistors of the programming circuit that approaches the ON STATE trigger voltage of the characteristic bipolar junction transistor contained within the MOS transistors. Upon repeated cycling of the source-to-drain voltage, the targeted MOS transistor within the programming circuit breaks down and shorts across the gate, drain, and/or source of the transistor. When the system is returned to normal operation, the programming circuits will be connected to ground, Vdd or Vss and one of the two nodes of the SRAM cell circuit will be shorted through the programming circuit to ground, Vdd or Vss, thus, forcing a retention of the programmed data state.
    • 公开了一种用于提供基于SRAM存储器技术的快速响应一次可编程(OTP)存储器和MOS晶体管的固有击穿特性的方法和装置。 SRAM存储单元电路的每个存储单元连接到编程电路。 编程电路由连接到SRAM存储器电路的两个交叉耦合反相器的存储节点(SN和SNB,其中SNB是SN的互补值)的两组MOS晶体管组成。 将期望的数据组加载到电路中,然后通过施加并重复地循环编程电路的MOS晶体管的源极和漏极上的“老化”电压并接近特性的ON状态触发电压而被烧录 双极结晶体管包含在MOS晶体管内。 在重复循环源极至漏极电压之后,编程电路内的目标MOS晶体管在晶体管的栅极,漏极和/或源极之间分解和短路。 当系统恢复正常运行时,编程电路将连接到地,Vdd或Vss,SRAM单元电路的两个节点之一将通过编程电路短路到地Vdd或Vss,从而强制 保留编程数据状态。