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1. 发明授权

US08440111B2 Lead-free conductive paste composition 失效
标题翻译：无铅导电糊组合物
公开(公告)号：US08440111B2
公开(公告)日：2013-05-14
申请号：US13109525
申请日：2011-05-17
申请人： Rong-Zhi Chen , Hung-Shuo Chung , Chin-Lin Huang , Jye-Long Lee , Shu-Hua Chen , Jui-Tung Chang
发明人： Rong-Zhi Chen , Hung-Shuo Chung , Chin-Lin Huang , Jye-Long Lee , Shu-Hua Chen , Jui-Tung Chang
IPC分类号： H01B1/16 , H01B1/22
CPC分类号： H01B1/22
摘要： A lead-free conductive paste composition includes silumin powder, lead-free glass frits, an organic binder, stearic acid zinc, and aluminum powder.
摘要翻译：无铅导电糊组合物包括硅铝粉，无铅玻璃料，有机粘合剂，硬脂酸锌和铝粉。

2. 发明授权

US07754027B2 Method for manufacturing a sputtering target 失效
标题翻译：溅射靶的制造方法
公开(公告)号：US07754027B2
公开(公告)日：2010-07-13
申请号：US11892755
申请日：2007-08-27
申请人： Rong-Zhi Chen , Jye-Long Lee , In-Ting Hong , Jui-Tung Chang , Pa-Tsui Sze
发明人： Rong-Zhi Chen , Jye-Long Lee , In-Ting Hong , Jui-Tung Chang , Pa-Tsui Sze
IPC分类号： H01F1/01
CPC分类号： B22D27/06 , C21D8/0226 , C21D8/0273 , C22F1/10 , C23C14/3414
摘要： A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.
摘要翻译：制造溅射靶的方法包括以下步骤：提供含有磁性金属和高纯贵金属锭材料的高纯度基质材料; 清理基体材料和贵金属锭的表面; 真空熔化基体材料和贵金属锭，得到熔融合金; 将熔融合金倾倒在具有冷却系统的模具中，同时通过电弧加热将熔融合金的表面保持在熔融状态，直到浇注完成，从而将熔融合金形成铸坯; 热工作铸坯; 并在热加工后退火铸坯。

3. 发明申请

US20090056840A1 Method for manufacturing a sputtering target 失效
标题翻译：溅射靶的制造方法
公开(公告)号：US20090056840A1
公开(公告)日：2009-03-05
申请号：US11892755
申请日：2007-08-27
申请人： Rong-Zhi Chen , Jye-Long Lee , In-Ting Hong , Jui-Tung Chang , Pa-Tsui Sze
发明人： Rong-Zhi Chen , Jye-Long Lee , In-Ting Hong , Jui-Tung Chang , Pa-Tsui Sze
IPC分类号： C21D1/26 , B22D23/00 , B22D7/00
CPC分类号： B22D27/06 , C21D8/0226 , C21D8/0273 , C22F1/10 , C23C14/3414
摘要： A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.
摘要翻译：制造溅射靶的方法包括以下步骤：提供含有磁性金属和高纯贵金属锭材料的高纯度基质材料; 清理基体材料和贵金属锭的表面; 真空熔化基体材料和贵金属锭，得到熔融合金; 将熔融合金倾倒在具有冷却系统的模具中，同时通过电弧加热将熔融合金的表面保持在熔融状态，直到浇注完成，从而将熔融合金形成铸坯; 热工作铸坯; 并在热加工后退火铸坯。

4. 发明申请

US20080159121A1 WRITE-ONCE OPTICAL RECORDING MEDIUM 审中-公开
标题翻译：写入光学记录介质
公开(公告)号：US20080159121A1
公开(公告)日：2008-07-03
申请号：US11834208
申请日：2007-08-06
申请人： Huan-Chien TUNG , Liu-Wen Chang , Yeong-Tsuen Pan , Jui-Tung Chang , Jye-Long Lee
发明人： Huan-Chien TUNG , Liu-Wen Chang , Yeong-Tsuen Pan , Jui-Tung Chang , Jye-Long Lee
IPC分类号： G11B3/70
CPC分类号： G11B7/259 , G11B7/2433 , G11B7/2585 , G11B2007/24312 , G11B2007/24314
摘要： A write-once optical recording medium includes a substrate, and a recordable film formed on the substrate. The recordable film includes a recording layer containing a component selected from germanium (Ge), antimony (Sb), silicon (Si), and mixtures thereof, and a reflective layer containing a component selected from aluminum (Al), copper (Cu), silver (Ag), gold (Au), and mixtures thereof.
摘要翻译：一次写入光记录介质包括基板和形成在基板上的可记录膜。可记录膜包括含有选自锗（Ge），锑（Sb），硅（Si）及其混合物的组分的记录层，以及含有选自铝（Al），铜（Cu），银（Ag），金（Au）及其混合物。

5. 发明授权

US08366994B2 Method for manufacturing cobalt alloy-based ceramic composite sputtering target 有权
标题翻译：制造钴合金陶瓷复合溅射靶的方法
公开(公告)号：US08366994B2
公开(公告)日：2013-02-05
申请号：US12939174
申请日：2010-11-04
申请人： Rong-Zhi Chen , Chun-Hao Chiu , Jui-Tung Chang , Deng-Far Hsu , Chih-Huang Lai
发明人： Rong-Zhi Chen , Chun-Hao Chiu , Jui-Tung Chang , Deng-Far Hsu , Chih-Huang Lai
IPC分类号： C22C32/00
CPC分类号： C23C14/3414 , B22F3/14 , C22C1/0433 , C22C1/05
摘要： A method for manufacturing a cobalt (Co) alloy-based ceramic composite sputtering target is provided. A cobalt ingot and a chromium (Cr) ingot are melted in vacuum and then nebulized to form a cobalt-chromium (CoCr) alloy powder. Additionally, a ceramic powder and a platinum powder are wetly mixed to form a platinum-ceramic (Pt-ceramic) slurry, in which the ceramic powder is applied onto the platinum powder's surface uniformly. Next, the CoCr alloy powder and the Pt-ceramic slurry are wetly mixed to form a CoCrPt-ceramic slurry. Thereafter, the CoCrPt-ceramic slurry is dried, molded and compressed to form the cobalt alloy-based ceramic composite sputtering target. The resulted cobalt alloy-based ceramic composite sputtering target, which has a fine and dense structure, uniform composition and lower magnetic permeability, is beneficial to a magnetron sputter deposition process, as well as a film sputtering process used in the magnetic recording industry.
摘要翻译：提供了一种制造钴（Co）合金系陶瓷复合溅射靶的方法。钴锭和铬（Cr）锭在真空中熔化，然后喷雾形成钴 - 铬（CoCr）合金粉末。另外，将陶瓷粉末和铂粉末湿式混合以形成铂 - 陶瓷（Pt-陶瓷）浆料，其中将陶瓷粉末均匀地涂覆在铂粉末的表面上。接着，将CoCr合金粉末和Pt-陶瓷浆料湿混，形成CoCrPt陶瓷浆料。然后，将CoCrPt陶瓷浆料干燥，成型并压缩，形成钴合金系陶瓷复合溅射靶。得到的钴合金系陶瓷复合溅射靶具有精细且致密的结构，组成均匀性和较低的磁导率，有利于磁控溅射沉积工艺以及在磁记录工业中使用的薄膜溅射工艺。

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