专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08982319B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08982319B2
公开(公告)日：2015-03-17
申请号：US13045090
申请日：2011-03-10
申请人： Roland Pieter Stolk , Paul Van Der Veen
发明人： Roland Pieter Stolk , Paul Van Der Veen
IPC分类号： G03B27/68 , G03F7/20 , G03B27/42 , G03B27/52 , G03B27/54 , G03B27/72 , G03B27/32
CPC分类号： G03F7/7085
摘要： A detector to measure a property of radiation is disclosed. The detector comprises first and second luminescent uniaxial crystals each having an optic axis, the optic axis of the first uniaxial crystal being arranged such that it is substantially perpendicular to the optic axis of the second uniaxial crystal.
摘要翻译：公开了一种用于测量辐射特性的检测器。检测器包括每个具有光轴的第一和第二发光单轴晶体，第一单轴晶体的光轴布置成基本上垂直于第二单轴晶体的光轴。

2. 发明申请

US20110222029A1 LITHOGRAPHIC APPARATUS AND METHOD 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：US20110222029A1
公开(公告)日：2011-09-15
申请号：US13045090
申请日：2011-03-10
申请人： Roland Pieter STOLK , Paul Van Der Veen
发明人： Roland Pieter STOLK , Paul Van Der Veen
IPC分类号： G03B27/00 , G01J1/42
CPC分类号： G03F7/7085
摘要： A detector to measure a property of radiation is disclosed. The detector comprises first and second luminescent uniaxial crystals each having an optic axis, the optic axis of the first uniaxial crystal being arranged such that it is substantially perpendicular to the optic axis of the second uniaxial crystal.
摘要翻译：公开了一种用于测量辐射特性的检测器。检测器包括每个具有光轴的第一和第二发光单轴晶体，第一单轴晶体的光轴布置成基本上垂直于第二单轴晶体的光轴。

3. 发明授权

US07283208B2 Lithographic apparatus, method of manufacturing a device, and device manufactured thereby 失效
标题翻译：平版印刷装置，制造装置的方法以及由此制造的装置
公开(公告)号：US07283208B2
公开(公告)日：2007-10-16
申请号：US10746156
申请日：2003-12-29
申请人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Roel De Jonge , Roland Pieter Stolk
发明人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Roel De Jonge , Roland Pieter Stolk
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70558
摘要： A lithographic projection apparatus is provided with a sensor for detecting one of luminescence radiation, desorbed particles, or free charges produced by an interaction of the projection beam with a material at surface of a substrate. The luminescence radiation, desorbed particles, or free charges are indicative of the dose delivered to the substrate, and can be detected close to the substrate or at the substrate level to avoid errors due to transmission variations in the optical path from the radiation source to the substrate.
摘要翻译：光刻投影装置设置有用于检测发光辐射，解吸颗粒或由投影束与衬底表面处的材料的相互作用产生的自由电荷之一的传感器。发光辐射，解吸颗粒或自由电荷指示输送到衬底的剂量，并且可以在衬底附近或在衬底水平处被检测，以避免由于从辐射源到辐射源的光路中的透射变化的错误基质。

4. 发明授权

US09250536B2 Lithographic apparatus and method 有权
公开(公告)号：US09250536B2
公开(公告)日：2016-02-02
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

5. 发明授权

US08625199B2 Pulse modifier with adjustable etendue 有权
标题翻译：脉冲调节剂，具有可调节的光密度
公开(公告)号：US08625199B2
公开(公告)日：2014-01-07
申请号：US13173905
申请日：2011-06-30
申请人： Adel Joobeur , Oscar Franciscus Jozephus Noordman , Paul Van Der Veen , Arun Mahadevan Venkataraman
发明人： Adel Joobeur , Oscar Franciscus Jozephus Noordman , Paul Van Der Veen , Arun Mahadevan Venkataraman
IPC分类号： G02B27/14
CPC分类号： G03F7/70583 , G02B27/144 , G02B27/145 , H01S3/0057
摘要： A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.
摘要翻译：光束修改单元增加照明光束的时间脉冲长度和延迟。脉冲修改单元接收辐射的输入脉冲并发射一个或多个对应的辐射输出脉冲。分束器将输入脉冲分成第一和第二脉冲部分，并且沿着第二光路引导第一脉冲部分，并且沿着作为输出光束的一部分的第一光路引导第二部分。第二光路包括发散光学元件。具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，并且接收第二脉冲部分以重定向第二部分，使得通过脉冲修正器的第二部分的光路是比第一部分长，分离度小于曲率半径。

6. 发明申请

US20060055900A1 Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby 有权
公开(公告)号：US20060055900A1
公开(公告)日：2006-03-16
申请号：US10941017
申请日：2004-09-15
申请人： Antonius Van Der Net , Paul Van Der Veen , Yuri Van De Vijver
发明人： Antonius Van Der Net , Paul Van Der Veen , Yuri Van De Vijver
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70933 , G03F7/70925
摘要： A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a gas supply system for supplying a purge gas including oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by the gas supply system for each of the plurality of spaces on the basis of a predetermined relationship that relates a desired amount of oxygen in the premixed purge gas mixture to the respective space to which that premixed purge gas mixture is supplied.

7. 发明授权

US09140999B2 Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields in a single scanning movement of a lithographic process 有权
标题翻译：光栅组件，光刻设备，光刻工艺中的用途以及在光刻工艺的单次扫描运动中投影两个或多个图像场的方法
公开(公告)号：US09140999B2
公开(公告)日：2015-09-22
申请号：US13679662
申请日：2012-11-16
申请人： Paul Van Der Veen
发明人： Paul Van Der Veen
IPC分类号： G03B27/32 , G03B27/42 , G03B27/62 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70633 , G03F7/70425 , G03F7/70716 , H01L21/682
摘要： A reticle assembly for use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate, the reticle assembly being arranged to hold a first reticle having the first image field and a second reticle having the second image field such that a distance between the first and second image fields substantially corresponds to a distance between the first and the second target portions. Embodiments also relate to a lithographic apparatus including the reticle assembly, the use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second portion on a substrate, of a first reticle having the first image field and a second reticle having the second image field, wherein a distance between the first and second image fields substantially corresponds to a distance between the first and second target portions.
摘要翻译：一种用于光刻工艺的掩模版组件，其中第一图像场和第二图像场投影到基板上的第一目标部分和第二目标部分上，所述标线组件被布置成保持具有第一图像的第一掩模版场和第二掩模版具有第二图像场，使得第一和第二图像场之间的距离基本上对应于第一和第二目标部分之间的距离。实施例还涉及包括光罩组件的光刻设备，在光刻工艺中使用其中第一图像场和第二图像场投射到基板上的第一目标部分和第二部分上，第一掩模版具有第一图像场和第二掩模版具有第二图像场，其中第一和第二图像场之间的距离基本上对应于第一和第二目标部分之间的距离。

8. 发明申请

US20110255173A1 Pulse Modifier with Adjustable Etendue 有权
标题翻译：脉冲调制器，具有可调电流
公开(公告)号：US20110255173A1
公开(公告)日：2011-10-20
申请号：US13173905
申请日：2011-06-30
申请人： Adel JOOBEUR , Oscar Franciscus Jozephus Noordman , Paul Van Der Veen , Arun Mahadevan Venkataraman
发明人： Adel JOOBEUR , Oscar Franciscus Jozephus Noordman , Paul Van Der Veen , Arun Mahadevan Venkataraman
IPC分类号： G02B27/14
CPC分类号： G03F7/70583 , G02B27/144 , G02B27/145 , H01S3/0057
摘要： A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.
摘要翻译：光束修改单元增加照明光束的时间脉冲长度和延迟。脉冲修改单元接收辐射的输入脉冲并发射一个或多个对应的辐射输出脉冲。分束器将输入脉冲分成第一和第二脉冲部分，并且沿着第二光路引导第一脉冲部分，并且沿着作为输出光束的一部分的第一光路引导第二部分。第二光路包括发散光学元件。具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，并且接收第二脉冲部分以重定向第二部分，使得通过脉冲修正器的第二部分的光路是比第一部分长，分离度小于曲率半径。

9. 发明申请

US20090033902A1 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20090033902A1
公开(公告)日：2009-02-05
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus, Matheus Baselmans , Adrianus Franciscus, Petrus Engelen , Markus Franciscus, Antonius Eurlings , Hendrikus Robertus, Marie Greevenbroek , Patricius Aloysius, Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus, Matheus Baselmans , Adrianus Franciscus, Petrus Engelen , Markus Franciscus, Antonius Eurlings , Hendrikus Robertus, Marie Greevenbroek , Patricius Aloysius, Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
IPC分类号： G03B27/54 , G03B27/70
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译：装置制造方法包括使用照明系统来调节辐射束。调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。

10. 发明授权

US07476491B2 Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷装置，气体供给系统，清洗方法及装置的制造方法及装置
公开(公告)号：US07476491B2
公开(公告)日：2009-01-13
申请号：US10941017
申请日：2004-09-15
申请人： Antonius Johannes Van Der Net , Paul Van Der Veen , Yuri Johannes Gabriel Van De Vijver
发明人： Antonius Johannes Van Der Net , Paul Van Der Veen , Yuri Johannes Gabriel Van De Vijver
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70925
摘要： A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a gas supply system for supplying a purge gas including oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by the gas supply system for each of the plurality of spaces on the basis of a predetermined relationship that relates a desired amount of oxygen in the premixed purge gas mixture to the respective space to which that premixed purge gas mixture is supplied.
摘要翻译：光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用图案赋予辐射束。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，以及用于将包括氧的吹扫气体供应到设备中的多个空间的气体供应系统。气体供给系统被布置成使得供应到多个空间中的每一个的吹扫气体是由多个空间中的每一个的气体供应系统组成的预混吹扫气体混合物，其基于预定的关系，的预混吹扫气体混合物中的氧气供应到提供预混吹扫气体混合物的相应空间。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式