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1. 发明申请

US20180253006A1 SILICON-CONTAINING UNDERLAYERS 审中-公开
公开(公告)号：US20180253006A1
公开(公告)日：2018-09-06
申请号：US15971103
申请日：2018-05-04
申请人： Rohm and Haas Electronic Materials LLC
发明人： Li Cui , Charlotte A. Cutler , Suzanne M. Coley , Owendi Ongayi , Christopher P. Sullivan , Paul J. LaBeaume , Shintaro Yamada , Mingqi Li , James F. Cameron
IPC分类号： G03F7/11 , G03F7/20 , C08F24/00 , C08F20/06 , C08F16/10 , C08F20/30 , C08F20/14 , C08G63/08 , C09D183/04 , C09D5/20 , C08G77/04 , G03F7/42 , G03F7/16 , G03F7/30
CPC分类号： G03F7/11 , C08F16/10 , C08F20/06 , C08F20/10 , C08F20/14 , C08F20/30 , C08F24/00 , C08F220/14 , C08F220/20 , C08F220/34 , C08F222/06 , C08F222/40 , C08F230/08 , C08F2220/1825 , C08F2220/1858 , C08F2220/1891 , C08F2220/282 , C08F2220/283 , C08F2220/325 , C08F2800/10 , C08G63/08 , C08G77/04 , C08G77/20 , C08G77/80 , C09D5/20 , C09D183/04 , G03F7/0752 , G03F7/161 , G03F7/20 , G03F7/30 , G03F7/422 , G03F7/423 , C08K5/19 , C08L33/14
摘要： Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

2. 发明授权

US09442377B1 Wet-strippable silicon-containing antireflectant 有权
标题翻译：湿式可剥离的含硅抗反射剂
公开(公告)号：US09442377B1
公开(公告)日：2016-09-13
申请号：US14739402
申请日：2015-06-15
申请人： Rohm and Haas Electronic Materials LLC
发明人： Owendi Ongayi , Charlotte Cutler , Mingqi Li , Shintaro Yamada , James Cameron
IPC分类号： G03F7/075 , G03F7/11 , G03F7/40 , G03F7/09 , C08G77/28 , C08G77/14 , G03F7/20 , C09D183/08 , C09D183/06 , C08G77/18
CPC分类号： G03F7/091 , C08G77/14 , C08G77/18 , C08G77/26 , C08G77/28 , C08G77/80 , C09D183/06 , C09D183/08 , G03F7/0752 , G03F7/168 , G03F7/20 , G03F7/32
摘要： Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.
摘要翻译：提供包含一种或多种不含Q-单体和氢硅烷作为聚合单元的含硅聚合物的可湿剥离的抗反射组合物。这些组合物可用于制造各种电子装置。

3. 发明授权

US10114288B2 Silicon-containing underlayers 有权
公开(公告)号：US10114288B2
公开(公告)日：2018-10-30
申请号：US15254935
申请日：2016-09-01
申请人： Rohm and Haas Electronic Materials LLC
发明人： Charlotte A. Cutler , Suzanne M. Coley , Owendi Ongayi , Christopher P. Sullivan , Paul J. LaBeaume , Li Cui , Shintaro Yamada , Mingqi Li , James F. Cameron
IPC分类号： G03F7/11 , G03F7/075 , C08F20/14 , C08F20/28 , C08F20/32 , C08F24/00 , C08G67/00 , C08G73/12 , C08G77/04 , C09D5/20 , C09D183/04 , G03F7/16 , G03F7/20 , G03F7/30 , G03F7/42 , C08F20/10 , C08F220/14 , C08F220/20 , C08F220/24 , C08F222/06 , C08F222/40 , C08F230/08 , C08F220/18 , C08F220/28 , C08F220/32
摘要： Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

4. 发明授权

US10007184B2 Silicon-containing underlayers 有权
公开(公告)号：US10007184B2
公开(公告)日：2018-06-26
申请号：US15254929
申请日：2016-09-01
申请人： Rohm and Haas Electronic Materials LLC
发明人： Li Cui , Charlotte A. Cutler , Suzanne M. Coley , Owendi Ongayi , Christopher P. Sullivan , Paul J. LaBeaume , Shintaro Yamada , Mingqi Li , James F. Cameron
IPC分类号： G03F7/42 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/30 , C08F16/10 , C08F24/00 , C08G77/04 , C09D5/20 , C09D183/04 , C08G63/08 , C08F20/14 , C08F20/30 , C08F20/06
CPC分类号： G03F7/11 , C08F16/10 , C08F20/06 , C08F20/10 , C08F20/14 , C08F20/30 , C08F24/00 , C08F220/14 , C08F220/20 , C08F220/34 , C08F222/06 , C08F222/40 , C08F230/08 , C08F2220/1825 , C08F2220/1858 , C08F2220/1891 , C08F2220/282 , C08F2220/283 , C08F2220/325 , C08F2800/10 , C08G63/08 , C08G77/04 , C08G77/20 , C08G77/80 , C09D5/20 , C09D183/04 , G03F7/0752 , G03F7/161 , G03F7/20 , G03F7/30 , G03F7/422 , G03F7/423 , C08K5/19 , C08L33/14
摘要： Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

5. 发明申请

US20160223911A1 COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY 审中-公开
标题翻译：涂料组合物用于光刻胶
公开(公告)号：US20160223911A1
公开(公告)日：2016-08-04
申请号：US15097850
申请日：2016-04-13
申请人： Rohm and Haas Electronic Materials, LLC
发明人： Anthony Zampini , Michael K. Gallagher , Owendi Ongayi
IPC分类号： G03F7/11
CPC分类号： G03F7/11 , G03F7/038 , G03F7/039 , G03F7/091 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/32 , G03F7/322 , G03F7/38 , G03F7/40 , H01L21/0275 , H01L21/0276
摘要： In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
摘要翻译：在第一方面，提供了包括以下步骤的方法：（a）将可固化组合物施加在基材上; （b）在硬化组合物上施加硬掩模组合物; （c）在硬掩模组合物上施加光致抗蚀剂组合物层，其中在无灰过程中除去一种或多种组合物。在第二方面，提供了包括（a）在基材上施用有机组合物的方法; （b）在有机组合物上施加光致抗蚀剂组合物层，其中有机组合物包括在热和/或辐射处理时产生碱溶性基团的材料。还提供了相关的组合物。

6. 发明授权

US10031420B2 Wet-strippable silicon-containing antireflectant 有权
公开(公告)号：US10031420B2
公开(公告)日：2018-07-24
申请号：US15234124
申请日：2016-08-11
申请人： Rohm and Haas Electronic Materials LLC
发明人： Owendi Ongayi , Charlotte Cutler , Mingqi Li , Shintaro Yamada , James Cameron
IPC分类号： G03F7/075 , G03F7/11 , G03F7/40 , G03F7/09 , C08G77/28 , C08G77/14 , G03F7/20 , C09D183/08 , C09D183/06 , C08G77/18 , C08G77/00 , C08G77/26 , G03F7/16 , G03F7/32
摘要： Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.

7. 发明授权

US09690199B2 Coating compositions for photolithography 有权
公开(公告)号：US09690199B2
公开(公告)日：2017-06-27
申请号：US15097850
申请日：2016-04-13
申请人： Rohm and Haas Electronic Materials, LLC
发明人： Anthony Zampini , Michael K. Gallagher , Owendi Ongayi
IPC分类号： G03F7/11 , G03F7/32 , G03F7/40 , H01L21/027 , G03F7/09
CPC分类号： G03F7/11 , G03F7/038 , G03F7/039 , G03F7/091 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/32 , G03F7/322 , G03F7/38 , G03F7/40 , H01L21/0275 , H01L21/0276
摘要： In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.

8. 发明申请

US20150177615A1 PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权
标题翻译：光生产共聚物和相关光电组合物，涂覆基板和形成电子器件的方法
公开(公告)号：US20150177615A1
公开(公告)日：2015-06-25
申请号：US14528096
申请日：2014-10-30
申请人： ROHM AND HAAS ELECTRONIC MATERIALS LLC
发明人： Vipul Jain , Owendi Ongayi , James W. Thackeray , James F. Cameron
IPC分类号： G03F7/038 , C08F224/00
CPC分类号： G03F7/004 , C08F220/30 , C08F224/00 , C09D133/06 , C09D133/14 , G03F7/0045 , G03F7/0046 , G03F7/0397 , C08F2220/303 , C08F2220/302 , C08F2220/382
摘要： A copolymer include repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C1-12 alkyl (meth)acrylate in which the C1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R1, R2, R3, X, m, and R5 are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.
摘要翻译：共聚物包括衍生自酸不稳定单体，含脂肪族内酯的单体，C1-12烷基（甲基）丙烯酸酯的重复单元，其中C1-12烷基包括特定的碱溶性基团，光产酸单体其包括脂族阴离子和具有下式的中性芳族单体：其中R1，R2，R3，X，m和R5如本文所定义。共聚物用作光致抗蚀剂组合物的组分。描述了包括光致抗蚀剂组合物层的涂覆基材，以及使用该涂布基板形成电子器件的方法。

9. 发明申请

US20140242521A1 PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权
标题翻译：包含共聚物的光敏共聚物，光电子体和形成电子器件的方法
公开(公告)号：US20140242521A1
公开(公告)日：2014-08-28
申请号：US14186371
申请日：2014-02-21
申请人： ROHM AND HAAS ELECTRONIC MATERIALS LLC
发明人： Owendi Ongayi , James W. Thackeray , James F. Cameron
IPC分类号： G03F7/038
CPC分类号： C08F220/10 , C08F220/30 , C08F220/32 , C08F220/36 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A copolymer includes the polymerized product of a comonomer and a monomer having the formula (I): wherein c is 0, 1, 2, 3, 4, or 5; Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently an unsubstituted or substituted C1-10 linear or branched alkyl group, an unsubstituted or substituted C3-10 cycloalkyl group, an unsubstituted or substituted C3-10 alkenylalkyl group, or an unsubstituted or substituted C3-10 alkynylalkyl group; wherein Rx and Ry together optionally form a ring; and Rz is a C6-20 aryl group substituted with an acetal-containing group or a ketal-containing group, or a C3-C20 heteroaryl group substituted with an acetal-containing group or a ketal-containing group, wherein the C6-20 aryl group or the C3-C20 heteroaryl group can, optionally, be further substituted. Also described are a photoresist including the copolymer, a coated substrate having a layer of the photoresist, and a method of forming an electronic device utilizing the photoresist.
摘要翻译：共聚物包括共聚单体和具有式（I）的单体的聚合产物：其中c为0,1,2,3,4或5; R a是H，F，-CN，C 1-10烷基或C 1-10氟烷基; Rx和Ry各自独立地为未取代或取代的C 1-10直链或支链烷基，未取代或取代的C 3-10环烷基，未取代或取代的C 3-10链烯基烷基，或未取代或取代的C 3-10炔基烷基; 其中Rx和Ry一起可选地形成环; Rz是被含缩醛基团或含缩酮基团取代的C6-20芳基或被含缩醛基团或含缩酮基团取代的C3-C20杂芳基，其中C6-20芳基基团或C 3 -C 20杂芳基可以任选地被进一步取代。还描述了包括共聚物的光致抗蚀剂，具有光致抗蚀剂层的涂布基材，以及形成利用该光致抗蚀剂的电子器件的方法。

10. 发明授权

US10481494B1 Coating compositions for use with an overcoated photoresist 有权
公开(公告)号：US10481494B1
公开(公告)日：2019-11-19
申请号：US14635553
申请日：2015-03-02
申请人： Rohm and Haas Electronic Materials LLC
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
IPC分类号： G03F7/09 , G03F7/11 , G03F7/039 , G03F7/30 , G03F7/32
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

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