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1. 发明授权

US06200413B1 Quadri-point precision sphere polisher 失效
标题翻译：四点精密球磨机
公开(公告)号：US06200413B1
公开(公告)日：2001-03-13
申请号：US09233257
申请日：1999-01-19
申请人： Roger Privitt , Akira Ishikawa , Takashi Kanatake
发明人： Roger Privitt , Akira Ishikawa , Takashi Kanatake
IPC分类号： B24B1102
CPC分类号： B24B11/02
摘要： A system and method for polishing spherical shaped devices is disclosed. The system includes a carrier and an enclosure. The carrier has two projections so that when a device is placed between the projections, it contacts the carrier at two contact points. The enclosure matingly engages with the carrier so that it also contacts each device at two contact points. A movement system, such as a motor, provides relative movement between the carrier and the enclosure so that the four contact points polish each device. Also, the relative movement moves each device so that the device's entire outer surface is polished by the apparatus.
摘要翻译：公开了一种用于抛光球形装置的系统和方法。该系统包括一个载体和一个外壳。载体具有两个突起，使得当装置放置在突起之间时，它在两个接触点处接触载体。外壳配合地与载体接合，使得它也在两个接触点处与每个装置接触。诸如电动机的移动系统提供载体和外壳之间的相对运动，使得四个接触点抛光每个装置。此外，相对运动使每个装置移动，使得装置的整个外表面被该装置抛光。

2. 发明授权

US06379867B1 Moving exposure system and method for maskless lithography system 有权
标题翻译：无掩模光刻系统的移动曝光系统和方法
公开(公告)号：US06379867B1
公开(公告)日：2002-04-30
申请号：US09480796
申请日：2000-01-10
申请人： Wenhui Mei , Takashi Kanatake , Akira Ishikawa
发明人： Wenhui Mei , Takashi Kanatake , Akira Ishikawa
IPC分类号： G03F902
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70425
摘要： A photolithography system and method for providing a mask image to a subject such as a wafer is provided. The mask images are divided into sub-patterns and sequentially provided to a pixel panel, such as a deformable mirror device or a liquid crystal display. The pixel panel converts each sub-pattern into a plurality of pixel elements. Each of the pixel elements is then simultaneously focused to discrete, non-contiguous portions of the subject through a microlense array. The subject and pixel elements are then moved (e.g., one or both may be moved) and the next sub-pattern in the sequence is provided to the pixel panel. As a result, light can be projected on the subject, according to the pixel elements, to create a contiguous image on the subject.
摘要翻译：提供了一种用于向诸如晶片的对象提供掩模图像的光刻系统和方法。掩模图像被分成子图案，并且顺序地提供给诸如可变形反射镜装置或液晶显示器的像素面板。像素面板将每个子图案转换成多个像素元件。然后，每个像素元件通过微透镜阵列同时聚焦到对象的离散的，非连续的部分。然后移动对象和像素元素（例如，可以移动一个或两个），并且将序列中的下一个子图案提供给像素面板。结果，可以根据像素元素将光投影到被摄体上，以在对象上创建连续的图像。

3. 发明授权

US06606739B2 Scaling method for a digital photolithography system 有权
公开(公告)号：US06606739B2
公开(公告)日：2003-08-12
申请号：US10028479
申请日：2001-12-19
申请人： Takashi Kanatake , Wenhui Mei , Akira Ishikawa
发明人： Takashi Kanatake , Wenhui Mei , Akira Ishikawa
IPC分类号： G06F1750
CPC分类号： G03F7/704 , G03F7/2002 , G03F7/70291 , G03F7/70466
摘要： A method for scaling a pixel location in a digital photolithography system by rotating a pixel panel is provided. The method determines the angle of rotation of the pixel panel relative to a subject and calculates the original location of the pixel to be scaled. The method calculates the desired location of the pixel and determines the angle through which the pixel panel should be rotated to align the pixel with the desired location in a first dimension. The scan rate of the pixel panel and the subject is altered to align the pixel with the desired location in a second dimension.

4. 发明授权

US06444976B1 System and method for reflecting and deflecting light utilizing spherical shaped devices 失效
标题翻译：使用球形装置反射和偏转光的系统和方法
公开(公告)号：US06444976B1
公开(公告)日：2002-09-03
申请号：US09558965
申请日：2000-04-25
申请人： Akira Ishikawa , Takashi Kanatake , Wenhui Mei
发明人： Akira Ishikawa , Takashi Kanatake , Wenhui Mei
IPC分类号： G01D534
CPC分类号： G02B6/3512 , G01J3/18 , G02B6/3556 , G02B6/3582
摘要： A system and method of utilizing spherical and hemispherical shaped devices to function as an optical switch is disclosed. The optical switch can contain mirrors that turn on and off, or are fixed in place with a movable spherical device. Additionally, the optical switches can contain grating patterns to deflect an optical signal from its original path. The grating patterns can vary in design and pattern to deflect the optical signal in almost any direction, or to not let the optical signal continue. The optical switch can also include photo sensors along the exterior of the sphere or along the reflection device. The optical switch can also include an integrated circuits.
摘要翻译：公开了一种利用球形和半球形装置作为光开关的系统和方法。光学开关可以包含打开和关闭的反射镜，或者用可移动的球形装置固定在适当位置。另外，光开关可以包含光栅图案以使光信号偏离其原始路径。光栅图案可以在设计和图案上变化，以在几乎任何方向上偏转光信号，或者不让光信号继续。光学开关还可以包括沿着球体的外部或沿着反射装置的光传感器。光开关还可以包括集成电路。

5. 发明授权

US06430334B1 System and method for refracting and deflecting light utilizing liquid crystal bars and blocks 有权
$System and method for refracting and deflecting light utilizing liquid crystal bars and blocks$
标题翻译：利用液晶棒和块折射和偏转光的系统和方法
公开(公告)号：US06430334B1
公开(公告)日：2002-08-06
申请号：US09557654
申请日：2000-04-25
申请人： Akira Ishikawa , Takashi Kanatake , Wenhui “Bill” Mei
发明人： Akira Ishikawa , Takashi Kanatake , Wenhui “Bill” Mei
IPC分类号： G02B626
CPC分类号： G02B6/3514 , G02B6/3546 , G02B6/3556 , G02B6/3582 , G02F1/313 , G02F1/315
摘要： A system and method of optical switching utilizing a reflection device, the switch is disclosed. The system can include: an optical transmission path having an optical transmission medium, an input-side end and a first and a second output-side end; a radiation source associated with said input-side end for emitting a primary optical signal being coupled into said transmission path; a reflection device with the ability to be turned on and off selectively for receiving the primary optical signal and converting the primary optical signal into a secondary, modulated optical signal being reflected and coupled back into the second output-side end when the reflection device is on and wherein the primary optical signal is coupled into the first output-side end when the reflection device is off. The optical switch can contain mirrors that turn on and off, or are fixed in place while the switch is movable.
摘要翻译：利用反射装置的光开关的系统和方法，公开了开关。该系统可以包括：具有光传输介质的光传输路径，输入侧端和第一和第二输出侧端; 与所述输入侧端相关联的辐射源，用于发射耦合到所述传输路径中的主要光信号; 具有选择性地接通和断开的能力的反射装置，用于接收主光信号，并且当反射装置处于打开状态时，将初级光信号转换成二次调制光信号被反射并耦合回第二输出侧端并且其中当所述反射装置关闭时，所述主光信号耦合到所述第一输出侧端。光开关可以包含打开和关闭的镜子，或者在开关可移动时固定到位。

6. 发明授权

US08398193B2 Inkjet recording apparatus 有权
标题翻译：喷墨记录装置
公开(公告)号：US08398193B2
公开(公告)日：2013-03-19
申请号：US13135750
申请日：2011-07-14
申请人： Hideo Izawa , Akira Ishikawa , Kouichi Ooyama
发明人： Hideo Izawa , Akira Ishikawa , Kouichi Ooyama
IPC分类号： B41J25/308
CPC分类号： B41J25/3088 , B41J25/308
摘要： [Problem to be Solved] To provide an inkjet recording apparatus capable of adjusting a gap with high accuracy and easily.[Solution] The present invention provides an inkjet recording apparatus 100 including line heads 20 to 23 capable of recording on a recording medium 1, a head box 11 that houses the line heads 20 to 23, and gap adjustment cams 30 to 32 that abut on a lower surface of a bottom 11b in the head box 11, in which the head box 11 is slightly movable in an up-and-down direction by rotating the gap adjustment cams 30 to 32.
摘要翻译： [待解决的问题]提供能够高精度且容易地调整间隙的喷墨记录装置。 [解决方案]本发明提供一种喷墨记录装置100，其包括能够在记录介质1上记录的行头20至23，容纳行头20至23的头盒11和邻接的行间距调节凸轮30至32 头箱11中的底部11b的下表面，其中通过旋转间隙调节凸轮30至32，头箱11可在上下方向上稍微移动。

7. 发明授权

US08371689B2 Ink-jet recording apparatus 有权
标题翻译：喷墨记录装置
公开(公告)号：US08371689B2
公开(公告)日：2013-02-12
申请号：US12927485
申请日：2010-11-16
申请人： Hideo Izawa , Akira Ishikawa
发明人： Hideo Izawa , Akira Ishikawa
IPC分类号： B41J2/01
CPC分类号： B41J3/60 , B41J11/002 , B41J15/04 , B41J29/13
摘要： The present invention is an ink-jet recording apparatus 100 capable of carrying out printing continuously onto both surfaces of a recording medium 1, the ink-jet recording apparatus 100 having: a first unit 10a having a first ink-jet recording head 2a for carrying out printing onto a first surface la of the recording medium 1 and having a first drying drum 3apositioned below the first ink-jet recording head 2a and heating and drying the recording medium 1 after the printing; and a second unit 10b having a second ink-jet recording head 2b for carrying out printing onto a second surface 1b of the recording medium 1 and having a second drying drum 3b positioned below the second ink-jet recording head 2b and heating and drying the recording medium 1 after the printing.
摘要翻译：本发明是一种喷墨记录装置100，其能够连续地在记录介质1的两个表面上进行打印，喷墨记录装置100具有：第一单元10a，具有用于承载的第一喷墨记录头2a 将其印刷到记录介质1的第一表面1a上，并具有位于第一喷墨记录头2a下方的第一干燥鼓3，并在印刷之后加热和干燥记录介质1; 以及具有第二喷墨记录头2b的第二单元10b，用于在记录介质1的第二表面1b上进行印刷，并具有位于第二喷墨记录头2b下方的第二干燥鼓3b，并加热并干燥记录介质1。

8. 发明授权

US08368071B2 Semiconductor device including a thin film transistor and capacitor 有权
标题翻译：半导体器件包括薄膜晶体管和电容器
公开(公告)号：US08368071B2
公开(公告)日：2013-02-05
申请号：US11716068
申请日：2007-03-09
申请人： Akira Ishikawa
发明人： Akira Ishikawa
IPC分类号： H01L29/04
CPC分类号： H01L29/786 , G02F1/136213 , H01L27/124 , H01L27/1248 , H01L27/1255 , H01L29/4908 , H01L29/78648 , Y10S257/903 , Y10S257/906 , Y10S257/908 , Y10S257/924
摘要： A semiconductor device and a method for preparing the same that can solve crack of a semiconductor film, capacitance electrodes and the like due to stress when forming a source electrode and a drain electrode in a semiconductor device having a thin film transistor and a holding capacitance with three or more capacitance electrodes is provided. Before forming the source electrode and the drain electrode, a crystalline silicon film for relaxing the stress is formed, then a contact hole connecting to the semiconductor film of the thin film transistor is opened, and a metal film to be the source electrode and the drain electrode is formed.
摘要翻译：在具有薄膜晶体管和保持电容的半导体器件中形成源电极和漏电极时由于应力引起的半导体膜，电容电极等的裂纹的半导体器件及其制造方法提供三个或更多个电容电极。在形成源电极和漏电极之前，形成用于缓和应力的晶体硅膜，然后打开与薄膜晶体管的半导体膜连接的接触孔，并将作为源电极和漏极的金属膜形成电极。

9. 发明授权

US08198680B2 Semiconductor element, semiconductor device and methods for manufacturing thereof 有权
标题翻译：半导体元件，半导体器件及其制造方法
公开(公告)号：US08198680B2
公开(公告)日：2012-06-12
申请号：US11822775
申请日：2007-07-10
申请人： Akira Ishikawa
发明人： Akira Ishikawa
IPC分类号： H01L27/12
CPC分类号： H01L29/41733 , H01L21/84 , H01L27/1203 , H01L29/66757 , H01L29/78621 , H01L29/78675
摘要： The present invention provides a method of manufacturing a semiconductor element having a miniaturized structure and a semiconductor device in which the semiconductor element having a miniaturized structure is integrated highly, by overcoming reduction of the yield caused by alignment accuracy, accuracy of a processing technique by reduced projection exposure, a finished dimension of a resist mask, an etching technique and the like. An insulating film covering a gate electrode is formed, and a source region and a drain region are exposed, a conductive film is formed thereover, a resist having a different film thickness is formed by applying the resist over the conductive film, the entire surface of the resist is exposed to light and developed, or the entire surface of the resist is etched to form a resist mask, and the conductive film is etched by using the resist mask to form a source and drain electrode.
摘要翻译：本发明提供一种制造具有小型结构的半导体元件和半导体器件的方法，其中具有小型结构的半导体元件被高度集成，通过克服由对准精度引起的成品率的降低，加工技术的精度降低投影曝光，抗蚀剂掩模的成品尺寸，蚀刻技术等。形成覆盖栅电极的绝缘膜，并且源极区域和漏极区域露出，在其上形成导电膜，通过在导电膜上涂覆抗蚀剂，形成具有不同膜厚度的抗蚀剂，整个表面将抗蚀剂曝光并显影，或者蚀刻抗蚀剂的整个表面以形成抗蚀剂掩模，并且通过使用抗蚀剂掩模来蚀刻导电膜以形成源极和漏极。

10. 发明授权

US08177327B2 Ink jet recording apparatus 有权
标题翻译：喷墨记录装置
公开(公告)号：US08177327B2
公开(公告)日：2012-05-15
申请号：US12648051
申请日：2009-12-28
申请人： Hideo Izawa , Takao Namiki , Akira Ishikawa , Yuuichi Yamazaki
发明人： Hideo Izawa , Takao Namiki , Akira Ishikawa , Yuuichi Yamazaki
IPC分类号： B41J23/00
CPC分类号： B41J2/155 , B41J2202/19 , B41J2202/20
摘要： An ink jet recording apparatus in which a head supporting plate having a line head mounted thereon which comprises a plurality of short heads staggered is attached to a carriage whereby recording is performed by ink jet printing with the line head on a recording medium positioned beneath the carriage is rendered capable of using ordinary short heads.To this end, in an ink jet recording apparatus in which a head supporting plate 12 having a line head mounted thereon which comprises a plurality of short heads 11 staggered is attached to a carriage 9 whereby recording is performed by ink jet printing with the line head on a recording medium 2 positioned beneath the carriage, a portion of projection 25 is provided which is formed on a surface of attachment where the head supporting plate is attached to the carriage, the portion of projection entering into a hole 26 formed in the carriage; and a portion of recess is provided which is formed on an obverse side of the head supporting plate and at a position corresponding to that of the portion of projection and whose inner bottom surface becomes a head mounting surface 27 on which a said short head having a nozzle is to be mounted, the head mounting surface being formed with a nozzle accepting hole adapted to accept the nozzle of the short head for mounting the short head on the head mounting surface.
摘要翻译：一种喷墨记录装置，其中安装有其上包括多个短头的行头的头支撑板被安装在滑架上，由此通过喷墨打印进行记录，该记录介质位于载架能够使用普通的短头。为此，在其上安装有包括多个短头11的行头的头支撑板12安装在滑架9上的喷墨记录装置中，由此通过喷墨打印与线头进行记录在位于托架下方的记录介质2上，设有突出部25的一部分，该突起25形成在安装在支承板上的安装面上，突出部分进入形成于托架中的孔26中。并且设置一部分凹部，其形成在头部支撑板的正面上并且在与突出部分相对应的位置处，并且其内底表面变成头部安装表面27，在该头部安装表面上，具有要安装喷嘴，头安装表面形成有适于接纳短头喷嘴的喷嘴接收孔，用于将短头安装在头安装表面上。

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