专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07997227B2 Vacuum coater device and mechanism for supporting and manipulating workpieces in same 有权
标题翻译：真空涂布机装置和机构，用于支撑和操纵工件
公开(公告)号：US07997227B2
公开(公告)日：2011-08-16
申请号：US11685354
申请日：2007-03-13
申请人： Robert William Bruce , Theodore Robert Grossman , John Douglas Evans, Sr. , Brian Harvey Pilsner
发明人： Robert William Bruce , Theodore Robert Grossman , John Douglas Evans, Sr. , Brian Harvey Pilsner
IPC分类号： C23C16/448 , C23C16/458 , C23C16/48 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/30
CPC分类号： C23C14/30 , C23C14/50 , C23C14/505 , C23C14/568
摘要： An apparatus for providing a vacuum coating to a workpiece, including: a coating chamber containing a coating material, with the coating chamber being operable at an elevated temperature and a sub-atmospheric pressure; an electron beam gun projecting an electron beam into the coating chamber and onto the coating material, where the electron beam gun is operable to melt the coating material and to evaporate molten coating material; and, a mechanism for supporting manipulating the workpiece in the coating chamber. The supporting mechanism further includes: a coupling device for retaining the workpiece; a joint connected to the coupling device enabling movement of the workpiece in all directions; an intermediate member connecting the coupling device and the joint; and, a device connected to the intermediate member for moving the workpiece in a designated vertical plane. The supporting mechanism may also include a device connected to the intermediate member for moving the workpiece in a designated horizontal plane.
摘要翻译：一种用于向工件提供真空涂层的设备，包括：包含涂层材料的涂层室，涂层室可在升高的温度和低于大气压的压力下操作; 电子束枪将电子束投射到涂覆室和涂覆材料上，其中电子束枪可操作以熔化涂层材料并蒸发熔融涂覆材料; 以及用于支撑在涂布室中操作工件的机构。支撑机构还包括：用于保持工件的联接装置; 连接到联接装置的联接器，其能够使工件在所有方向上移动; 连接所述联接装置和所述接头的中间构件; 以及连接到中间构件的装置，用于在指定的垂直平面中移动工件。支撑机构还可以包括连接到中间构件的装置，用于在指定的水平面中移动工件。

2. 发明申请

US20080223291A1 VACUUM COATER DEVICE AND MECHANISM FOR SUPPORTING AND MANIPULATING WORKPIECES IN SAME 有权
标题翻译：用于支持和操作其工作的真空涂料装置和机构
公开(公告)号：US20080223291A1
公开(公告)日：2008-09-18
申请号：US11685354
申请日：2007-03-13
申请人： Robert William Bruce , Theodore Robert Grossman , John Douglas Evans , Brian Harvey Pilsner
发明人： Robert William Bruce , Theodore Robert Grossman , John Douglas Evans , Brian Harvey Pilsner
IPC分类号： C23C14/00
CPC分类号： C23C14/30 , C23C14/50 , C23C14/505 , C23C14/568
摘要： An apparatus for providing a vacuum coating to a workpiece, including: a coating chamber containing a coating material, with the coating chamber being operable at an elevated temperature and a sub-atmospheric pressure; an electron beam gun projecting an electron beam into the coating chamber and onto the coating material, where the electron beam gun is operable to melt the coating material and to evaporate molten coating material; and, a mechanism for supporting manipulating the workpiece in the coating chamber. The supporting mechanism further includes: a coupling device for retaining the workpiece; a joint connected to the coupling device enabling movement of the workpiece in all directions; an intermediate member connecting the coupling device and the joint; and, a device connected to the intermediate member for moving the workpiece in a designated vertical plane. The supporting mechanism may also include a device connected to the intermediate member for moving the workpiece in a designated horizontal plane.
摘要翻译：一种用于向工件提供真空涂层的设备，包括：包含涂层材料的涂层室，涂层室可在升高的温度和低于大气压的压力下操作; 电子束枪将电子束投射到涂覆室和涂覆材料上，其中电子束枪可操作以熔化涂层材料并蒸发熔融涂覆材料; 以及用于支撑在涂布室中操作工件的机构。支撑机构还包括：用于保持工件的联接装置; 连接到联接装置的联接器，其能够使工件在所有方向上移动; 连接所述联接装置和所述接头的中间构件; 以及连接到中间构件的装置，用于在指定的垂直平面中移动工件。支撑机构还可以包括连接到中间构件的装置，用于在指定的水平面中移动工件。

3. 发明授权

US07128950B2 Electron beam physical vapor deposition process 失效
标题翻译：电子束物理气相沉积工艺
公开(公告)号：US07128950B2
公开(公告)日：2006-10-31
申请号：US10754419
申请日：2004-01-08
申请人： Robert William Bruce , John Douglas Evans, Sr.
发明人： Robert William Bruce , John Douglas Evans, Sr.
IPC分类号： C23C14/30
CPC分类号： C23C14/083 , C23C14/30 , C23C14/548 , H01J37/3053 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) process performed with a coating apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber operated at an elevated temperature and a subatmospheric pressure. The coating chamber contains a crucible and a coating material surrounded by and contained within the crucible, and the coating material has a surface exposed by the crucible. The process entails projecting an electron beam onto the surface of the coating material, wherein the electron beam defines a beam pattern having a higher intensity at an interface of the surface of the coating material with the crucible than at a central region of the surface of the coating material.
摘要翻译：用涂覆设备进行电子束物理气相沉积（EBPVD）处理，以在制品上产生涂层材料（例如，陶瓷热障涂层）。 EBPVD设备通常包括在升高的温度和低于大气压的压力下操作的涂覆室。涂覆室包含坩埚和由坩埚包围并包含在坩埚内的涂层材料，并且涂层材料具有由坩埚暴露的表面。该过程需要将电子束投射到涂层材料的表面上，其中电子束限定在涂层材料的表面与坩埚的界面处具有比在表面的中心区域具有更高强度的束图案涂料。

4. 发明授权

US06946034B1 Electron beam physical vapor deposition apparatus 失效
标题翻译：电子束物理气相沉积装置
公开(公告)号：US06946034B1
公开(公告)日：2005-09-20
申请号：US10643262
申请日：2003-08-19
申请人： Robert William Bruce , Antonio Frank Maricocchi , Christopher Lee Lagemann , John Douglas Evans, Sr. , Keith Humphries Betscher , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
发明人： Robert William Bruce , Antonio Frank Maricocchi , Christopher Lee Lagemann , John Douglas Evans, Sr. , Keith Humphries Betscher , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
IPC分类号： C23C14/00 , C23C14/24 , C23C14/30 , C23C14/52 , C23C14/54 , C23C14/56 , H01J37/305
CPC分类号： C23C14/52 , C23C14/246 , C23C14/30 , C23C14/541 , C23C14/56 , H01J37/3053
摘要： An electron beam physical vapor deposition (EBPVD) apparatus for producing a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber through an aperture in a wall of the chamber and onto a coating material within a coating region defined within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion within the coating chamber of a second chamber that encloses the aperture so as to separate the aperture from the coating region. The second chamber is maintained at a pressure lower than the coating region.
摘要翻译：一种用于在制品上生产涂层材料（例如，陶瓷热障涂层）的电子束物理气相沉积（EBPVD）装置。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。电子束枪将电子束通过腔室的孔中的电子束投射到涂覆室中，并且覆盖在腔室内限定的涂层区域内的涂层材料上，导致涂层材料熔化和蒸发。在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。 EBPVD装置的操作通过包围在包围孔的第二腔室的涂覆室内以便将孔与涂覆区域分开来增强。第二室保持在比涂覆区域低的压力。

5. 发明授权

US06589351B1 Electron beam physical vapor deposition apparatus and crucible therefor 有权
标题翻译：电子束物理气相沉积设备及其坩埚
公开(公告)号：US06589351B1
公开(公告)日：2003-07-08
申请号：US09624808
申请日：2000-07-24
申请人： Robert William Bruce , Antonio Frank Maricocchi , John Douglas Evans, Sr. , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
发明人： Robert William Bruce , Antonio Frank Maricocchi , John Douglas Evans, Sr. , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
IPC分类号： C23C1600
CPC分类号： C23C14/30 , C23C14/246 , C23C14/56 , C23C14/564
摘要： An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion of a crucible that supports the coating material and is configured to be efficiently cooled so as to reduce the rate at which the process temperature increases within the coating chamber.
摘要翻译：电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。通过包括支撑涂层材料的坩埚来增强EBPVD装置的操作，并且被配置为被有效地冷却，以便降低涂覆室内工艺温度升高的速度。

6. 发明授权

US06983718B1 Electron beam physical vapor deposition apparatus 失效
标题翻译：电子束物理气相沉积装置
公开(公告)号：US06983718B1
公开(公告)日：2006-01-10
申请号：US09624810
申请日：2000-07-24
申请人： Robert William Bruce , John Douglas Evans, Sr.
发明人： Robert William Bruce , John Douglas Evans, Sr.
IPC分类号： C23C16/48 , C23F1/00 , H01L21/306
CPC分类号： C23C14/083 , C23C14/30 , C23C14/548 , H01J37/3053 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the shape and intensity of the electron beam pattern on the coating material and on a crucible containing the molten coating material.
摘要翻译：电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。通过涂层材料上的电子束图案和含有熔融涂层材料的坩埚的形状和强度，增强了EBPVD装置的操作。

7. 发明授权

US06863937B2 Method of operating an electron beam physical vapor deposition apparatus 失效
标题翻译：操作电子束物理气相沉积装置的方法
公开(公告)号：US06863937B2
公开(公告)日：2005-03-08
申请号：US10299646
申请日：2002-11-19
申请人： Robert William Bruce , Antonio Frank Maricocchi , Christopher Lee Lagemann , John Douglas Evans, Sr. , Keith Humphries Betscher , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
发明人： Robert William Bruce , Antonio Frank Maricocchi , Christopher Lee Lagemann , John Douglas Evans, Sr. , Keith Humphries Betscher , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
IPC分类号： F02C7/00 , C23C14/24 , C23C14/30 , C23C14/52 , C23C14/54 , C23C14/56 , H01J37/305
CPC分类号： C23C14/246 , C23C14/30 , C23C14/52 , C23C14/541 , C23C14/56 , H01J37/3053 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus at coating pressures above 0.010 mbar.
摘要翻译：电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。 EBPVD装置的操作通过包含或适应一种或多种机械和/或工艺改进而得到增强，包括在涂覆压力高于0.010mbar的条件下操作设备时必需或有益的修改。

8. 发明申请

US20120160348A1 HIGH-TEMPERATURE JOINTED ASSEMBLIES AND WEAR-RESISTANT COATING SYSTEMS THEREFOR 有权
标题翻译：高温接合组件及其耐磨涂层系统
公开(公告)号：US20120160348A1
公开(公告)日：2012-06-28
申请号：US12978931
申请日：2010-12-27
申请人： Robert William Bruce , Karen Marie Marvich , Danny Lee Fenwick
发明人： Robert William Bruce , Karen Marie Marvich , Danny Lee Fenwick
IPC分类号： F16K15/00 , C23C16/00 , B32B3/02 , B32B15/04 , B32B9/04
CPC分类号： C23C14/0641 , C23C28/044 , C23C28/42 , Y10T137/7036 , Y10T137/7898 , Y10T137/7903 , Y10T428/12493 , Y10T428/12847 , Y10T428/219 , Y10T428/24025 , Y10T428/265 , Y10T428/31678
摘要： Wear-resistant coating systems suitable for protecting surfaces subjected to contact wear at high temperatures, such as surfaces of an assembly comprising high-temperature components of gas turbine engines. The components have surfaces in wear contact with each other. One of the surfaces has a wear-resistant coating system thereon so as to be in wear contact with the surface of the other component. The wear-resistant coating system contains alternating layers of TiAlN and CrN.
摘要翻译：适用于保护在高温下接触磨损的表面的耐磨涂层系统，例如包括燃气涡轮发动机的高温部件的组件的表面。这些部件具有彼此磨损接触的表面。其中一个表面上具有耐磨涂层系统，以便与另一个部件的表面磨损接触。耐磨涂层系统包含TiAlN和CrN的交替层。

9. 发明授权

US08196600B1 High-temperature jointed assemblies and wear-resistant coating systems therefor 有权
标题翻译：高温接头组件和耐磨涂层系统
公开(公告)号：US08196600B1
公开(公告)日：2012-06-12
申请号：US12978931
申请日：2010-12-27
申请人： Robert William Bruce , Karen Marie Marvich , Danny Lee Fenwick
发明人： Robert William Bruce , Karen Marie Marvich , Danny Lee Fenwick
IPC分类号： F16K15/03 , C23C16/34
CPC分类号： C23C14/0641 , C23C28/044 , C23C28/42 , Y10T137/7036 , Y10T137/7898 , Y10T137/7903 , Y10T428/12493 , Y10T428/12847 , Y10T428/219 , Y10T428/24025 , Y10T428/265 , Y10T428/31678
摘要： Wear-resistant coating systems suitable for protecting surfaces subjected to contact wear at high temperatures, such as surfaces of an assembly comprising high-temperature components of gas turbine engines. The components have surfaces in wear contact with each other. One of the surfaces has a wear-resistant coating system thereon so as to be in wear contact with the surface of the other component. The wear-resistant coating system contains alternating layers of TiAlN and CrN.
摘要翻译：适用于保护在高温下接触磨损的表面的耐磨涂层系统，例如包括燃气涡轮发动机的高温部件的组件的表面。这些部件具有彼此磨损接触的表面。其中一个表面上具有耐磨涂层系统，以便与另一个部件的表面磨损接触。耐磨涂层系统包含TiAlN和CrN的交替层。

10. 发明授权

US07351482B2 Ceramic compositions for thermal barrier coatings stabilized in the cubic crystalline phase 有权
标题翻译：用于隔热涂层的陶瓷组合物稳定在立方晶相
公开(公告)号：US07351482B2
公开(公告)日：2008-04-01
申请号：US11288366
申请日：2005-11-29
申请人： Brett Allen Boutwell , Mark Daniel Gorman , Irene Spitsberg , Ramgopal Darolia , Robert William Bruce , Venkat Subramaniam Venkataramani
发明人： Brett Allen Boutwell , Mark Daniel Gorman , Irene Spitsberg , Ramgopal Darolia , Robert William Bruce , Venkat Subramaniam Venkataramani
IPC分类号： C04B35/48 , B32B18/00 , B32B15/04
CPC分类号： F01D5/288 , B82Y30/00 , C04B35/486 , C04B2235/3206 , C04B2235/3208 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3229 , C04B2235/3251 , C04B2235/3286 , C04B2235/781 , C04B2235/9607 , C23C14/08 , C23C14/083 , C23C28/321 , C23C28/3215 , C23C28/3455 , C23C30/00 , F05D2230/90 , F05D2300/2118 , F05D2300/611 , Y10T428/12611 , Y10T428/26
摘要： Zirconia-containing ceramic compositions that are capable of providing thermal barrier coatings wherein the zirconia is stabilized in the cubic crystalline phase. These compositions comprise at least about 50 mole % zirconia and a stabilizing amount up to about 49 mole % of a stabilizer component comprising: (1) a first metal oxide selected from the group consisting of ytterbia, neodymia, mixtures of ytterbia and neodymia, mixtures of ytterbia and lanthana, mixtures of neodymia and lanthana, and mixtures of ytterbia, neodymia and lanthana in an amount of from about 5 to about 49 mole % of the composition; and (2) a second metal oxide selected from the group consisting of yttria, calcia, ceria, scandia, magnesia, india and mixtures thereof in an amount of about 4 mole % or less of the composition. The ceramic composition further comprises one or more of a third metal oxide selected from the group consisting of: (a) hafnia in an amount from about 0.5 to about 40 mole % of the composition; and (b) tantala in an amount of from about 0.5 to about 10 mole % of the composition. These compositions are useful in preparing thermal barrier coatings for an underlying substrate of articles that operate at, or are exposed to, high temperatures.
摘要翻译：能够提供热障涂层的含氧化锆的陶瓷组合物，其中氧化锆稳定在立方晶体相中。这些组合物包含至少约50摩尔％的氧化锆和至多约49摩尔％的稳定剂组分的稳定剂组分，其包含：（1）选自下列组的第一金属氧化物：镱，钕，镱和钕的混合物，混合物镱和镧的混合物，钕和镧的混合物，以及组合物的约5至约49摩尔％的镱，钕和镧的混合物; 和（2）选自组合物的约4摩尔％以下的量的氧化钇，氧化钙，二氧化铈，钪，氧化镁，印度及其混合物的第二金属氧化物。所述陶瓷组合物还包含选自以下的一种或多种第三金属氧化物：（a）组合物的约0.5至约40摩尔％的量的铪; 和（b）所述组合物的约0.5至约10摩尔％的量的黄铁矿。这些组合物可用于制备在高温下操作或暴露于其中的制品的下层基材的热障涂层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式