会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • System and method of modification of integrated circuit mask layout
    • 集成电路面板布局修改的系统和方法
    • US20080010619A1
    • 2008-01-10
    • US11824749
    • 2007-07-02
    • Yue YangMarko P. Chew
    • Yue YangMarko P. Chew
    • G06F17/50
    • G06F17/5068
    • Integrated circuit mask layouts are modified for the purpose of migration to abide a new set of design rules, or for the purpose of optimization for timing, power, signal integrity and manufacturability, among other purposes. The modified layout is required to satisfy a set of constraints generated from design rules, electrical specifications, user specifications among other requirements. The present invention provides a system and a method of representing constraint sets, each of which consists of two or more sets of constraints that are mutually exclusive to each other. In the preferred embodiment, one method of formulation is presented, and a method of solving the layout modification problem under the constraint sets is presented.
    • 修改了集成电路掩模布局,以便迁移以遵守新的一组设计规则,或为了优化时序,功率,信号完整性和可制造性等目的。 需要修改的布局来满足从设计规则,电气规格,用户规格以及其他要求产生的一组约束。 本发明提供了一种表示约束集的系统和方法,每个约束集由彼此相互排斥的两组或多组约束组成。 在优选实施例中,提出了一种制定方法,并且提出了一种解决约束集下的布局修改问题的方法。
    • 4. 发明申请
    • DETECTING DATA RACE AND ATOMICITY VIOLATION VIA TYPESTATE-GUIDED STATIC ANALYSIS
    • 通过类型指导静态分析检测数据环境和原子侵袭
    • US20110022893A1
    • 2011-01-27
    • US12507230
    • 2009-07-22
    • Yue YangAnna GringauzeDinghao WuHenning K. Rohde
    • Yue YangAnna GringauzeDinghao WuHenning K. Rohde
    • G06F11/36
    • G06F11/3608
    • Mechanisms for analyzing computer instructions implementing a program in which typestate analysis is informed by concurrency analysis. The concurrency-guided typestate analysis may simulate the “worst case” scenario due to thread interleaving by transitioning a simulated state of the variable to a special state whenever the variable is not guarded by its intended guarding lock. While in the special state, the analysis may assume that the state of the simulated variable is the worst possible state with respect to processing operations that may lead to an error depending on the state of the variable. Thus, the analysis performed may assume that referencing the variable in a state-dependent operation while the simulated state of the variable is in the special state may lead to an error, and the analysis may generate a warning, accordingly. The analysis may process the computer instructions to infer which lock is intended to guard a shared variable.
    • 分析计算机指令的机制,实现通过并发分析通知类型化分析的程序。 并发指导的类比分析可以模拟由于线程交错而导致的“最坏情况”情况,只要变量未被其预期的保护锁保护,则将变量的模拟状态转换为特殊状态。 在特殊状态下,分析可以假设模拟变量的状态是处理操作的最差可能状态,这可能导致根据变量状态的错误。 因此,所执行的分析可以假设在状态相关操作中引用变量,而变量的模拟状态处于特殊状态可能导致错误,并且分析可能相应地产生警告。 分析可以处理计算机指令以推断哪个锁旨在保护共享变量。
    • 5. 发明申请
    • Model Based Hint Generation For Lithographic Friendly Design
    • 用于光刻友好设计的基于模型的提示生成
    • US20100023916A1
    • 2010-01-28
    • US12416077
    • 2009-03-31
    • Marko P. ChewYue YangJuan Andres Torres Robles
    • Marko P. ChewYue YangJuan Andres Torres Robles
    • G06F17/50
    • G06F17/5081G06F2217/12Y02P90/265
    • In various implementations of the invention, a model of an optical proximity correction process is employed to determine potential adjustments to a layout design for a mask that might resolve potential errors an image resulting from application of the mask in an optical lithographic process. In various implementations of the invention, corrected mask shapes, such as for example optical proximity corrected mask shapes, and associated printed image contours are generated through use of a model. Subsequently, the associated printed image contour and a desired printed image contour may be used to determine various edge segment adjustments to the corrected mask shapes that would realize the desired printed image contour. In various implementations of the present invention, the model for generation of the corrected mask shapes and the associated printed image contour is a square kernel model. With various implementations of the invention, the kernel represents a grey scale map wherein each pixel of the map is generated based on the desired displacement relative to the displacement to be modeled. For example by application of linear regression techniques. As a result, printed image contours and corrected mask shapes may be generated based upon an input layout design, wherein potential adjustments to the mask may be determined based upon a desired printed image contour.
    • 在本发明的各种实施方案中,采用光学邻近校正处理的模型来确定对于掩模的布局设计的潜在调整,该掩模可以解决由于在光学平版印刷工艺中应用掩模而产生的图像的潜在错误。 在本发明的各种实现中,通过使用模型来生成校正的掩模形状,例如光学邻近校正的掩模形状和相关的打印的图像轮廓。 随后,可以使用相关联的打印图像轮廓和期望的打印图像轮廓来确定将实现期望的打印图像轮廓的校正的蒙版形状的各种边缘段调整。 在本发明的各种实现中,用于生成校正的掩模形状的模型和相关联的打印图像轮廓是平方内核模型。 通过本发明的各种实现,内核表示灰度图,其中基于相对于要建模的位移的期望位移来生成地图的每个像素。 例如通过应用线性回归技术。 结果,可以基于输入布局设计来生成打印图像轮廓和校正的掩模形状,其中可以基于期望的打印图像轮廓来确定对掩模的潜在调整。
    • 7. 发明申请
    • METAL SILICOALUMINOPHOSPHATE MOLECULAR SIEVE WITH RHO FRAMEWORK STRUCTURE, AND METHOD FOR PREPARING THE SAME
    • 具有RHO框架结构的金属硅烷基磷酸酯分子筛及其制备方法
    • US20150147269A1
    • 2015-05-28
    • US14405957
    • 2012-06-08
    • Peng TianXiong SuZhongmin LiuDong FanYing ZhangYue Yang
    • Peng TianXiong SuZhongmin LiuDong FanYing ZhangYue Yang
    • C01B39/54B01J20/30B01J20/18B01J37/08B01J29/85
    • C01B39/54B01J20/18B01J20/3078B01J29/85B01J37/082
    • The present invention relates to a metal silicoaluminophosphate molecular sieve MeAPSO with a RHO framework structure and a preparation method thereof. The metal silicoaluminophosphate molecular sieve is characterized in that: the metal atoms are at least one of vanadium, copper, molybdenum, zirconium, cobalt, manganese, magnesium, iron, nickel and zinc. The chemical composition of said metal silicoaluminophosphate molecular sieve in anhydrous state is expressed as: mR.nMe.(SixAlyPz)O2, where R represents template existed in molecular sieve micropores, m is the molar number of said template per one molar of (SixAlyPz)O2, m=0.1˜0.5; Me represents metal atom entering into said metal silicoaluminophosphate molecular sieve framework, n is the molar number of Me per one molar of (SixAlyPz)O2, n=0.001˜0.30. Said metal silicoaluminophosphate molecular sieve has ion exchange performance and adsorption performance. The catalyst prepared from said metal silicoaluminophosphate molecular sieve can be applicable to multiple hydrocarbon reactions, such as catalytic cracking, reforming, polymerization, alkylation, transalkylation, isomerization, dehydrogenation, hydrogenation and the like.
    • 本发明涉及具有RHO骨架结构的金属硅铝磷酸盐分子筛MeAPSO及其制备方法。 金属硅铝磷酸盐分子筛的特征在于:金属原子是钒,铜,钼,锆,钴,锰,镁,铁,镍和锌中的至少一种。 所述金属硅铝磷酸盐分子筛的无水状态的化学成分表示为:mR.nMe(SixAlyPz)O 2,其中R表示模板存在于分子筛微孔中,m是每摩尔(SixAlyPz)的所述模板的摩尔数, O2,m = 0.1〜0.5; Me表示进入所述金属硅铝磷酸盐分子筛骨架的金属原子,n是每摩尔(SixAlyPz)O 2的Me的摩尔数,n = 0.001〜0.30。 所述金属硅铝磷酸盐分子筛具有离子交换性能和吸附性能。 由所述金属硅铝磷酸盐分子筛制备的催化剂可用于多个烃反应,如催化裂化,重整,聚合,烷基化,烷基转移,异构化,脱氢,氢化等。
    • 9. 发明授权
    • Detecting data race and atomicity violation via typestate-guided static analysis
    • 通过类型指导静态分析检测数据竞争和原子性违规
    • US08510722B2
    • 2013-08-13
    • US12507230
    • 2009-07-22
    • Yue YangAnna GringauzeDinghao WuHenning K. Rohde
    • Yue YangAnna GringauzeDinghao WuHenning K. Rohde
    • G06F9/44
    • G06F11/3608
    • Mechanisms for analyzing computer instructions implementing a program in which typestate analysis is informed by concurrency analysis. The concurrency-guided typestate analysis may simulate the “worst case” scenario due to thread interleaving by transitioning a simulated state of the variable to a special state whenever the variable is not guarded by its intended guarding lock. While in the special state, the analysis may assume that the state of the simulated variable is the worst possible state with respect to processing operations that may lead to an error depending on the state of the variable. Thus, the analysis performed may assume that referencing the variable in a state-dependent operation while the simulated state of the variable is in the special state may lead to an error, and the analysis may generate a warning, accordingly. The analysis may process the computer instructions to infer which lock is intended to guard a shared variable.
    • 分析计算机指令的机制,实现通过并发分析通知类型化分析的程序。 并发指导的类比分析可以模拟由于线程交错而导致的“最坏情况”情况,只要变量未被其预期的保护锁保护,则将变量的模拟状态转换为特殊状态。 在特殊状态下,分析可以假设模拟变量的状态是处理操作的最差可能状态,这可能导致根据变量状态的错误。 因此,所执行的分析可以假设在状态相关操作中引用变量,而变量的模拟状态处于特殊状态可能导致错误,并且分析可能相应地产生警告。 分析可以处理计算机指令以推断哪个锁旨在保护共享变量。
    • 10. 发明授权
    • Induction hardening monitoring apparatus
    • 感应淬火监测仪
    • US08497454B2
    • 2013-07-30
    • US12677709
    • 2008-09-10
    • Yue YangFumiaki IkutaTaichi Kitamura
    • Yue YangFumiaki IkutaTaichi Kitamura
    • H05B6/10
    • C21D1/42C21D1/10C21D11/00Y02P10/253
    • An induction hardening monitoring apparatus (20) comprising: a current sensor (21) for detecting output current from a high-frequency inverter (11); a voltage sensor for detecting a voltage generated in a heating coil (14) connected between output terminals of the high-frequency inverters (11) together with a capacitor (12) in an equivalent circuit manner; and a controller (23) for monitoring a hardening processing based on a detection signal from the current sensor (21) and a detection signal from a voltage sensor (22), wherein the controller (23) monitors a hardening processing by calculating an effective value of output current from the high-frequency inverter (11) based on a detection signal from the current sensor (21) and calculating an effective value of voltage generated in a heating coil (14) based on a detection signal from the voltage sensor (22); or further calculating load impedance based on each effective value.
    • 一种感应淬火监测装置(20),包括:用于检测来自高频逆变器(11)的输出电流的电流传感器(21); 电压传感器,用于以等效电路方式检测在高频逆变器(11)的输出端子与电容器(12)之间连接的加热线圈(14)中产生的电压; 以及控制器(23),用于基于来自电流传感器(21)的检测信号和来自电压传感器(22)的检测信号来监视硬化处理,其中控制器(23)通过计算有效值来监视硬化处理 基于来自电流传感器(21)的检测信号,从高频逆变器(11)输出的输出电流,根据来自电压传感器(22)的检测信号,计算加热线圈(14)中产生的电压的有效值 ); 或基于每个有效值进一步计算负载阻抗。