专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07241707B2 Layered films formed by controlled phase segregation 有权
标题翻译：通过控制相分离形成的层状膜
公开(公告)号：US07241707B2
公开(公告)日：2007-07-10
申请号：US11060843
申请日：2005-02-17
申请人： Robert P. Meagley , Michael J. Leeson , Michael D. Goodner , Bob E. Leet , Michael L. McSwiney , Shan C. Clark
发明人： Robert P. Meagley , Michael J. Leeson , Michael D. Goodner , Bob E. Leet , Michael L. McSwiney , Shan C. Clark
IPC分类号： H01L21/469
CPC分类号： H01L21/76808 , G03F7/091 , H01L21/0276 , H01L21/31144 , H01L21/76822 , H01L21/76829 , H01L21/76834 , H01L21/76835
摘要： Multiple-layer films in integrated circuit processing may be formed by the phase segregation of a single composition formed above a semiconductor substrate. The composition is then induced to phase segregate into at least a first continuous phase and a second continuous phase. The composition may be formed of two or more components that phase segregate into different continuous layers. The composition may also be a single component that breaks down upon activation into two or more components that phase segregate into different continuous layers. Phase segregation may be used to form, for example, a sacrificial light absorbing material (SLAM) and a developer resistant skin, a dielectric layer and a hard mask, a photoresist and an anti-reflective coating (ARC), a stress buffer coating and a protective layer on a substrate package, and light interference layers.
摘要翻译：集成电路处理中的多层膜可以通过在半导体衬底上形成的单一组合物的相分离来形成。然后将组合物诱导相分离成至少第一连续相和第二连续相。组合物可以由相分离成不同连续层的两种或更多种组分形成。组合物还可以是单一组分，其在活化时分解成两个或多个相分离成不同连续层的组分。相分离可以用于形成例如牺牲光吸收材料（SLAM）和显影剂抗性皮肤，电介质层和硬掩模，光致抗蚀剂和抗反射涂层（ARC），应力缓冲涂层和衬底封装上的保护层，以及光干涉层。

2. 发明授权

US07241560B2 Basic quencher/developer solutions for photoresists 失效
标题翻译：用于光致抗蚀剂的基本猝灭剂/显影剂溶液
公开(公告)号：US07241560B2
公开(公告)日：2007-07-10
申请号：US11143126
申请日：2005-06-01
申请人： Shan C. Clark , Kim-Khanh Ho , James S. Clarke , Ernisse S. Putna , Wang S. Yueh , Robert P. Meagley
发明人： Shan C. Clark , Kim-Khanh Ho , James S. Clarke , Ernisse S. Putna , Wang S. Yueh , Robert P. Meagley
IPC分类号： G03F7/36
CPC分类号： G03F7/327
摘要： A basic developer/quencher solution formulated to include at least one supercritical fluid or liquid solvent and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The supercritical fluid or liquid solvent may be carbon dioxide and the base may be quaternary ammonium salt that has side groups that increase the solubility of the quaternary ammonium salt in carbon dioxide.
摘要翻译：配制成包括至少一种超临界流体或液体溶剂和碱的基本显影剂/猝灭剂溶液可用于淬灭光致抗蚀剂内的光生酸，以及显影光致抗蚀剂。超临界流体或液体溶剂可以是二氧化碳，碱可以是具有增加季铵盐在二氧化碳中的溶解度的侧基的季铵盐。

3. 发明授权

US07361455B2 Anti-reflective coatings 有权
标题翻译：防反射涂层
公开(公告)号：US07361455B2
公开(公告)日：2008-04-22
申请号：US10815528
申请日：2004-03-31
申请人： Shan C. Clark , Ernisse S. Putna , Robert P. Meagley
发明人： Shan C. Clark , Ernisse S. Putna , Robert P. Meagley
IPC分类号： G03F7/36
CPC分类号： G03F7/091 , G03F7/40
摘要： Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light or electrons. The radiation beam path altering additive may be a reflective material or a refractive material. The inclusion of such a radiation beam bath altering additive may reduce line width roughness and increase critical dimension (CD) control of interconnect lines and vias.
摘要翻译：防反射材料如底部抗反射涂层（BARC）和牺牲光吸收材料（SLAM）可以更有效地通过在抗反射材料中包含添加剂来改变基底的相干光或电子束反射，从而改变反射光或电子的辐射束路径。辐射束路径改变添加剂可以是反射材料或折射材料。包含这种辐射束浴改变添加剂可以减小线宽粗糙度并增加互连线和通孔的临界尺寸（CD）控制。

4. 发明授权

US08017568B2 Cleaning residues from semiconductor structures 有权
标题翻译：清理半导体结构残留物
公开(公告)号：US08017568B2
公开(公告)日：2011-09-13
申请号：US10376874
申请日：2003-02-28
申请人： Shan C. Clark , Vijayakumar S. Ramachandrarao , Robert B. Turkot, Jr.
发明人： Shan C. Clark , Vijayakumar S. Ramachandrarao , Robert B. Turkot, Jr.
IPC分类号： C11D7/50
CPC分类号： C11D11/0047 , C11D3/3947
摘要： Supercritical carbon dioxide may be utilized to remove resistant residues such as those residues left when etching dielectrics in fluorine-based plasma gases. The supercritical carbon dioxide may include an oxidizer in one embodiment.
摘要翻译：可以使用超临界二氧化碳去除耐蚀残留物，例如当在基于氟的等离子体气体中蚀刻电介质时留下的那些残留物。在一个实施方案中，超临界二氧化碳可以包括氧化剂。

5. 发明授权

US06409316B1 Thermal ink jet printhead with crosslinked polymer layer 失效
标题翻译：具有交联聚合物层的热喷墨打印头
公开(公告)号：US06409316B1
公开(公告)日：2002-06-25
申请号：US09536803
申请日：2000-03-28
申请人： Shan C. Clark , Thomas W. Smith
发明人： Shan C. Clark , Thomas W. Smith
IPC分类号： B41J205
CPC分类号： B41J2/1635 , B41J2/1604 , B41J2/1623 , B41J2/1626 , B41J2/1631 , B41J2/1642 , B41J2/1645 , B41J2202/03
摘要： A thermal ink jet printhead having an upper substrate and a lower substrate in which one surface thereof has an array of heating elements and addressing electrodes formed thereon. The lower substrate has an insulative layer deposited on the surface thereof and over the heating elements and addressing electrodes and patterned to form recesses therethrough to expose the heating elements and terminal ends of the addressing electrodes. The upper and lower substrates are bonded together to form a thermal ink jet printhead having droplet emitting nozzles defined by the upper substrate, the insulative layer on the lower substrate, and the heating elements in the lower substrate. At least one of the upper substrate and the insulative layer comprises a crosslinked polymer formed by crosslinking a precursor polymer which is a phenolic novolac resin having glycidyl ether functional groups on the monomer repeat units thereof.
摘要翻译：一种具有上基板和下基板的热喷墨打印头，其中一个表面具有形成在其上的加热元件阵列和寻址电极。下基板具有沉积在其表面上并且在加热元件和寻址电极之上并且被图案化以形成通过其以暴露寻址电极的加热元件和末端的凹部的绝缘层。上下基板结合在一起以形成具有由上基板，下基板上的绝缘层和下基板中的加热元件限定的液滴发射喷嘴的热喷墨打印头。上基板和绝缘层中的至少一个包括通过在其单体重复单元上交联具有缩水甘油醚官能团的酚醛清漆树脂的前体聚合物形成的交联聚合物。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式