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1. 发明申请

US20130082189A1 PRE-ALIGNED MULTI-BEAM NOZZLE/SKIMMER MODULE 审中-公开
标题翻译：预先对准的多光束喷嘴/滑块模块
公开(公告)号：US20130082189A1
公开(公告)日：2013-04-04
申请号：US13250553
申请日：2011-09-30
申请人： Robert K. Becker , Avrum Freytsis , Matthew Gwinn
发明人： Robert K. Becker , Avrum Freytsis , Matthew Gwinn
IPC分类号： H01J27/02 , B05B1/14
CPC分类号： H01J37/08 , H01J27/024 , H01J2237/006 , H01J2237/0812 , H01J2237/0822
摘要： A pre-aligned multi-output nozzle/skimmer (PMNS) module includes a pre-aligned nozzle assembly having at least two nozzles and a pre-aligned skimmer subassembly. The PMNS module can be pre-aligned to more accurately position a Multi-Beam Gas Cluster Ion Beam (MBGCIB), and to more accurately control the formation of the multi-beam gas clusters of a pre-aligned MBGCIB.
摘要翻译：预排列的多输出喷嘴/分离器（PMNS）模块包括具有至少两个喷嘴和预对准撇油器子组件的预对准喷嘴组件。可以预先对准PMNS模块以更准确地定位多束气体簇离子束（MBGCIB），并更准确地控制预对准MBGCIB的多光束气体簇的形成。

2. 发明授权

US08304033B2 Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles 有权
标题翻译：用多个气体喷嘴形成的气体簇离子束照射基板的方法
公开(公告)号：US08304033B2
公开(公告)日：2012-11-06
申请号：US12428973
申请日：2009-04-23
申请人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
发明人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
IPC分类号： C23C14/10 , C23C14/48 , C23C14/14 , B05D3/06 , H01L21/263 , C23C14/08 , H01L21/423 , H01L21/425 , H01L21/265
CPC分类号： H01J37/08 , H01J37/317 , H01J2237/061 , H01J2237/0812 , H01J2237/0825 , H01J2237/0827
摘要： Disclosed are methods of operation to grow, modify, deposit, or dope a layer upon a substrate using a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system. Also disclosed is a method of forming a shallow trench isolation (STI) structure on a substrate, for example, an SiO2 STI structure, using a multiple nozzle system with two separate gas supplies, for example providing a silicon-containing gas and an oxygen-containing gas.
摘要翻译：公开了使用多喷嘴和撇渣器组件在基底上生长，改性，沉积或掺杂层的操作方法，用于在气体簇离子束（GCIB）系统中引入工艺气体混合物或多种工艺气体混合物。还公开了一种在衬底上形成浅沟槽隔离（STI）结构的方法，例如使用具有两个单独气体供应的多喷嘴系统的SiO 2 STI结构，例如提供含硅气体和含氧气体，含气。

3. 发明申请

US20100243913A1 PRE-ALIGNED NOZZLE/SKIMMER 审中-公开
标题翻译：预对准喷嘴/ SKIMMER
公开(公告)号：US20100243913A1
公开(公告)日：2010-09-30
申请号：US12415883
申请日：2009-03-31
申请人： Robert K. Becker , Avrum Freytsis
发明人： Robert K. Becker , Avrum Freytsis
IPC分类号： H01J27/00 , G21K1/00 , A61N5/00
CPC分类号： H01J37/3002 , G21K2201/00 , H01J37/08 , H01J37/30 , H01J2237/006 , H01J2237/061 , H01J2237/0812 , Y10T29/49769 , Y10T29/49826
摘要： The pre-aligned nozzle/skimmer module includes an internal pre-aligned nozzle assembly and internal pre-aligned skimmer cartridge assembly to more accurately control the formation of the Gas Cluster Ion Beam (GCIB). The nozzle/skimmer module can be pre-aligned to more accurately position the GCIB. The pre-aligned nozzle/skimmer module more accurately controls the formation of the gas clusters of a pre-aligned Gas Cluster Ion Beam (GCIB).
摘要翻译：预对准喷嘴/分离器模块包括内部预对准喷嘴组件和内部预对准撇渣器组件，以更精确地控制气体聚簇离子束（GCIB）的形成。喷嘴/撇渣器模块可以进行预对准，以更精确地定位GCIB。预对齐喷嘴/分离器模块更精确地控制预对准气体簇离子束（GCIB）的气体簇的形成。

4. 发明申请

US20100193708A1 METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESS 有权
标题翻译：使用多个喷嘴气体聚集体离子束工艺形成热分离的方法
公开(公告)号：US20100193708A1
公开(公告)日：2010-08-05
申请号：US12428973
申请日：2009-04-23
申请人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
发明人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
IPC分类号： A61N5/00
CPC分类号： H01J37/08 , H01J37/317 , H01J2237/061 , H01J2237/0812 , H01J2237/0825 , H01J2237/0827
摘要： Disclosed are methods of operation to grow, modify, deposit, or dope a layer upon a substrate using a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system. Also disclosed is a method of forming a shallow trench isolation (STI) structure on a substrate, for example, an SiO2 STI structure, using a multiple nozzle system with two separate gas supplies, for example providing a silicon-containing gas and an oxygen-containing gas.
摘要翻译：公开了使用多喷嘴和撇渣器组件在基底上生长，改性，沉积或掺杂层的操作方法，用于在气体簇离子束（GCIB）系统中引入工艺气体混合物或多种工艺气体混合物。还公开了一种在衬底上形成浅沟槽隔离（STI）结构的方法，例如使用具有两个单独气体供应的多喷嘴系统的SiO 2 STI结构，例如提供含硅气体和含氧气体，含气。

5. 发明授权

US08981322B2 Multiple nozzle gas cluster ion beam system 有权
标题翻译：多喷嘴气体簇离子束系统
公开(公告)号：US08981322B2
公开(公告)日：2015-03-17
申请号：US12428945
申请日：2009-04-23
申请人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
发明人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
IPC分类号： G21K5/04 , H01J37/08 , H01J37/317
CPC分类号： H01J37/08 , H01J37/317 , H01J2237/061 , H01J2237/0812 , H01J2237/0825 , H01J2237/0827
摘要： Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer.
摘要翻译：公开了一种用于在气体簇离子束（GCIB）系统中引入过程气体混合物或多种工艺气体混合物的多喷嘴和撇渣器组件，以及相关的操作方法，用于生长，修饰，沉积或掺杂层底物。多个喷嘴和撇浮器组件包括至少两个彼此非常接近地布置的喷嘴，其至少部分地将从其发射的气体束束至少部分地聚结成单个气体束束和/或成角度以将每个射束朝着单个交叉点收敛以形成一组的交叉气体束束，并将单个和/或相交的气体束束引导到气体分离器中。

6. 发明授权

US08097860B2 Multiple nozzle gas cluster ion beam processing system and method of operating 有权
标题翻译：多喷嘴气体离子束处理系统及其操作方法
公开(公告)号：US08097860B2
公开(公告)日：2012-01-17
申请号：US12732818
申请日：2010-03-26
申请人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
发明人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
IPC分类号： H01J37/317 , H01J49/10 , H01J27/02
CPC分类号： H01J37/08 , C23C14/221 , C23C16/513 , H01J37/305 , H01J37/317 , H01J2237/0812 , H01J2237/0822 , H01J2237/0825 , H01J2237/0827
摘要： A gas cluster ion beam (GCIB) processing system using multiple nozzles for forming and emitting at least one GCIB and methods of operating thereof are described. The GCIB processing system may be configured to treat a substrate, including, but not limited to, doping, growing, depositing, etching, smoothing, amorphizing, or modifying a layer thereupon. Furthermore, the GCIB processing system may be operated to produce a first GCIB and a second GCIB, and to irradiate a substrate simultaneously and/or sequentially with the first GCIB and second GCIB.
摘要翻译：描述了使用多个喷嘴形成和发射至少一个GCIB的气体簇离子束（GCIB）处理系统及其操作方法。 GCIB处理系统可以被配置为处理衬底，包括但不限于掺杂，生长，沉积，蚀刻，平滑化，非晶化或修饰其上的层。此外，可以操作GCIB处理系统以产生第一GCIB和第二GCIB，并且与第一GCIB和第二GCIB同时和/或顺序地照射基板。

7. 发明申请

US20100193701A1 MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM 有权
标题翻译：多喷嘴气体离子束系统
公开(公告)号：US20100193701A1
公开(公告)日：2010-08-05
申请号：US12428945
申请日：2009-04-23
申请人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
发明人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
IPC分类号： H01J27/00 , G21K1/00
CPC分类号： H01J37/08 , H01J37/317 , H01J2237/061 , H01J2237/0812 , H01J2237/0825 , H01J2237/0827
摘要： Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer.
摘要翻译：公开了一种用于在气体簇离子束（GCIB）系统中引入过程气体混合物或多种工艺气体混合物的多喷嘴和撇渣器组件，以及相关的操作方法，用于生长，修饰，沉积或掺杂层底物。多个喷嘴和撇浮器组件包括至少两个彼此非常接近地布置的喷嘴，其至少部分地将从其发射的气体束束至少部分地聚结成单个气体束束和/或成角度以将每个射束朝着单个交叉点收敛以形成一组的交叉气体束束，并将单个和/或相交的气体束束引导到气体分离器中。

8. 发明申请

US20100193472A1 MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD OF OPERATING 有权
标题翻译：多喷嘴气体离子束加工系统及其操作方法
公开(公告)号：US20100193472A1
公开(公告)日：2010-08-05
申请号：US12732818
申请日：2010-03-26
申请人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
发明人： Martin D. Tabat , Matthew C. Gwinn , Robert K. Becker , Avrum Freytsis , Michael Graf
IPC分类号： H01J37/317 , H01J37/02 , H01J37/305 , C23F1/02 , C23C14/48
CPC分类号： H01J37/08 , C23C14/221 , C23C16/513 , H01J37/305 , H01J37/317 , H01J2237/0812 , H01J2237/0822 , H01J2237/0825 , H01J2237/0827
摘要： A gas cluster ion beam (GCIB) processing system using multiple nozzles for forming and emitting at least one GCIB and methods of operating thereof are described. The GCIB processing system may be configured to treat a substrate, including, but not limited to, doping, growing, depositing, etching, smoothing, amorphizing, or modifying a layer thereupon. Furthermore, the GCIB processing system may be operated to produce a first GCIB and a second GCIB, and to irradiate a substrate simultaneously and/or sequentially with the first GCIB and second GCIB.
摘要翻译：描述了使用多个喷嘴形成和发射至少一个GCIB的气体簇离子束（GCIB）处理系统及其操作方法。 GCIB处理系统可以被配置为处理衬底，包括但不限于掺杂，生长，沉积，蚀刻，平滑化，非晶化或修饰其上的层。此外，可以操作GCIB处理系统以产生第一GCIB和第二GCIB，并且与第一GCIB和第二GCIB同时和/或顺序地照射基板。

9. 发明授权

US06676989B2 Method and system for improving the effectiveness of medical stents by the application of gas cluster ion beam technology 有权
标题翻译：应用气体离子束技术提高医疗支架有效性的方法和系统
公开(公告)号：US06676989B2
公开(公告)日：2004-01-13
申请号：US09901204
申请日：2001-07-09
申请人： Allen R. Kirkpatrick , Robert K. Becker , Avrum Freytsis
发明人： Allen R. Kirkpatrick , Robert K. Becker , Avrum Freytsis
IPC分类号： B05D300
CPC分类号： C23F3/00 , A61F2/91 , H01J2237/0812
摘要： Numerous studies suggest that the current popular designs of coronary stents are functionally equivalent and suffer a 16 to 22 percent rate of restenosis. Although the use of coronary stents is growing, the benefits of their use remain controversial in certain clinical situations or indications due to their potential complications. The application of gas cluster ion beam (GCIB) surface modification such as smoothing or cleaning appears to reduce these complications and lead to genuine cost savings and an improvement in patient quality of life. The present invention is directed to the use of GCIB surface modification to overcome prior problems of thrombosis and restenosis. The atomic level surface smoothing of stents utilizing GCIB substantially reduces undesirable surface micro-roughness in medical coronary stents.
摘要翻译：许多研究表明，目前流行的冠状动脉支架设计在功能上是相当的，并且再狭窄率为16％至22％。虽然冠状动脉支架的使用正在增长，但由于其潜在的并发症，其使用的益处在某些临床情况或适应证中仍然存在争议。气体簇离子束（GCIB）表面改性（如平滑或清洁）的应用似乎可以减少这些并发症，并导致真正的成本节约和改善患者的生活质量。本发明涉及使用GCIB表面修饰来克服血栓形成和再狭窄的先前问题。使用GCIB的支架的原子水平表面平滑化大大降低了医疗冠状动脉支架中不期望的表面微粗糙度。

10. 发明授权

US08338806B2 Gas cluster ion beam system with rapid gas switching apparatus 有权
标题翻译：具有快速气体开关装置的气体簇离子束系统
公开(公告)号：US08338806B2
公开(公告)日：2012-12-25
申请号：US12774051
申请日：2010-05-05
申请人： Michael Graf , Robert K. Becker , Christopher T. Reddy , Noel Russell
发明人： Michael Graf , Robert K. Becker , Christopher T. Reddy , Noel Russell
IPC分类号： A61N5/00
CPC分类号： H01J37/08 , H01J27/026 , H01J37/3171 , H01J2237/006 , H01J2237/0812
摘要： A processing system is provided for irradiating a substrate with a gas cluster ion beam (GCIB). The system includes a nozzle for forming and emitting gas cluster beams through a nozzle outlet, and a stagnation chamber that is located upstream of and adjacent the nozzle. The stagnation chamber has an inlet, and the nozzle is configured to direct a single gas cluster beam toward the substrate. An ionizer is positioned downstream of the outlet and is configured to ionize the gas cluster beam to form the GCIB. The system also includes a gas supply that is in fluid communication with the inlet of the stagnation chamber, and which includes a gas source and a valve located between the gas source and the nozzle for controlling flow of a gas between the gas source and the nozzle.
摘要翻译：提供了用气体簇离子束（GCIB）照射衬底的处理系统。该系统包括用于通过喷嘴出口形成和发射气体束的喷嘴，以及位于喷嘴的上游和邻近喷嘴的停滞室。停滞室具有入口，并且喷嘴构造成将单个气体束束引向基板。离子发生器位于出口的下游，并被配置为电离气体簇束以形成GCIB。该系统还包括与停滞室的入口流体连通的气体源，其包括气体源和位于气体源和喷嘴之间的阀，用于控制气体源和喷嘴之间的气体流动。

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