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    • 10. 发明申请
    • Coating process for microfluidic sample arrays
    • 微流体样品阵列的涂布工艺
    • US20060105453A1
    • 2006-05-18
    • US11198882
    • 2005-08-04
    • Colin BrenanJamie ChoJavier GarciaRobert HessTanya KaniganArrin KatzNamyong KimJohn LintonShailesh SrivastavaKarl Yoder
    • Colin BrenanJamie ChoJavier GarciaRobert HessTanya KaniganArrin KatzNamyong KimJohn LintonShailesh SrivastavaKarl Yoder
    • C12N5/00
    • B01J19/0046B01J2219/0059B01J2219/00596B01J2219/00659B01L3/0244B01L3/5025B01L3/50857B01L2200/12B01L2200/16B01L2300/16
    • A differentially coated device for conducting a plurality of nano-volume specified reactions, the device comprising a platen having at least one exterior surface modified to a specified physicochemical property, a plurality of nano-volume channels, each nano-volume channel having at least one interior surface in communication with the at least one exterior surface that is selectively coated with an optionally dissolvable coating agent physisorbed to at least one interior surface, wherein the optionally dissolvable coating agent comprises a coating agent and a first component for the plurality of specified reactions. Methods for preparing and using such devices are also provided, as well as a method of registering a location of a dispenser array in relation to a microfluidic array. A first one of the dispenser array and the microfluidic array is movable in relation to the frame, and the other of the first one of the dispenser array and the microfluidic array is fixed relative to the frame. Quantities related to a vector displacement from the alignment position to a fixed position on the one of the dispenser array and the microfluidic array is determined. The quantities thus determined are used to guide positioning of the dispenser array relative to the microfluidic array.
    • 一种用于进行多个纳米体积规定的反应的差异涂覆的装置,所述装置包括具有至少一个被修饰至指定理化特性的外表面的压板,多个纳米体积通道,每个纳米体积通道具有至少一个 与所述至少一个外表面连通的内表面,其被选择性地涂覆有物理吸附到至少一个内表面上的任选可溶解的涂覆剂,其中所述任选可溶解的涂覆剂包含涂层剂和用于多个特定反应的第一组分。 还提供了用于制备和使用这种装置的方法,以及相对于微流体阵列登记分配器阵列的位置的方法。 分配器阵列和微流体阵列中的第一个可相对于框架移动,并且分配器阵列和微流体阵列中的第一个中的另一个相对于框架是固定的。 确定与分配器阵列和微流体阵列之一上的对准位置到固定位置的矢量位移有关的量。 这样确定的量用于引导分配器阵列相对于微流体阵列的定位。