会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Applications and fabrication techniques for large scale wire grid polarizers
    • 大尺寸线栅偏振器的应用和制造技术
    • US07561332B2
    • 2009-07-14
    • US11289660
    • 2005-11-28
    • Michael J. LittleCharles W. McLaughlin
    • Michael J. LittleCharles W. McLaughlin
    • G02B5/30
    • B82Y30/00G02B5/3058
    • A wire grid polarizer may be fabricated by forming plurality of substantially-straight metallic lines of predetermined periodicity Λ on a thin film substrate A plurality of substantially straight nanometer-scale periodic surface relief structures is created on a surface of the substrate. The periodic surface relief structures cover a region greater than about 4 centimeters in length and greater than about 4 centimeters in width, wherein the periodicity Λ is between about 10 nanometers and about 500 nanometers. One or more layers of material are formed on the periodic relief structures. The one or more layers include one or more conductor materials that form the plurality of substantially straight metallic lines over a region of the substrate greater than about 4 centimeters in length and greater than about 4 centimeters in width.
    • 线栅偏振器可以通过在薄膜基板上形成预定周期性λ的多个基本上直的金属线来制造。在基板的表面上形成多个基本上直的纳米级的周期性表面浮雕结构。 周期性表面浮雕结构覆盖长度大于约4厘米并且宽度大于约4厘米的区域,其中周期Lambda在约10纳米至约500纳米之间。 在周期性浮雕结构上形成一层或多层材料。 一个或多个层包括一个或多个导体材料,其在衬底的区域上形成大于约4厘米长和大于约4厘米宽度的多个基本上直的金属线。
    • 6. 发明授权
    • Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths
    • 用于形成用于光学和红外波长的线栅偏振器的非光刻方法
    • US07351346B2
    • 2008-04-01
    • US11001449
    • 2004-11-30
    • Michael J. Little
    • Michael J. Little
    • C23F1/00B44C1/22
    • G02B5/3058
    • A method for forming a plurality of parallel metal lines on a substrate of thin film elastomeric material and a wire grid polarizer formed by such method. A sacrificial layer is formed by coating the substrate with a water soluble polymer while the substrate is stretched. The existing tensile force is removed, leaving an undulating topology of buckled sacrificial layer material. A masking layer is then deposited at an oblique angle and then fractured into parallel lines of material by application of a second tensile force. Unmasked portions of the sacrificial layer are removed by dry etch. A metallic layer is then deposited and a lift off process employed to remove remaining portions of the sacrificial layer and materials deposited thereover. Upon removal of the second tensile force, the substrate returns to its unstressed length with metal lines of predetermined periodicity thereon.
    • 一种用于在薄膜弹性体材料的基底上形成多条平行金属线的方法和通过这种方法形成的线栅偏振器。 牺牲层通过在将基材拉伸时用水溶性聚合物涂布基板而形成。 消除现有的拉力,留下起伏的牺牲层材料的拓扑结构。 然后将掩模层以倾斜角度沉积,然后通过施加第二张力而断裂成平行的材料线。 通过干蚀刻去除牺牲层的未掩模部分。 然后沉积金属层,并采用剥离工艺去除牺牲层的剩余部分和沉积在其上的材料。 在去除第二张力时,衬底在其上以预定周期的金属线返回到其不受应力的长度。
    • 7. 发明授权
    • Monolithic 2D optical switch and method of fabrication
    • 单片2D光开关及其制作方法
    • US06430333B1
    • 2002-08-06
    • US09550077
    • 2000-04-14
    • Michael J. LittleAndrei M. Shkel
    • Michael J. LittleAndrei M. Shkel
    • G02B626
    • G02B6/3584G02B6/32G02B6/3512G02B6/3546G02B6/357G02B6/3582
    • A sequence of MEMS processing steps are used to construct a 2D optical switch on a single substrate. In a typical optical switch configuration, an array of hinged micromirrors are supported by an array of posts at a 45° angle to the input and output optical paths and positioned parallel to the substrate either above, below or, perhaps, in the optical paths. The application of a voltage between the mirror and its control electrodes switches the mirror to a vertical position where it intercepts and deflects light travelling down the optical paths. The posts are suitably oriented at a 90° angle with respect to the mirror hinges so that they do not interfere with the optical paths and, may be configured to function as baffles to reduce crosstalk between adjacent optical paths.
    • 使用一系列MEMS处理步骤在单个基板上构造2D光开关。 在典型的光开关配置中,铰链式微镜阵列由与输入和输出光路成45°角的支柱阵列支撑,并且在光路上方或下方(或许在光路上)平行于衬底定位。 在反射镜和其控制电极之间施加电压将反射镜切换到垂直位置,在该垂直位置上它拦截并偏转沿着光路行进的光。 柱相对于镜面铰链适当地定向成90°角,使得它们不干涉光路,并且可以被配置为用作挡板以减少相邻光路之间的串扰。
    • 10. 发明授权
    • Means and method for inducing uniform parallel alignment of liquid
crystal material in a liquid crystal cell
    • 用于在液晶单元中引起液晶材料的均匀平行排列的方法和方法
    • US4153529A
    • 1979-05-08
    • US570303
    • 1975-04-21
    • Michael J. LittleHugh L. GarvinYat-Shir Lee
    • Michael J. LittleHugh L. GarvinYat-Shir Lee
    • G02F1/1337C23C15/00G02F1/13
    • G02F1/13378G02F1/133734
    • Electrode surfaces are coated with a passivating material (silicon dioxide, aluminum oxide or titanium dioxide) or with a reflecting material (chromium or chromium and gold) or with a special alignment material (carbon) using standard vacuum sputtering, vacuum evaporation, electrodeposition, or chemical vapor deposition techniques. After sufficient thickness of material has been deposited, the substrate is exposed to a broad or narrow beam of neutralized argon ions of a few kilo-electron-volts energy. The beam of argon ions is incident at a grazing angle to the surface, typically 20.degree.. Exposure of the overcoating results in a microscopic condition believed to comprise a "corrugated" surface with "ridges" and "valleys" parallel to the direction of the incident beam. These microscopically fine grooves or streaks are (1) reproducibly effective in causing parallel alignment of the liquid crystal molecules, (2) are durable to repeated cleaning procedures and air-bake treatments, and (3) are amenable to production applications in conjunction with vacuum deposition equipment.
    • 电极表面用钝化材料(二氧化硅,氧化铝或二氧化钛)或反射材料(铬或铬和金)或特殊对准材料(碳)涂覆,使用标准真空溅射,真空蒸发,电沉积或 化学气相沉积技术。 在沉积足够厚度的材料之后,将衬底暴露于几千伏特电压能量的宽或窄的中和的氩离子束。 氩离子束以表面的掠角入射,通常为20°。 外涂曝光导致微观状态,认为包含“波纹”表面,其平行于入射光束的方向具有“脊”和“谷”。 这些显微细微的凹槽或条纹是(1)可重复地有效地引起液晶分子的平行排列,(2)耐反复清洁程序和空气烘烤处理,以及(3)适合与真空结合的生产应用 沉积设备。