会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS
    • 使用乙烯基交联剂的抗反射涂层
    • US20070207406A1
    • 2007-09-06
    • US11683309
    • 2007-03-07
    • Douglas GuerreroRamil-Marcelo Mercado
    • Douglas GuerreroRamil-Marcelo Mercado
    • G03C1/00
    • G03F7/091G03F7/0392
    • Novel, developer soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a cross linker, a photoacid generator, and optionally a chromophore. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light (and optionally a post exposure bake), the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers). In one embodiment, the compositions can be used to form ion implant areas in microelectronic substrates.
    • 提供了新型的显影剂可溶性抗反射涂层组合物和使用这些组合物的方法。 组合物包含具有酸官能团并与交联剂,光酸产生剂和任选的发色团一起溶解在溶剂体系中的聚合物和/或低聚物。 优选的酸官能团是羧酸,而优选的交联剂是乙烯基醚交联剂。 在使用中,将组合物施加到基底上并进行热交联。 在曝光(和任选地曝光后烘烤)时,固化的组合物将脱链,使其溶于典型的光致抗蚀剂显影溶液(例如碱性显影剂)中。 在一个实施方案中,组合物可用于在微电子衬底中形成离子注入区域。