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    • 1. 发明授权
    • Optical Shield for liquid crystal devices and method of fabrication
    • 用于液晶装置的光学屏蔽及其制造方法
    • US4837097A
    • 1989-06-06
    • US134334
    • 1987-12-17
    • Ram S. NarangAlain E. PerregauxEugene C. Faucz
    • Ram S. NarangAlain E. PerregauxEugene C. Faucz
    • G02F1/1335
    • G02F1/133509
    • An optical shield for a liquid crystal dot shutter image bar and fabrication process therefor. In one embodiment, a layer of dye-in-photoresist is formed on the interior surface of one of the glass substrates and over the one or more electrodes thereon. The photoresist layer is exposed through a mask and developed to form an optical shield having the desired configuration of optical apertures and a thickness of 2 to 3 micrometers. Alternate embodiments use two separate dye loaded layers that do not react with each other or dissolve in similar solvents. The first layer is dye loaded PMMA layer covered by a dye-in-photoresist. The dye can be selected to filter any desired spectral region.
    • 一种用于液晶点阵快门图像棒的光学屏蔽及其制造方法。 在一个实施例中,在一个玻璃基板的内表面上和其上的一个或多个电极上形成一层光致抗蚀剂染料。 光致抗蚀剂层通过掩模曝光并显影以形成具有所需构造的光学孔径和2至3微米厚度的光学屏蔽。 替代实施方案使用两个不相互反应或溶解在类似溶剂中的分开的染料负载层。 第一层是由染料在光致抗蚀剂中覆盖的染料负载的PMMA层。 可以选择染料来过滤任何所需的光谱区域。
    • 4. 发明授权
    • High performance UV and heat crosslinked or chain extended polymers
    • 高性能UV和热交联或链延长聚合物
    • US06323301B1
    • 2001-11-27
    • US09635913
    • 2000-08-10
    • Thomas W. SmithTimothy J. FullerRam S. NarangDavid J. Luca
    • Thomas W. SmithTimothy J. FullerRam S. NarangDavid J. Luca
    • C08F246
    • B41J2/14032B41J2/14129B41J2202/03G03F7/038G03F7/0388Y10S522/904Y10S522/905
    • Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140° C. and higher, wherein the first substituent is not the same as the second substituent, said polymer being selected from the group consisting of polysulfones, polyphenylenes, polyether sulfones, polyimides, polyamide imides, polyarylene ethers, polyphenylene sulfides, polyarylene ether ketones, phenoxy resins, polycarbonates, polyether imides, polyquinoxalines, polyquinolines, polybenzimidazoles, polybenzoxazoles, polybenzothiazoles, polyoxadiazoles, copolymers thereof, and mixtures thereof.
    • 公开了一种组合物,其包含重均分子量为约1,000至约100,000的聚合物,所述聚合物含有至少一些单体重复单元,其具有第一,赋予光敏性的取代基,其能够在暴露于聚合物时交联或延伸聚合物 所述聚合物还含有第二个赋予热敏感性的第二取代基,该取代基在暴露于约140℃以上的温度下能够进一步交联或链延伸聚合物,其中第一取代基与第二取代基不同 所述聚合物选自聚砜,聚苯醚,聚醚砜,聚酰亚胺,聚酰胺酰亚胺,聚亚芳基醚,聚苯硫醚,聚芳醚酮,苯氧基树脂,聚碳酸酯,聚醚酰亚胺,聚喹喔啉,聚喹啉,聚苯并咪唑,聚苯并恶唑,聚苯并噻唑, 聚唑,共聚物 的,及其混合物。
    • 5. 发明授权
    • Blends containing photosensitive high performance aromatic ether curable
polymers
    • 含有光敏高性能芳香族醚可固化聚合物的混合物
    • US5958995A
    • 1999-09-28
    • US705376
    • 1996-08-29
    • Ram S. NarangTimothy J. Fuller
    • Ram S. NarangTimothy J. Fuller
    • B41J2/16C08F2/46C08J3/28C08L67/00C08L71/00G03F7/032G03F7/038H01L21/027C08L71/12G03F7/004
    • G03F7/032B41J2/1604B41J2/1623B41J2/1628B41J2/1629B41J2/1631B41J2/1632B41J2/1642B41J2/1645G03F7/038G03F7/0388Y10S522/904Y10S522/905
    • Disclosed is a composition for preparing a thermal ink jet printhead which comprises a mixture of (A) a polymer, some monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution measured in milliequivalents photosensitivity-imparting group per gram either (1) a polymer having a second degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degree of photosensitivity-imparting group substitution, or (2) a reactive diluent having at least one photosensitivity-imparting group per molecule and having a fourth degree of photosensitivity-imparting group substitutions measured in milliequivalents of photosensitivity-imparting group per gram, wherein the mixture of the first component and the second component has a fifth degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram which is higher than the first degree of photosensitivity-imparting group substitution and lower than the fourth degree of photosensitivity-imparting group substitution.
    • 公开了一种用于制备热喷墨打印头的组合物,其包含(A)聚合物,其中一些单体重复单元在其上具有至少一个光敏性赋予基团的混合物的混合物,所述聚合物具有第一程度的感光性赋予组取代 以毫克量的光敏感度赋予组每克测量(1)具有第二程度的感光性赋予组取代的聚合物,其以感光性赋予组的毫当量测得的克数低于第一光敏性赋予组取代度,其中所述第二 感光性赋予组取代度可以为零,其中第一组分和第二组分的混合物具有以每克的感光性赋予组的毫当量测量的第三度感光性赋予组取代度,其低于第一程度 光敏性赋予组取代度高 她比第二度的光敏性赋予组取代,或者(2)每分子具有至少一个光敏性赋予组的反应性稀释剂,并且具有在感光性赋予组的毫当量每克中测量的第四度感光性赋予组取代度 其特征在于,所述第一成分和所述第二成分的混合物的感光性赋予组的第五取代度以每摩尔的感光性赋予组的毫当量测定,高于第一感光性赋予组取代度,低于第四组 感光度赋予组取代度。
    • 6. 发明授权
    • Method of fabricating ink jet printheads
    • 制造喷墨打印头的方法
    • US5368683A
    • 1994-11-29
    • US144362
    • 1993-11-02
    • Robert P. AltavelaRam S. NarangDavid J. CollinsJulie A. Sims
    • Robert P. AltavelaRam S. NarangDavid J. CollinsJulie A. Sims
    • B41J2/05B41J2/16H01L21/306B29C37/00B44C1/22
    • B41J2/1603B41J2/1623B41J2/1626B41J2/1632
    • A plurality of ink jet printheads are produced from two aligned and bonded substrates by an improved fabrication method. The confronting surface of one of the substrates contains a plurality of linear arrays of heating elements and driver circuitry, and the confronting surface of the other substrate contains a plurality of sets of shallow channel recesses, reservoir recesses, and alignment openings. Prior to mating of the substrates, the substrate surface having the channel recesses is coated with a layer of thermosetting adhesive, and a thick film layer is deposited on the substrate surface having the heating elements and driver circuitry and patterned to provide a plurality of vias therein at predetermined locations. The vias expose the heating elements, provide ink bypass trenches, and provide a number of groupings of small pits. In one embodiment, the alignment openings are used to visually align and mate the substrates, so that each alignment opening is aligned with a respective one of the groups of small pits in the thick film layer. To prevent misalignment between the substrates before the adhesive layer is cured, a UV curable adhesive is inserted into the alignment openings and into each group of small pits in the thick film layer aligned therewith and cured, thus fastening the substrates together. The fastened substrates are placed in a curing oven without lost of alignment therebetween and the thermosetting adhesive is cured. The bonded substrates are then diced into a plurality of individual printheads.
    • 通过改进的制造方法由两个对准和粘合的基底制造多个喷墨打印头。 一个基板的相对表面包含多个加热元件和驱动电路的线性阵列,另一个基板的相对表面包含多组浅沟道凹槽,储存器凹槽和对准开口。 在配置基板之前,具有通道凹槽的基板表面涂覆有热固性粘合剂层,并且在具有加热元件和驱动器电路的基板表面上沉积厚膜层并且被图案化以在其中提供多个通孔 在预定位置。 通孔暴露加热元件,提供油墨旁路沟槽,并提供多个小坑组。 在一个实施例中,对准开口用于目视地对准和配合基板,使得每个对准开口与厚膜层中的小凹坑组中的相应一个对准。 为了防止粘合剂层固化之前的基板之间的未对准,将UV可固化粘合剂插入到对准开口中并且与对准的厚膜层中的每组小凹坑中进行固化,从而将基板紧固在一起。 将固定的基材放置在固化炉中,而不会在其间失去对准,并且固化热固性粘合剂。 然后将粘合的基材切成多个单独的打印头。
    • 7. 发明授权
    • Aqueous developable high performance curable polymers
    • 水性可显影高性能可固化聚合物
    • US06273543B1
    • 2001-08-14
    • US09247104
    • 1999-02-09
    • Ram S. NarangTimothy J. Fuller
    • Ram S. NarangTimothy J. Fuller
    • B41J201
    • B41J2/1603B41J2/1623B41J2/1628B41J2/1629B41J2/1631B41J2/1632B41J2/1635B41J2/1642B41J2/1645G03F7/00G03F7/038Y10S525/905Y10S525/906Y10S525/907Y10S525/912
    • Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymers.
    • 公开了一种组合物,其包含含有至少一些具有赋予水溶性或水分散性的取代基的单体重复单元的聚合物和具有赋予光敏性的取代基的至少一些单体重复单元,其使得能够在暴露时交联或链延伸聚合物 所述聚合物为脯氨酸,x为整数0或1,A为若干指定基团之一,例如B为若干指定基团之一,例如其混合物,n为代表 重复单体单元。 在一个实施方案中,单个官能团赋予聚合物光敏性和水溶性或分散性。 在另一个实施方案中,第一官能团赋予聚合物光敏性,第二官能团赋予聚合物水溶性或分散性。 还公开了用上述聚合物制备热喷墨打印头的方法。