专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07649635B2 Method for determining a map, device manufacturing method, and lithographic apparatus 有权
标题翻译：用于确定地图的方法，设备制造方法和光刻设备
公开(公告)号：US07649635B2
公开(公告)日：2010-01-19
申请号：US11907571
申请日：2007-10-15
申请人： Hielke Schoonewelle , Marcus Emile Joannes Boonman , Ralph Brinkhof , Martin Jules Marie-Emile De Nivelle , Jan Stoeten , Erwin Antonius Martinus Van Alphen
发明人： Hielke Schoonewelle , Marcus Emile Joannes Boonman , Ralph Brinkhof , Martin Jules Marie-Emile De Nivelle , Jan Stoeten , Erwin Antonius Martinus Van Alphen
IPC分类号： G01B11/24
CPC分类号： G03F9/7034 , G03F9/7011 , G03F9/7019
摘要： A method according to one embodiment of the invention includes determining a map of a second part of a substrate belonging to a group of substrates. The method includes measuring a first part of at least one substrate belonging to the group to create an average profile map or average height map and computing a map of the second part of the substrate belonging to the group, based on the average profile map or the average height map. The computed map is stored for use during a later determination of a height or tilt of a substrate from the group.
摘要翻译：根据本发明的一个实施例的方法包括确定属于一组基底的基底的第二部分的图。该方法包括测量属于该组的至少一个底物的第一部分，以创建平均轮廓图或平均高度图，并基于平均轮廓图或计算属于该组的基底的第二部分的图平均高度图。计算的地图被存储以便在稍后确定来自该组的基底的高度或倾斜度期间使用。

2. 发明授权

US07292351B2 Method for determining a map, device manufacturing method, and lithographic apparatus 有权
标题翻译：用于确定地图的方法，设备制造方法和光刻设备
公开(公告)号：US07292351B2
公开(公告)日：2007-11-06
申请号：US11013202
申请日：2004-12-16
申请人： Hielke Schoonewelle , Marcus Emile Joannes Boonman , Ralph Brinkhof , Martin Jules Marie-Emile De Nivelle , Jan Stoeten , Erwin Antonius Martinus Van Alphen
发明人： Hielke Schoonewelle , Marcus Emile Joannes Boonman , Ralph Brinkhof , Martin Jules Marie-Emile De Nivelle , Jan Stoeten , Erwin Antonius Martinus Van Alphen
IPC分类号： G01B11/24
CPC分类号： G03F9/7034 , G03F9/7011 , G03F9/7019
摘要： A method according to one embodiment of the invention includes determining a map of a second part of a substrate belonging to a group of substrates. The method includes measuring a first part of at least one substrate belonging to the group to create an average profile map or average height map and computing a map of the second part of the substrate belonging to the group, based on the average profile map or the average height map. The computed map is stored for use during a later determination of a height or tilt of a substrate from the group.
摘要翻译：根据本发明的一个实施例的方法包括确定属于一组基底的基底的第二部分的图。该方法包括测量属于该组的至少一个底物的第一部分，以创建平均轮廓图或平均高度图，并基于平均轮廓图或计算属于该组的基底的第二部分的图平均高度图。计算的地图被存储以便在稍后确定来自该组的基底的高度或倾斜度期间使用。

3. 发明授权

US07113257B2 Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus 有权
标题翻译：包括用于确定基板的倾斜和高度中的至少一个的传感器的组件，其方法和光刻投影设备
公开(公告)号：US07113257B2
公开(公告)日：2006-09-26
申请号：US10797570
申请日：2004-03-11
申请人： Ralph Brinkhof , Marcus Emile Joannes Boonman , Martin Jules Marie-Emile De Nivelle
发明人： Ralph Brinkhof , Marcus Emile Joannes Boonman , Martin Jules Marie-Emile De Nivelle
IPC分类号： G03B27/42 , G03B27/52 , G01N21/86 , G01R31/26
CPC分类号： G03F9/7026 , G03F9/7034 , G03F9/7046
摘要： An assembly according to an embodiment of the invention includes a sensor for determining at least one of tilt and height of a surface of a substrate in a lithographic apparatus. The substrate is moveable along at least one path substantially parallel to the surface of the substrate with respect to the sensor. The lithographic apparatus has an exposure scanning direction and the assembly is arranged to move the substrate relative to the sensor along the at least one path and to provide measurement data about the at least one of tilt and height along the at least one path. The assembly includes a memory configured to store the measurement data for use during a later exposure of the substrate by the lithographic apparatus. The at least one path of the substrate is at least partly at an angle to the exposure scanning direction.
摘要翻译：根据本发明的实施例的组件包括用于确定光刻设备中的基板的表面的倾斜度和高度中的至少一个的传感器。衬底可以沿着相对于传感器基本上平行于衬底表面的至少一个路径移动。光刻设备具有曝光扫描方向，并且组件被布置成沿着至少一个路径相对于传感器移动基板，并且提供关于沿着至少一个路径的倾斜和高度中的至少一个的测量数据。组件包括被配置为存储测量数据的存储器，用于在光刻设备稍后曝光衬底期间使用。衬底的至少一个路径至少部分地与曝光扫描方向成一角度。

4. 发明授权

US07113256B2 Lithographic apparatus and device manufacturing method with feed-forward focus control 有权
标题翻译：平版印刷设备和具有前馈焦点控制的设备制造方法
公开(公告)号：US07113256B2
公开(公告)日：2006-09-26
申请号：US10779866
申请日：2004-02-18
申请人： Hans Butler , Marcus Emile Joannes Boonman , Petrus Marinus Christianus Maria Van Den Biggelaar
发明人： Hans Butler , Marcus Emile Joannes Boonman , Petrus Marinus Christianus Maria Van Den Biggelaar
IPC分类号： G03B27/42
CPC分类号： G03F9/7034 , G03F9/7003 , G03F9/7015
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a first support structure configured to support a patterning device, a second support that includes a substrate holder for holding a substrate, a projection system configured to project the patterned beam of radiation onto the substrate, and a servo unit configured to position the substrate holder. The apparatus further includes a sensor unit configured to determine a distance of at least one location point on the surface of the substrate relative to a reference plane, a memory unit configured to store surface information of the substrate based on respective distances of corresponding location points on the substrate surface, and a calculating unit configured to determine a feed-forward set-point signal based on the stored surface information, such that the feed-forward set-point signal is forwardly fed to the servo unit in order to position the substrate holder.
摘要翻译：光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的第一支撑结构，包括用于保持衬底的衬底保持器的第二支撑件，配置成将图案化辐射束投影的投影系统以及构造成定位衬底保持器的伺服单元。所述设备还包括传感器单元，其被配置为确定相对于参考平面的所述基板的表面上的至少一个位置点的距离;存储器单元，其被配置为基于相应位置点的相应距离来存储所述基板的表面信息基板表面，以及计算单元，被配置为基于所存储的表面信息来确定前馈设定点信号，使得前馈设定点信号被向前馈送到伺服单元，以便将基板保持器。

5. 发明授权

US06741331B2 Lithographic apparatus with improved exposure area focus, device manufacturing method, and device manufactured thereby 失效
标题翻译：具有改善曝光面积焦点的光刻设备，装置制造方法以及由此制造的装置
公开(公告)号：US06741331B2
公开(公告)日：2004-05-25
申请号：US10066784
申请日：2002-02-06
申请人： Marcus Emile Joannes Boonman , Johannes Catharinus Hubertus Mulkens , Hans Butler
发明人： Marcus Emile Joannes Boonman , Johannes Catharinus Hubertus Mulkens , Hans Butler
IPC分类号： G03B2754
CPC分类号： G03F7/703 , G03F7/70258
摘要： In a lithographic apparatus the shape of the focal plane is adjusted using available manipulators in the projection lens system so that it is in closer conformity to the shape of the wafer surface in the exposure area. The control of the focal plane shape can be integrated with the leveling control which determines the height and tilt of the wafer surface.
摘要翻译：在光刻设备中，使用投影透镜系统中的可用操纵器来调整焦平面的形状，使得其在曝光区域中更接近于晶片表面的形状。焦平面形状的控制可以与确定晶片表面的高度和倾斜度的调平控制集成。

6. 发明授权

US07564536B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07564536B2
公开(公告)日：2009-07-21
申请号：US11268777
申请日：2005-11-08
申请人： Joost Jeroen Ottens , Marcus Emile Joannes Boonman , Thomas Josephus Maria Castenmiller , Andre Bernardus Jeunink
发明人： Joost Jeroen Ottens , Marcus Emile Joannes Boonman , Thomas Josephus Maria Castenmiller , Andre Bernardus Jeunink
IPC分类号： G03B27/58 , G03B27/42 , G03B27/62 , B23Q1/00 , B23Q3/00
CPC分类号： G03F7/70783 , G03F7/707 , H01L21/682 , Y10S269/903
摘要： A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article support, and a position sensor configured to determine a position offset, in a direction lying in the plane of the support zone, of the first article or the second article over a period of time, and a projection system configured to project a patterned radiation beam onto a target portion of a second article.
摘要翻译：公开了一种光刻设备，其包括构造成支撑第一制品的物品支撑件，该第一物品能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，在辐射束的光束路径中或第二物品被放置在图案化的辐射束的光束路径中，物品支撑件具有多个支撑突起，第一物品或第二物品在使用中设置在该支撑突起上，其中多个支撑突起构造成限定支撑区域为第一物品或第二物品提供支撑平面，使得当第一物品或第二物品经受热负荷时，支撑区允许第一物品或第二物品的至少一部分膨胀或收缩以分别在第一制品或第二制品中分别减少机械应力的累积，同时保持第一制品或第二制品基本固定以及位置传感器，被配置为在一段时间内确定第一物品或第二物品在位于支撑区域的平面中的方向上的位置偏移;以及投影系统，被配置为投影图案化的辐射束到第二物品的目标部分上。

7. 发明授权

US06924884B2 Off-axis leveling in lithographic projection apparatus 有权
标题翻译：平版印刷设备中的离轴调平
公开(公告)号：US06924884B2
公开(公告)日：2005-08-02
申请号：US10683454
申请日：2003-10-14
申请人： Marcus Emile Joannes Boonman , Petrus Johannes Maria Broodbakker , Gerrit Johannes Nijmeijer , Mingcheng Zong , Jozef Cornelus Antonius Roijers
发明人： Marcus Emile Joannes Boonman , Petrus Johannes Maria Broodbakker , Gerrit Johannes Nijmeijer , Mingcheng Zong , Jozef Cornelus Antonius Roijers
IPC分类号： G03F9/00 , G03B27/52 , G03B27/42 , G03B27/62
CPC分类号： G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要： In an off-axis leveling procedure a height map of a mask is generated at a measurement station. The height map is referenced to a physical reference surface of a mask support. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of the mask support to position the exposure area on the mask in best focus during exposure.
摘要翻译：在离轴调平程序中，在测量站产生掩模的高度图。高度图参考掩模支持的物理参考表面。物理参考表面可以是其中插入透射图像传感器的表面。在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。然后可以使用高度图来确定掩模支架的最佳高度和/或倾斜度，以便在曝光期间以最佳聚焦将曝光区域放置在掩模上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式