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1. 发明授权

US06217718B1 Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma 失效
标题翻译：用于在用于产生电离金属等离子体的装置中减少衬底表面上的等离子体不均匀性的方法和装置
公开(公告)号：US06217718B1
公开(公告)日：2001-04-17
申请号：US09251690
申请日：1999-02-17
申请人： Ralf Holmann , Zheng Xu
发明人： Ralf Holmann , Zheng Xu
IPC分类号： C23C1434
CPC分类号： H01J37/321 , C23C14/32 , C23C14/358
摘要： An apparatus for processing a workpiece by delivering ions to the workpiece, which apparatus includes a processing chamber, a workpiece support having a workpiece support surface in the chamber, a sputtering target in the chamber and a coil for creating an inductively coupled plasma to sputter material from the target, ionize the sputtered material and direct the ionized, sputtered material at the workpiece. The coil is connected to receive an RF current for establishing in the coil an RF voltage having a peak-to-peak amplitude which varies between a minimum value at a first location along the circumference and a maximum value at a second location along the circumference, the first and second locations being substantially diametrically opposite one another, the RF voltage variation producing a corresponding variation in plasma density around the central axis. In order to counteract this plasma density variation, the coil is positioned so that the second location is at a greater distance than the first location from a plane containing the workpiece support surface. The coil may be formed to have a cross section which varies along the circumference from a maximum area at the first location to a minimum area at the second location.
摘要翻译：一种用于通过将离子输送到工件来处理工件的装置，该装置包括处理室，在腔室中具有工件支撑表面的工件支撑件，腔室中的溅射靶，以及用于产生感应耦合等离子体以溅射材料的线圈从目标，离子化溅射的材料，并引导电离溅射材料在工件。线圈被连接以接收RF电流，以在线圈中建立具有在沿着圆周的第一位置处的最小值和沿着圆周的第二位置处的最大值之间变化的峰 - 峰幅度的RF电压，第一和第二位置基本上沿径向相反，RF电压变化产生围绕中心轴的等离子体密度的相应变化。为了抵消该等离子体密度变化，线圈被定位成使得第二位置距离包含工件支撑表面的平面的第一位置更大的距离。线圈可以形成为具有沿着圆周从第一位置处的最大面积变化到第二位置处的最小面积的横截面。

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