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    • 9. 发明授权
    • Laser diode with metal-oxide upper cladding layer
    • 具有金属氧化物上覆层的激光二极管
    • US06990132B2
    • 2006-01-24
    • US10394560
    • 2003-03-20
    • Michael A. KneisslLinda T. RomanoChristian G. Van de Walle
    • Michael A. KneisslLinda T. RomanoChristian G. Van de Walle
    • H01S5/00
    • B82Y20/00H01S5/2004H01S5/22H01S5/3214H01S5/343H01S5/34333
    • A nitride-based laser diode structure utilizing a metal-oxide (e.g., Indium-Tin-Oxide (ITO) or Zinc-Oxide (ZnO)) in place of p-doped AlGaN to form the upper cladding layer. An InGaN laser diode structure utilizes ITO upper cladding structure, with an SiO2 isolation structure formed on opposite sides of the ITO upper cladding structure to provide a lateral index step that is large enough to enable lateral single-mode operation. The lateral index step is further increased by slightly etching the GaN:Mg waveguide layer below the SiO2 isolation structure. An optional p-type current barrier layer (e.g., AlGaN:Mg having a thickness of approximately 20 nm) is formed between the InGaN-MQW region and a p-GaN upper waveguide layer to impede electron leakage from the InGaN-MQW region.
    • 使用金属氧化物(例如,铟锡氧化物(ITO)或氧化锌(ZnO))代替掺杂p型AlGaN的氮化物基激光二极管结构以形成上覆层。 InGaN激光二极管结构利用ITO上部包层结构,在ITO上部包层结构的相对侧上形成SiO 2隔离结构,以提供足够大的横向折射率步骤,以实现侧向单模 操作。 通过稍微蚀刻在SiO 2隔离结构之下的GaN:Mg波导层,进一步增加横向折射率梯度。 在InGaN-MQW区和p-GaN上波导层之间形成可选的p型电流阻挡层(例如,厚度约为20nm的AlGaN:Mg),以阻止来自InGaN-MQW区的电子泄漏。