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    • 1. 发明申请
    • IMAGE FORMING APPARATUS AND CONTROL METHOD
    • 图像形成装置和控制方法
    • WO2011122711A1
    • 2011-10-06
    • PCT/JP2011/058673
    • 2011-03-30
    • RICOH COMPANY, LIMITEDITO, TakayukiNAKANO, Naoki
    • ITO, TakayukiNAKANO, Naoki
    • B41J2/01
    • B41J2/04593B41J2/01B41J19/147
    • An image forming apparatus includes: a recording head having a first nozzle row and a second nozzle row. One nozzles of the nozzles in a k-th nozzle group (1≦k≦p-1; p is the number of types of droplets) in the conveying direction and of the first nozzle row and second nozzle row ejects the specific type of droplets, and the other nozzles in a k-th nozzle group ejects droplets other than the specific types of droplets. The control unit controls to eject, in one of directions of the reciprocal movement, droplets other than the specific types of droplets from nozzle groups that do not eject the specific type of droplets and the specific type of droplets from the first and second nozzle groups that eject the specific type of droplets and in other one of the directions of the reciprocal movement, droplets other than the specific types of droplets from nozzle groups that do not eject the specific type of droplets.
    • 图像形成装置包括:具有第一喷嘴列和第二喷嘴列的记录头。 在第k个喷嘴组中的喷嘴的一个喷嘴(1≤k≤p-1; p是液滴的数量)在输送方向上,而第一喷嘴列和第二喷嘴列喷射特定类型的液滴 并且第k个喷嘴组中的其它喷嘴喷射除了特定类型的液滴之外的液滴。 控制单元控制在往复运动的一个方向上喷射除了不喷射特定类型的液滴的喷嘴组的特定类型的液滴以及来自第一和第二喷嘴组的特定类型的液滴之外的液滴, 喷射特定类型的液滴并且在往复运动的另一个方向上,除了不喷射特定类型的液滴的喷嘴组的特定类型的液滴之外的液滴。
    • 8. 发明申请
    • ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    • 化学敏感性或辐射敏感性组合物和使用其的图案形成方法
    • WO2011013842A1
    • 2011-02-03
    • PCT/JP2010/063131
    • 2010-07-28
    • FUJIFILM CorporationITO, TakayukiTSUCHIMURA, TomotakaKAWABATA, Takeshi
    • ITO, TakayukiTSUCHIMURA, TomotakaKAWABATA, Takeshi
    • G03F7/004G03F7/039
    • G03F7/0045G03F7/0046G03F7/0392G03F7/0397
    • An actinic ray-sensitive or radiation-sensitive composition, including: (1) a low molecular compound having a molecular weight of 500 to 5,000 and containing (G) an acid-decomposable group; and (2) a compound capable of generating an acid of 305 A3 or more in volume upon irradiation with an actinic ray or radiation, an actinic ray-sensitive or radiation-sensitive composition, including: a solvent; and (1A) a compound which is a low molecular compound having a molecular weight of 500 to 5,000 and containing (Z) one or more groups capable of decomposing upon irradiation with an actinic ray or radiation to produce an acid, (G) one or more acid-decomposable groups and (S) one or more dissolution auxiliary groups, wherein assuming that the number of the functional groups in one molecule of (Z), (G) and (S) is z, q and s, respectively, q/z32 and s/z32, and a pattern forming method using the composition are provided.
    • 一种光化射线敏感或辐射敏感性组合物,包括:(1)分子量为500〜5000的低分子化合物,含有(G)酸分解基团; 和(2)能够在用光化射线或辐射照射时能够产生体积为305A3或更高的酸的化合物,光化射线敏感或辐射敏感组合物,包括:溶剂; 和(1A)分子量为500〜5000的低分子化合物的化合物,含有(Z)一种或多种能够在用光化学射线或辐射照射时分解产生酸的基团,(G)一种或多种 更多的酸可分解基团和(S)一种或多种溶解辅助基团,其中假定(Z),(G)和(S)的一个分子中的官能团数分别为z,q和s,q / z32和s / z32,并且提供了使用该组合物的图案形成方法。