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    • 2. 发明授权
    • Method of preparing semi-conductor alloys
    • 制备半导体合金的方法
    • US2898249A
    • 1959-08-04
    • US71243158
    • 1958-01-31
    • RCA CORP
    • JENSEN ROBERT V
    • C30B9/00C30B9/06C30B11/00C30B11/06C30B13/08C30B15/00F16F9/04H01L21/00
    • F16F9/0454C30B9/00C30B9/06C30B11/00C30B11/06C30B13/08C30B15/00C30B29/52H01L21/00
    • A method of making a monocrystalline alloy ingot comprises melting at least a portion of a mass of semi-conductor material to provide a major constituent of the alloy, and continuously and progressively growing a monocrystalline ingot from the melt while adding thereto a minor constituent of the alloy other than or in addition to a conductivity determining impurity, the minor constituent being added in an amount which increases its content in the melt gradually and progressively or by small increments, whereby an ingot is grown having a minor constituent content which increases along at least a portion of the length of the ingot until an ingot portion having not less than one mol. per cent of the minor constituent is obtained. In Example (1) a rod-shaped piece of material 2 (see Fig. 4) such as germanium, is placed in a crucible boat 6 with a purified seed crystal 4. Depressions 8 are cut in the surface of the charge 2, and predetermined quantities of an alloying agent 10 placed therein. The crucible 6 is placed in a tube 11 and gradually propelled through a ring-shaped induction heater 12. The material adjacent to the seed crystal 4 melts first and recrystallizes on the seed crystal 4, successive segments of the charge 2 then being melted and recrystallized. Larger and larger amounts of the alloying agent are incorporated in the growing crystal. In Example (2) a tapered bar 21 (Fig. 3) of germanium is placed in the crucible 6 over a bar 11 of silicon with a wedgeshaped end 16, and zone melted as in Example (1), a single crystal growing on a seed crystal 4. In Example (3) silicon 20 (Fig. 5) is melted in a crucible 18, and a seed crystal 22 is touched on to the surface of the melt and slowly withdrawn so that a single crystal 23 is grown. As the seed crystal 22 is withdrawn a rod 26 of germanium is gradually fed to the melt 20. The crystal 23 which is grown is initially pure silicon with the concentration of germanium gradually increasing along its length until a desired composition is reached and maintained by a feed of fresh material to the melt. Tin, lead or titanium may be substituted for germanium or silicon in the examples, and cadmium telluride and gallium antimonide may be alloyed with agents such as germanium and silicon.