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    • 8. 发明授权
    • Method for fluid processing a workpiece
    • 流体处理工件的方法
    • US08512543B2
    • 2013-08-20
    • US12963991
    • 2010-12-09
    • Arthur KeiglerJohn HarrellZhenqiu LiuQunwei Wu
    • Arthur KeiglerJohn HarrellZhenqiu LiuQunwei Wu
    • C25D5/08C25D7/12H01L21/00
    • C25D17/001C25D5/003C25D7/123C25D17/005C25D17/06C25D21/10C25D21/12H01L21/67023H01L21/67126
    • A method of fluid processing a semiconductor workpiece, including disposing a workpiece holder with a housing capable of containing a fluid, the workpiece holder retaining the workpiece, providing an agitation system connected to the housing and comprising a member disposed within the housing adjacent the workpiece holder, and agitating the fluid by moving the member substantially parallel to a surface of the workpiece with a non-uniform oscillatory motion, the non-uniform oscillatory motion being a series of substantially continuous geometrically asymmetric oscillations wherein each consecutive oscillation of the series is geometrically asymmetric having at least two substantially continuous opposing strokes wherein reversal positions of each substantially continuous stroke of the substantially continuous asymmetric oscillation are disposed asymmetrically with respect to a center point of each immediately preceding substantially continuous stroke of the oscillation.
    • 一种流体处理半导体工件的方法,包括将具有能够容纳流体的壳体布置在工件夹持器上,保持工件的工件保持器,提供连接到壳体的搅拌系统,并且包括设置在壳体内的邻近工件保持器的构件 并且通过以非均匀的振荡运动基本上平行于工件的表面移动构件来搅动流体,该非均匀振荡运动是一系列基本上连续的几何非对称振荡,其中该系列的每个连续振荡是几何不对称的 具有至少两个基本上连续的相对冲程,其中基本上连续的不对称振荡的每个基本上连续行程的反转位置相对于振荡的每个紧接在前的基本上连续的行程的中心点非对称地设置。