专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06902259B2 Direct imaging polymer fluid jet orifice 失效
标题翻译：直接成像聚合物流体喷射孔
公开(公告)号：US06902259B2
公开(公告)日：2005-06-07
申请号：US10165508
申请日：2002-06-06
申请人： Chien-Hua Chen , Donald E. Wenzel , Qin Liu , Naoto Kawamura , Colby Van Vooren , Colin C Davis , Richard W Seaver , Carl Wu , Jeffery S Hess
发明人： Chien-Hua Chen , Donald E. Wenzel , Qin Liu , Naoto Kawamura , Colby Van Vooren , Colin C Davis , Richard W Seaver , Carl Wu , Jeffery S Hess
IPC分类号： B41J2/05 , B41J2/135 , B41J2/14 , B41J2/16
CPC分类号： B41J2/1639 , B41J2/1404 , B41J2/14072 , B41J2/1408 , B41J2/14129 , B41J2/1433 , B41J2/1603 , B41J2/162 , B41J2/1626 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/164 , B41J2/1645 , B41J2002/14387 , B41J2002/14475
摘要： A process for creating and an apparatus employing shaped orifices in a semiconductor substrate. A first layer of material is applied on the semiconductor substrate then a second layer of material is then applied upon the first layer of material. An orifice image is then transferred to the first layer of material and a fluid-well image is transferred to the second layer of material. That portion of the second layer of material where the orifice image is located is then developed along with that portion of the first layer of material where the fluid well is located to define an orifice in the substrate.
摘要翻译：一种在半导体衬底中产生和使用成形孔的装置的方法。将第一层材料施加在半导体衬底上，然后将第二层材料施加在第一层材料上。然后将孔口图像转移到第一层材料，并将流体井图像转移到第二层材料。孔口图像所在的第二层材料的那部分然后与位于流体井的第一材料层的那部分一起显影，以在衬底中限定孔口。

2. 发明授权

US06718632B2 Method of making a fluid-jet ejection device 失效
标题翻译：制造流体喷射喷射装置的方法
公开(公告)号：US06718632B2
公开(公告)日：2004-04-13
申请号：US10208331
申请日：2002-07-29
申请人： Qin Liu , Naoto Kawamura , Chien-Hua Chen
发明人： Qin Liu , Naoto Kawamura , Chien-Hua Chen
IPC分类号： B23P1700
CPC分类号： B41J2/1645 , B41J2/1404 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , Y10T29/49 , Y10T29/49085 , Y10T29/49401
摘要： A method of creating a fluid ejection device is described. The fluid ejection device has a substrate having a set of thin-film layers disposed on a first surface. A photoresist is applied on the set of thin-film layers, the photoresist has openings defined therein. The set of thin-film layers and substrate in the openings are etched to create deep slots beneath the first surface of the substrate. The photoresist is removed. A protection layer is applied over the set of thin-film layers thereby filling the deep slots in the set of thin-film layers and substrate. A feed channel is created on a second surface of the substrate until the protection layer within the deep slots is exposed. The protection layer is then removed.
摘要翻译：描述了一种产生流体喷射装置的方法。流体喷射装置具有设置在第一表面上的一组薄膜层的基板。在一组薄膜层上施加光致抗蚀剂，光致抗蚀剂在其中限定开口。对该组开口中的薄膜层和衬底进行蚀刻以在衬底的第一表面下方形成深槽。去除光致抗蚀剂。在该组薄膜层上施加保护层，从而填充该组薄膜层和衬底中的深槽。在衬底的第二表面上形成馈送通道，直到深槽内的保护层被暴露。然后去除保护层。

3. 发明授权

US06481832B2 Fluid-jet ejection device 失效
标题翻译：流体喷射装置
公开(公告)号：US06481832B2
公开(公告)日：2002-11-19
申请号：US09774259
申请日：2001-01-29
申请人： Qin Liu , Naoto Kawamura , Chien-Hua Chen
发明人： Qin Liu , Naoto Kawamura , Chien-Hua Chen
IPC分类号： B41J205
CPC分类号： B41J2/1645 , B41J2/1404 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , Y10T29/49 , Y10T29/49085 , Y10T29/49401
摘要： The invention is a fluid ejection device, such as a printhead, that has a substrate with a first surface mating to an orifice layer, preferably through a stack of thin-film layers. The orifice layer defines a fluid chamber interfacing to an orifice opening or nozzle. The substrate has a second surface having a truncated pyramidal structure; either polyhedral or triangular ridge shaped defining an opening through the substrate to the fluid chamber. The substrate further has an ejection element, preferably disposed as a resistor in the stack of thin-film layers. When energy is transferred from the ejection element to the fluid in the fluid chamber, fluid is ejected from the orifice opening. The fluid ejection device may have one or a plurality of fluid chambers and one or a plurality of frustums of a truncated polyhedral, truncated pyramidal, truncated conical or truncated triangular cross-sectional ridge structures defining openings from the second surface of the substrate to the fluid chambers.
摘要翻译：本发明是一种流体喷射装置，例如打印头，其具有基底，其具有与孔层相匹配的第一表面，优选地通过一叠薄膜层。孔口层限定与孔口或喷嘴连接的流体室。基板具有具有截头棱锥结构的第二表面; 多面体或三角形脊形，限定通过基底的开口到流体室。衬底还具有优选地设置在薄膜层堆叠中作为电阻器的喷射元件。当能量从喷射元件转移到流体室中的流体时，流体从孔口排出。流体喷射装置可以具有一个或多个流体室和一个或多个截头圆锥体，其截断的多面体，截头锥体，截头圆锥形或截头三角形横截面脊结构限定从衬底的第二表面到流体的开口房间。

4. 发明授权

US07382512B2 Resistivity phase change material 失效
标题翻译：电阻相变材料
公开(公告)号：US07382512B2
公开(公告)日：2008-06-03
申请号：US11259609
申请日：2005-10-26
申请人： Zhizhang Chen , Qin Liu , Timothy F. Myers , Chien-Hua Chen
发明人： Zhizhang Chen , Qin Liu , Timothy F. Myers , Chien-Hua Chen
IPC分类号： G02F1/01 , G02F1/03 , G02F1/1333 , G02F1/1335
CPC分类号： G02F1/135 , G02F1/1334 , G02F1/1354
摘要： Various devices and methods employing a resistive phase change material are disclosed.
摘要翻译：公开了采用电阻相变材料的各种装置和方法。

5. 发明申请

US20070089492A1 Resistivity phase change material 失效
标题翻译：电阻相变材料
公开(公告)号：US20070089492A1
公开(公告)日：2007-04-26
申请号：US11259609
申请日：2005-10-26
申请人： Zhizhang Chen , Qin Liu , Timothy Myers , Chien-Hua Chen
发明人： Zhizhang Chen , Qin Liu , Timothy Myers , Chien-Hua Chen
IPC分类号： G01N11/04
CPC分类号： G02F1/135 , G02F1/1334 , G02F1/1354
摘要： Various devices and methods employing a resistive phase change material are disclosed.
摘要翻译：公开了采用电阻相变材料的各种装置和方法。

6. 发明授权

US09446590B2 Diagonal openings in photodefinable glass 有权
标题翻译：可光限定玻璃中的对角开口
公开(公告)号：US09446590B2
公开(公告)日：2016-09-20
申请号：US14421975
申请日：2012-08-16
申请人： Chien-Hua Chen , Silam J. Choy , Brett E. Dahlgren
发明人： Chien-Hua Chen , Silam J. Choy , Brett E. Dahlgren
IPC分类号： B41J2/14 , B41J2/16 , B41J27/20
CPC分类号： B41J2/1433 , B41J2/14145 , B41J2/1603 , B41J2/1623 , B41J2/1629 , B41J2/1634 , B41J27/20 , B41J2002/14419 , Y10T428/24314
摘要： In one example, a method for making diagonal openings in photodefinable glass includes exposing part of a body of photodefinable glass to a beam of light oriented diagonally to a surface of the body at an angle of 5° or greater measured with respect to a normal to the surface of the body and removing some or all of the part of the body exposed to the light beam to form a diagonal opening in the body.
摘要翻译：在一个实例中，用于在可光限定玻璃中制造斜开口的方法包括将可光限定玻璃体的一部分暴露于相对于正常对准的5°或更大的角度测量的5°或更大的角度对角定向到身体的表面的光束身体的表面并且去除暴露于光束的身体的部分或全部部分以在体内形成对角线开口。

7. 发明授权

US09266326B2 Piezoelectric actuator and method of making a piezoelectric actuator 有权
标题翻译：压电致动器和制造压电致动器的方法
公开(公告)号：US09266326B2
公开(公告)日：2016-02-23
申请号：US14397333
申请日：2012-07-25
申请人： James Elmer Abbott, Jr. , Chien-Hua Chen , Jeffrey R. Pollard
发明人： James Elmer Abbott, Jr. , Chien-Hua Chen , Jeffrey R. Pollard
IPC分类号： B41J2/14 , B41J2/145 , H01L41/053 , H01L41/22 , B41J2/16
CPC分类号： B41J2/14201 , B41J2/145 , B41J2/1618 , B41J2/1623 , B41J2/1642 , B41J2/1646 , H01L41/053 , H01L41/0973 , H01L41/22 , H01L41/313 , Y10T29/42
摘要： In one example, a piezoelectric actuator includes a piezoelectric material, a first conductor on a first part of the piezoelectric material, and a membrane bonded to the first conductor with an adhesive. The first conductor has a root mean square surface roughness of at least 10 nm at the bonding interface with the membrane.
摘要翻译：在一个示例中，压电致动器包括压电材料，压电材料的第一部分上的第一导体和用粘合剂结合到第一导体的膜。第一导体在与膜的结合界面处具有至少10nm的均方根粗糙度。

8. 发明授权

US08864289B2 Drop detection 有权
标题翻译：跌落检测
公开(公告)号：US08864289B2
公开(公告)日：2014-10-21
申请号：US13985393
申请日：2011-03-20
申请人： Alexander Govyadinov , Chien-Hua Chen
发明人： Alexander Govyadinov , Chien-Hua Chen
IPC分类号： B41J2/125 , B41J2/045 , G01V8/16 , G01V8/24 , B41J2/165
CPC分类号： G01V8/24 , B41J2/04558 , B41J2/04561 , B41J2/04586 , B41J2/125 , B41J2/16579 , B41J2/16585 , B41J2/2142 , B41J2/2146 , G01N21/53 , G01V8/16
摘要： A drop detector assembly is provided including an ejection element to eject a fluid drop, a light guide to selectively receive light scattered off of the fluid drop, and a light detector formed in the light guide to detect light received by the light guide.
摘要翻译：提供一种液滴检测器组件，其包括用于喷射液滴的喷射元件，用于选择性地接收从液滴散射的光的光导;以及形成在光导中的光检测器，用于检测光导所接收的光。

9. 发明授权

US08853819B2 Semiconductor structure with passive element network and manufacturing method thereof 有权
标题翻译：无源元网络的半导体结构及其制造方法
公开(公告)号：US08853819B2
公开(公告)日：2014-10-07
申请号：US13338087
申请日：2011-12-27
申请人： Chien-Hua Chen , Teck-Chong Lee , Hsu-Chiang Shih , Meng-Wei Hsieh
发明人： Chien-Hua Chen , Teck-Chong Lee , Hsu-Chiang Shih , Meng-Wei Hsieh
IPC分类号： H01L27/08 , H01L23/498 , H01L49/02 , H01L23/64 , H01L23/522 , H01L23/14 , H01L27/01 , H01L25/065 , H01L21/768 , H01L23/60
CPC分类号： H01L27/016 , H01L21/76898 , H01L23/147 , H01L23/49822 , H01L23/49827 , H01L23/5227 , H01L23/5228 , H01L23/60 , H01L23/64 , H01L25/0657 , H01L28/10 , H01L28/20 , H01L28/40 , H01L2224/16 , H01L2225/06517 , H01L2225/06572 , H01L2924/1461 , H01L2924/00
摘要： The present invention relates to a semiconductor structure having an integrated passive network and a method for making the same. The semiconductor structure includes a substrate which can be an interposer. The substrate can include a plurality of conductive vias. In various embodiments, the substrate includes a dielectric layer disposed thereon, the dielectric layer having an opening forming a straight hole allowing electrical connection between the passive network and the conductive via. The passive network includes a series of patterned dielectric and conductive layers, forming passive electronic components. In an embodiment, the passive device includes a common resistor coupled to a pair of inductors, each of the inductors coupled to a capacitor. In another embodiment, the passive device includes a resistor and an inductor electrically connected to each other, a bottom surface of the inductor coplanar with a bottom surface of the resistor.
摘要翻译：本发明涉及一种具有集成无源网络的半导体结构及其制造方法。半导体结构包括可以是插入件的衬底。衬底可以包括多个导电通孔。在各种实施例中，衬底包括设置在其上的电介质层，电介质层具有形成直孔的开口，允许无源网络和导电通孔之间的电连接。无源网络包括一系列图案化的电介质层和导电层，形成无源电子元件。在一个实施例中，无源器件包括耦合到一对电感器的公共电阻器，每个电感器耦合到电容器。在另一个实施例中，无源器件包括电阻器和电感器，它们彼此电连接，电感器的底表面与电阻器的底表面共面。

10. 发明授权

US08497577B2 Micro electrical mechanical system 有权
标题翻译：微机电系统
公开(公告)号：US08497577B2
公开(公告)日：2013-07-30
申请号：US11870306
申请日：2007-10-10
申请人： Chien-Hua Chen , David M. Craig , Charles C. Haluzak
发明人： Chien-Hua Chen , David M. Craig , Charles C. Haluzak
IPC分类号： H01L23/12
CPC分类号： B81B7/007 , H01L2924/16235
摘要： An apparatus includes a Micro Electrical Mechanical System (MEMS) having electrical contacts and a MEMS device in electrical communication with the electrical contacts. A lid is oriented over the MEMS device and not the electrical contacts. The lid has a base region and a top region, the base region being wider in dimension than the top region and oriented in closer proximity to the MEMS device than the top region.
摘要翻译：一种装置包括具有电触头的微机电系统（MEMS）和与电触头电连通的MEMS装置。盖子定位在MEMS器件上，而不是电触头。盖子具有基部区域和顶部区域，基底区域的尺寸比顶部区域宽，并且被定向成比顶部区域更靠近MEMS装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式