会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Compound semiconductor substrate comprising a multilayer buffer layer
    • 化合物半导体衬底包括多层缓冲层
    • US08212288B2
    • 2012-07-03
    • US12879035
    • 2010-09-10
    • Jun KomiyamaKenichi EriguchiHiroshi OishiYoshihisa AbeAkira YoshidaShunichi Suzuki
    • Jun KomiyamaKenichi EriguchiHiroshi OishiYoshihisa AbeAkira YoshidaShunichi Suzuki
    • H01L21/02
    • H01L21/0254H01L21/02458H01L21/02507
    • A compound semiconductor substrate which inhibits the generation of a crack or a warp and is preferable for a normally-off type high breakdown voltage device, arranged that a multilayer buffer layer 2 in which AlxGa1-xN single crystal layers (0.6≦X≦1.0) 21 containing carbon from 1×1018 atoms/cm3 to 1×1021 atoms/cm3 and AlyGa1-yN single crystal layers (0.1≦y≦0.5) 22 containing carbon from 1×1017 atoms/cm3 to 1×1021 atoms/cm3 are alternately and repeatedly stacked in order, and a nitride active layer 3 provided with an electron transport layer 31 having a carbon concentration of 5×1017 atoms/cm3 or less and an electron supply layer 32 are deposited on a Si single crystal substrate 1 in order. The carbon concentrations of the AlxGa1-xN single crystal layers 21 and that of the AlGa1-yN single crystal layers 22 respectively decrease from the substrate 1 side towards the above-mentioned active layer 3 side. In this way, the compound semiconductor substrate is produced.
    • 一种禁止产生裂纹或翘曲的化合物半导体衬底,优选用于常闭型高击穿电压器件,其中AlxGa1-xN单晶层(0.6& NlE; X& NlE; 1.0 )含有1×1018原子/ cm 3至1×1021原子/ cm3的碳和含有1×10 17原子/ cm 3至1×1021原子/ cm 3的碳的Al y Ga 1-y N单晶层(0.1< 1lE; y≦̸ 0.5) 交替重复堆叠,并且在Si单晶衬底1上沉积具有碳浓度为5×10 17原子/ cm 3以下的电子传输层31和电子供给层32的氮化物活性层3 订购。 Al x Ga 1-x N单晶层21和AlGa1-yN单晶层22的碳浓度分别从衬底1侧朝向上述有源层3侧减小。 以这种方式制造化合物半导体衬底。