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1. 发明申请

US20130308174A1 OPTICAL MODULE FOR LASER BEAM SCAN 审中-公开
标题翻译：光束模块用于激光光束扫描
公开(公告)号：US20130308174A1
公开(公告)日：2013-11-21
申请号：US13767046
申请日：2013-02-14
申请人： Pil-Kyu KIM , Gyoo-Wan HAN , Je-Kil RYU , Tae-Yong KIM , Seok-Hwan KIM , Sung-Gon KIM
发明人： Pil-Kyu KIM , Gyoo-Wan HAN , Je-Kil RYU , Tae-Yong KIM , Seok-Hwan KIM , Sung-Gon KIM
IPC分类号： G02B26/08
CPC分类号： G02B26/0816 , B41J2/471 , G02B26/105
摘要： An optical module for irradiation of laser beams includes a mirror mount, a rotation shaft coupled to a center of the mirror mount, a vibration member coupled to one end of the mirror mount and the vibration member vibrating the end of the mirror mount in front-and-rear directions, a mirror fixed to the mirror mount and the mirror irradiating laser beams by performing reciprocal rotational motion with the mirror mount with respect to the rotation shaft, and a weight arranged on at least one of a first side and a second side of the mirror mount. The weight is interposed between the rotation shaft and the at least one of the first side and the second side to compensate concentricity of the mirror.
摘要翻译：用于照射激光束的光学模块包括反射镜安装件，联接到反射镜安装座的中心的旋转轴，耦合到反射镜安装座的一端的振动部件，振动部件在前后方向上振动反射镜安装座的端部，通过与反射镜安装件相对于旋转轴进行往复旋转运动，固定到反射镜安装座的反射镜和镜子照射激光束，以及配置在第一侧和第二侧中的至少一个上的重物的镜面安装。该重量插入在旋转轴与第一侧和第二侧中的至少一个之间以补偿反射镜的同心度。

2. 发明申请

US20160003265A1 HYDRAULIC SYSTEM FOR CONSTRUCTION MACHINE, PROVIDED WITH PROTECTION DEVICE 有权
标题翻译：建筑机械液压系统，具有保护装置
公开(公告)号：US20160003265A1
公开(公告)日：2016-01-07
申请号：US14768285
申请日：2013-02-19
申请人： Hea-Gyoon JOUNG , Sung-Gon KIM , VOLVO CONSTRUCTION EQUIPMENT AB
发明人： Hea-Gyoon JOUNG , Sung-Gon KIM
IPC分类号： F15B11/042 , F15B20/00
CPC分类号： F15B11/0423 , E02F9/2235 , E02F9/226 , E02F9/2296 , F15B20/00 , F15B2211/20546 , F15B2211/3116 , F15B2211/40 , F15B2211/45 , F15B2211/611 , F15B2211/62 , F15B2211/6343 , F15B2211/6652
摘要： A hydraulic system for a construction machine having a protection device is disclosed, which can limit a flow rate of hydraulic fluid that is discharged from a hydraulic pump in accordance with a hydraulic fluid temperature and notify an operator of information on the hydraulic fluid temperature. The hydraulic system for a construction machine includes a hydraulic actuator operated by hydraulic fluid that is supplied from a hydraulic pump; a control valve installed in a flow path between the hydraulic pump and the hydraulic actuator to control a flow rate of the hydraulic fluid that is supplied from the hydraulic pump to the hydraulic actuator; an oil cooler installed in a return flow path from the control valve to an hydraulic fluid tank to cool the hydraulic fluid; a hydraulic fluid temperature sensor detecting in real time a hydraulic fluid temperature of the hydraulic fluid tank; a hydraulic pump regulator controlling a discharge flow rate of the hydraulic pump through adjustment of an inclination angle of a swash plate of the hydraulic pump; and a controller comparing the hydraulic fluid temperature detected by the hydraulic fluid temperature sensor with a predetermined hydraulic fluid temperature, and outputting a control signal to the hydraulic pump regulator so as to limit the discharge flow rate of the hydraulic pump to or below a predetermined flow rate if the detected hydraulic fluid temperature is equal to or lower than a predetermined lower limit value, or equal to or higher than a predetermined upper limit value.
摘要翻译：公开了一种用于具有保护装置的施工机械的液压系统，其可以根据液压流体温度限制从液压泵排出的液压流体的流量，并且向操作者通知关于液压流体温度的信息。用于建筑机械的液压系统包括由液压泵供应的液压流体操作的液压致动器; 安装在所述液压泵和所述液压致动器之间的流路中的控制阀，以控制从所述液压泵向所述液压致动器供给的所述液压流体的流量; 安装在从控制阀到液压油箱的回流路径中以冷却液压流体的油冷却器; 液压油温度传感器实时检测液压油箱的液压油温度; 液压泵调节器，其通过调节所述液压泵的斜板的倾斜角度来控制所述液压泵的排出流量; 以及控制器，将由液压流体温度传感器检测的液压流体温度与预定的液压流体温度进行比较，并将控制信号输出到液压泵调节器，以将液压泵的排出流量限制在或低于预定流量如果检测到的液压流体温度等于或低于预定的下限值，或者等于或高于预定的上限值的速率。

3. 发明申请

US20070184565A1 TEST PATTERN AND METHOD FOR MEASURING SILICON ETCHING DEPTH 审中-公开
标题翻译：测量图案和测量硅蚀刻深度的方法
公开(公告)号：US20070184565A1
公开(公告)日：2007-08-09
申请号：US11566637
申请日：2006-12-04
申请人： Hwan-Shik PARK , Sung-Gon KIM , Chung-Sam JUN , Kye-Weon KIM , Jang-Ik PARK , Won-Kwan SONG
发明人： Hwan-Shik PARK , Sung-Gon KIM , Chung-Sam JUN , Kye-Weon KIM , Jang-Ik PARK , Won-Kwan SONG
IPC分类号： H01L21/66
CPC分类号： H01L22/12
摘要： Embodiments of a test pattern and a method for measuring silicon etching depth are provided. After a contact-hole forming process, an optical critical dimension (OCD) is measured with respect to a test pattern formed on a semiconductor chip, so that the silicon etching depth may be analyzed in real time. Critical dimensions of contact holes in the actual working cells of the semiconductor circuit would then coincide with the OCD measurement of the contact holes of the test pattern. Consequently, etching conditions for forming a contact hole may be controlled in real time, and thus a yield of a semiconductor can be effectively improved.
摘要翻译：提供测试图案的实施例和测量硅蚀刻深度的方法。在接触孔形成处理之后，相对于形成在半导体芯片上的测试图案测量光临界尺寸（OCD），使得可以实时分析硅蚀刻深度。半导体电路的实际工作单元中的接触孔的临界尺寸将与测试图案的接触孔的OCD测量重合。因此，可以实时地控制用于形成接触孔的蚀刻条件，从而可以有效地提高半导体的产量。

4. 发明申请

US20130323879A1 COATING METHOD, AND METHOD OF FORMING ORGANIC LAYER USING THE SAME 审中-公开
标题翻译：涂覆方法和使用该方法形成有机层的方法
公开(公告)号：US20130323879A1
公开(公告)日：2013-12-05
申请号：US13961111
申请日：2013-08-07
申请人： Jin-Han PARK , Myeng-Woo NAM , Eui-Shin SHIN , Sung-Gon KIM
发明人： Jin-Han PARK , Myeng-Woo NAM , Eui-Shin SHIN , Sung-Gon KIM
IPC分类号： H01L51/00
CPC分类号： H01L51/0026 , H01L21/67115 , H01L21/6715 , H01L51/0008 , H01L51/56
摘要： A coating apparatus includes a stage supporting a coating target, a coating part on the stage, the coating part being configured to apply a coating material onto the coating target, and a heating source opposite to and spaced apart from the stage, the heating source being configured to supply heat to the coating target after application of the coating material onto the coating target.
摘要翻译：一种涂布装置，包括：支撑涂布目标的载物台;载物台上的涂布部;涂布部，被配置为在涂布目标上涂布涂料;以及加热源，与所述载物台相对且间隔开，所述加热源为被配置为在将涂覆材料施加到涂覆靶上之后向涂覆目标提供热量。

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