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1. 发明授权

US07003362B2 System and method for customized tape-out requests for integrated circuit manufacturing 失效
标题翻译：用于集成电路制造的定制磁带请求的系统和方法
公开(公告)号：US07003362B2
公开(公告)日：2006-02-21
申请号：US10842890
申请日：2004-05-11
申请人： Piao-Chuo Tsao , Shu-Ling Feng , Yi-Hong Tseng
发明人： Piao-Chuo Tsao , Shu-Ling Feng , Yi-Hong Tseng
IPC分类号： G06F19/00
CPC分类号： G06Q30/02 , G03F1/68 , Y10S715/964
摘要： The present disclosure provides a system and method for a tape-out request. In one example, the method includes receiving initial information from a customer and loading a mask tooling template based on the initial information. A mask tooling form may be customized based on metal layer information provided by the customer via the mask tooling template and answers to questions provided to the customer. The method may then generate logical operations based on information received from the customer via the mask tooling form.
摘要翻译：本公开提供了一种用于排出请求的系统和方法。在一个示例中，该方法包括从客户接收初始信息并基于初始信息加载掩模工具模板。可以基于由客户通过掩模工具模板提供的金属层信息来定制掩模工具表，并且回答提供给客户的问题。然后，该方法可以基于通过掩模工具形式从客户接收的信息来生成逻辑操作。

2. 发明申请

US20060026549A1 Method and system for conducting an online transaction of multi-project wafer service 审中-公开
标题翻译：进行多项目晶圆服务在线交易的方法和系统
公开(公告)号：US20060026549A1
公开(公告)日：2006-02-02
申请号：US10899564
申请日：2004-07-27
申请人： Piao-Chuo Tsao , Shu-Ling Feng , Yi-Hong Tseng
发明人： Piao-Chuo Tsao , Shu-Ling Feng , Yi-Hong Tseng
IPC分类号： G06F17/50 , G06F19/00 , G06F17/00
CPC分类号： G06F17/5068 , G06Q99/00
摘要： An online multi-project wafer method comprises providing, via an online interface, a template, receiving, via the online interface, at least two sets of completed templates each having information descriptive of an integrated circuit, checking the received at least two sets of completed templates, providing feedback for respective ones of the at least two sets of completed templates, and integrating the information associated with the integrated circuits into one common mask set.
摘要翻译：在线多项目晶片方法包括通过在线界面提供模板，通过在线界面接收至少两组完成的模板，每组具有描述集成电路的信息，检查所接收的至少两组完成的模板，为所述至少两组完成的模板中的各个集合提供反馈，以及将与所述集成电路相关联的信息集成到一个公共掩模集合中。

3. 发明授权

US06964030B2 Method for automatic mask tool translation 失效
标题翻译：自动面具工具翻译方法
公开(公告)号：US06964030B2
公开(公告)日：2005-11-08
申请号：US10404484
申请日：2003-04-01
申请人： Hsin-Ming Hong , Piao-Chuo Tsao , Shu-Ling Feng , Yi-Hong Tseng
发明人： Hsin-Ming Hong , Piao-Chuo Tsao , Shu-Ling Feng , Yi-Hong Tseng
IPC分类号： G03F1/00 , G06F17/50
CPC分类号： G03F1/68 , G03F1/00
摘要： A method for translating mask tooling information comprises the steps of: receiving a plurality of input mask tooling forms for fabricating a wafer, at least two of the plurality of input masking tool forms having respectively different sequences of layers; forming a template having a sequence of layers formed by the union of the different sequences of layers; and translating information from each of the input mask tooling forms to fit the template.
摘要翻译：用于平移掩模工具信息的方法包括以下步骤：接收用于制造晶片的多个输入掩模工具形式，所述多个输入掩蔽工具形式中的至少两个具有不同的层序列; 形成具有通过不同序列层的结合而形成的层序列的模板; 以及从每个输入掩模工具形式翻译信息以适合模板。

4. 发明申请

US20060195814A1 System and method for using MPW integration service on demand 有权
标题翻译：使用MPW集成服务的系统和方法
公开(公告)号：US20060195814A1
公开(公告)日：2006-08-31
申请号：US11047246
申请日：2005-01-31
申请人： Piao-Chuo Tsao , Yi-Hong Tseng , Yun-Wen Fu
发明人： Piao-Chuo Tsao , Yi-Hong Tseng , Yun-Wen Fu
IPC分类号： G06F19/00
CPC分类号： G06F17/50
摘要： A system for multi-project wafer service is provided. The system contains integrator and designer interfaces, an account managing device, a mask tooling information processor, a mask database checking device, and a mask tooling information convertor. The integrator and the designer interfaces provide first and second users with access to the multi-project wafer service. The account managing device manages identification information and corresponding access authority. The mask tooling information processor provides a predefined form to the designer interface, receives the form containing the mask tooling information, and presents the completed form to the integrator interface. The mask database checking device compares the mask tooling information to preset data. The mask tooling information convertor converts the mask tooling information into mask tape-out information.
摘要翻译：提供了一个多项目晶圆服务系统。该系统包含集成商和设计者界面，帐户管理装置，掩模工具信息处理器，掩模数据库检查装置和掩模工具信息转换器。集成商和设计人员界面为第一和第二用户提供对多项目晶圆服务的访问。帐户管理装置管理识别信息和相应的访问权限。掩模工具信息处理器向设计者接口提供预定义的形式，接收包含掩模工具信息的表单，并将完成的表单呈现给积分器接口。掩模数据库检查装置将掩模工具信息与预设数据进行比较。掩模加工信息转换器将掩模加工信息转换成掩模带出信息。

5. 发明授权

US07296254B2 System and method for using MPW integration service on demand 有权
标题翻译：使用MPW集成服务的系统和方法
公开(公告)号：US07296254B2
公开(公告)日：2007-11-13
申请号：US11047246
申请日：2005-01-31
申请人： Piao-Chuo Tsao , Yi-Hong Tseng , Yun-Wen Fu
发明人： Piao-Chuo Tsao , Yi-Hong Tseng , Yun-Wen Fu
IPC分类号： G06F17/50
CPC分类号： G06F17/50
摘要： A system for multi-project wafer service is provided. The system contains integrator and designer interfaces, an account managing device, a mask tooling information processor, a mask database checking device, and a mask tooling information convertor. The integrator and the designer interfaces provide first and second users with access to the multi-project wafer service. The account managing device manages identification information and corresponding access authority. The mask tooling information processor provides a predefined form to the designer interface, receives the form containing the mask tooling information, and presents the completed form to the integrator interface. The mask database checking device compares the mask tooling information to preset data. The mask tooling information convertor converts the mask tooling information into mask tape-out information.
摘要翻译：提供了一个多项目晶圆服务系统。该系统包含集成商和设计者界面，帐户管理装置，掩模工具信息处理器，掩模数据库检查装置和掩模工具信息转换器。集成商和设计人员界面为第一和第二用户提供对多项目晶圆服务的访问。帐户管理装置管理识别信息和相应的访问权限。掩模工具信息处理器向设计者接口提供预定义的形式，接收包含掩模工具信息的表单，并将完成的表单呈现给积分器接口。掩模数据库检查装置将掩模工具信息与预设数据进行比较。掩模加工信息转换器将掩模加工信息转换成掩模带出信息。

6. 发明授权

US07904855B2 Methods for partially removing circuit patterns from a multi-project wafer 有权
标题翻译：从多工程晶圆部分去除电路图案的方法
公开(公告)号：US07904855B2
公开(公告)日：2011-03-08
申请号：US11536927
申请日：2006-09-29
申请人： Yi-Hong Tseng , Kuan-Liang Wu
发明人： Yi-Hong Tseng , Kuan-Liang Wu
IPC分类号： G06F17/50 , H01L21/00
CPC分类号： H01L21/67282 , B23K26/14 , B23K26/40 , B23K2103/50 , G03F7/70425 , G03F7/70433 , H01L21/67294 , H01L23/5258 , H01L2924/0002 , H01L2924/00
摘要： Disclosed are a method and a system for partially removing circuit patterns from a multi-project wafer. This method and this system can be used to provide a multi-project-wafer to a user without disclosing proprietary circuit information of other customers. At least one integrated circuit design of a user is identified from a plurality of integrated circuit designs of a plurality of users. Those unidentified circuits can be totally removed through circuit removing method. Then the modified multi-project wafer can be delivered to the user without concerns about disclosing information of unidentified circuits which belongs to other customers. In one embodiment, a laser system may be used to totally remove the unidentified integrated circuit designs without impacting the circuit performance of identified circuits. In another embodiment, a diamond-blade saw may also be used to totally remove the unidentified integrated circuit designs without impacting the circuit performance of identified circuits.
摘要翻译：公开了一种从多工程晶片部分去除电路图案的方法和系统。该方法和该系统可以用于向用户提供多工程晶圆，而不会公开其他客户的专有电路信息。从多个用户的多个集成电路设计中识别用户的至少一个集成电路设计。那些不明的电路可以通过电路去除方法完全去除。然后，修改后的多项目晶片可以传递给用户，而不用担心公开属于其他客户的不明电路的信息。在一个实施例中，可以使用激光系统来完全去除未识别的集成电路设计，而不会影响识别的电路的电路性能。在另一个实施例中，金刚石锯片锯也可以用于完全去除未识别的集成电路设计，而不会影响识别的电路的电路性能。

7. 发明申请

US20070264798A1 Method and System for Partially Removing Circuit Patterns From a Multi-Project Wafer 有权
标题翻译：从多工程晶圆部分去除电路图案的方法和系统
公开(公告)号：US20070264798A1
公开(公告)日：2007-11-15
申请号：US11536927
申请日：2006-09-29
申请人： Yi-Hong Tseng , Kuan-Liang Wu
发明人： Yi-Hong Tseng , Kuan-Liang Wu
IPC分类号： H01L21/00
CPC分类号： H01L21/67282 , B23K26/14 , B23K26/40 , B23K2103/50 , G03F7/70425 , G03F7/70433 , H01L21/67294 , H01L23/5258 , H01L2924/0002 , H01L2924/00
摘要： Disclosed are a method and a system for partially removing circuit patterns from a multi-project wafer. This method and this system can be used to provide a multi-project-wafer to a user without disclosing proprietary circuit information of other customers. At least one integrated circuit design of a user is identified from a plurality of integrated circuit designs of a plurality of users. Those unidentified circuits can be totally removed through circuit removing method. Then the modified multi-project wafer can be delivered to the user without concerns about disclosing information of unidentified circuits which belongs to other customers. In one embodiment, a laser system may be used to totally remove the unidentified integrated circuit designs without impacting the circuit performance of identified circuits. In another embodiment, a diamond-blade saw may also be used to totally remove the unidentified integrated circuit designs without impacting the circuit performance of identified circuits.
摘要翻译：公开了一种从多工程晶片部分去除电路图案的方法和系统。该方法和该系统可以用于向用户提供多工程晶圆，而不会公开其他客户的专有电路信息。从多个用户的多个集成电路设计中识别用户的至少一个集成电路设计。那些不明的电路可以通过电路去除方法完全去除。然后，修改后的多项目晶片可以传递给用户，而不用担心公开属于其他客户的不明电路的信息。在一个实施例中，可以使用激光系统来完全去除未识别的集成电路设计，而不会影响识别的电路的电路性能。在另一个实施例中，金刚石锯片锯也可用于完全去除未识别的集成电路设计，而不会影响识别的电路的电路性能。

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