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    • 4. 发明申请
    • METHOD OF FORMING A NANO-STRUCTURE
    • 形成纳米结构的方法
    • US20130175177A1
    • 2013-07-11
    • US13822062
    • 2010-10-21
    • Peter MardilovichQingqiao WeiAnthony M. Fuller
    • Peter MardilovichQingqiao WeiAnthony M. Fuller
    • C25D5/02
    • C25D5/022B81B2203/0361B81C1/00031B81C2201/0114B82Y20/00B82Y30/00B82Y40/00C25D11/045C25D11/12C25D11/34
    • A method of forming a nano-structure (100′) involves forming a multi-layered structure (10) including an oxidizable material layer (14) established on a substrate (12), and another oxidizable material layer (16) established on the oxidizable material layer (14). The oxidizable material layer (14) is an oxidizable material having an expansion coefficient, during oxidation, that is more than 1. Anodizing the other oxidizable material layer (16) forms a porous anodic structure (16′), and anodizing the oxidizable material layer (14) forms a dense oxidized layer (14′) and nano-pillars (20) which grow through the porous anodic structure (16′) into pores (18) thereof. The porous structure (16′) is selectively removed to expose the nano-pillars (20). A surface (I) between the dense oxidized layer (14′) and a remaining portion of the oxidizable material layer (14) is anodized to consume a substantially cone-shaped portion (32) of the nano-pillars (20) to form cylindrical nano-pillars (20′).
    • 形成纳米结构(100')的方法包括形成包括建立在基板(12)上的可氧化材料层(14)的多层结构(10),以及建立在可氧化的材料层(16)上的另一可氧化材料层 材料层(14)。 可氧化材料层(14)是在氧化期间具有大于1的膨胀系数的可氧化材料。阳极氧化其它可氧化材料层(16)形成多孔阳极结构(16'),并阳极氧化可氧化材料层 (14)形成致密氧化层(14')和通过多孔阳极结构(16')生长成其孔隙(18)的纳米柱(20)。 选择性地去除多孔结构(16')以暴露纳米柱(20)。 密集氧化层(14')和可氧化材料层(14)的剩余部分之间的表面(I)被阳极氧化以消耗纳米柱(20)的大致锥形部分(32),以形成圆柱形 纳米柱(20')。
    • 6. 发明申请
    • METHOD OF FORMING A MICRO-STRUCTURE
    • 形成微结构的方法
    • US20130177738A1
    • 2013-07-11
    • US13825029
    • 2010-10-21
    • Peter MardilovichAnthony M. FullerQingqiao Wei
    • Peter MardilovichAnthony M. FullerQingqiao Wei
    • B81C1/00B81B3/00C25D11/02
    • B81C1/00373B81B3/00B81C1/00031C25D1/006C25D11/022C25D11/045C25D11/08C25D11/10C25D11/18C25D11/26Y10S977/856Y10S977/888Y10T428/24355
    • A method of forming a micro-structure (100, 100′, 100″, 100′″) involves forming a multi-layered structure (10) including i) an oxidizable material layer (14) on a substrate (12) and ii) another oxidizable material layer (16) on the oxidizable material layer (14). The oxidizable material layer (14) is formed of an oxidizable material having an expansion coefficient, during oxidation, that is more than 1. The method further involves forming a template (16′), including a plurality of pores (18), from the other oxidizable material layer (16), and growing a nano-pillar (20) inside each pore (18). The nano-pillar (18) has a predefined length (L) that terminates at an end (21). A portion of the template (16′) is selectively removed to form a substantially even plane (23) that is oriented in a position opposed to the substrate (12). A material is deposited on at least a portion of the plane (23) to form a film layer (22, 22′) thereon, and the remaining portion of the template (16′) is selectively removed to expose the nano-pillars (20).
    • 形成微结构(100,100',100“,100”)的方法涉及形成多层结构(10),其包括i)在基底(12)上的可氧化材料层(14)和 ii)可氧化材料层(14)上的另一可氧化材料层(16)。 可氧化材料层(14)由在氧化期间具有大于1的膨胀系数的可氧化材料形成。该方法还包括形成包括多个孔(18)的模板(18'),该模板包括多个孔 其他可氧化材料层(16),并且在每个孔(18)内生长纳米柱(20)。 纳米柱(18)具有在端部(21)处终止的预定长度(L)。 选择性地去除模板(16')的一部分以形成在与衬底(12)相对的位置上定向的基本均匀的平面(23)。 材料沉积在平面(23)的至少一部分上以在其上形成膜层(22,22'),并且选择性地去除模板(16')的剩余部分以暴露纳米柱(20 )。