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1. 发明授权

US07481312B2 Direct cooling pallet assembly for temperature stability for deep ion mill etch process 有权
标题翻译：直接冷却托盘组件，用于深度离子磨蚀刻蚀工艺的温度稳定性
公开(公告)号：US07481312B2
公开(公告)日：2009-01-27
申请号：US11001798
申请日：2004-12-02
申请人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
发明人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
IPC分类号： B65D85/00
CPC分类号： H01L21/67333 , H01L21/67109
摘要： Embodiments of the present invention are directed to a frame component of a pallet assembly. In one embodiment, the frame comprises a plurality of arms for retaining at least one carrier component. The frame further comprises at least one spring disposed upon one of the plurality of arms. The spring for applying pressure upon the carrier.
摘要翻译：本发明的实施例涉及托盘组件的框架部件。在一个实施例中，框架包括用于保持至少一个载体部件的多个臂。框架还包括设置在多个臂之一上的至少一个弹簧。用于在载体上施加压力的弹簧。

2. 发明授权

US07296420B2 Direct cooling pallet tray for temperature stability for deep ion mill etch process 有权
标题翻译：直接冷却托盘托盘用于深度离子磨蚀刻蚀工艺的温度稳定性
公开(公告)号：US07296420B2
公开(公告)日：2007-11-20
申请号：US11001795
申请日：2004-12-02
申请人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
发明人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
IPC分类号： F25D25/00 , F25D17/06 , F25D23/12
CPC分类号： H01L21/67109 , H01L21/67333
摘要： Embodiments of the present invention are directed to a pallet assembly which facilitates direct cooling of the wafer carrier. In one embodiment, the pallet assembly comprises a frame which holds at least one carrier of a component. The pallet assembly further comprises a tray which is operable for being mechanically coupled with the frame. The tray comprises at least one discreet region which corresponds with the carrier when the tray is coupled with the frame. In embodiments of the present invention, the discreet region comprises at least one hole extending through the tray for permitting a coolant medium to dissipate heat from the carrier.
摘要翻译：本发明的实施例涉及一种有助于晶片载体的直接冷却的托盘组件。在一个实施例中，托盘组件包括保持部件的至少一个托架的框架。托盘组件还包括可操作以与框架机械联接的托盘。当托盘与框架联接时，该托盘包括至少一个对应于托架的离散区域。在本发明的实施例中，离散区域包括延伸穿过托盘的至少一个孔，用于允许冷却剂介质从载体中散发热量。

3. 发明申请

US20060118447A1 Direct cooling pallet assembly for temperature stability for deep ion mill etch process 有权
公开(公告)号：US20060118447A1
公开(公告)日：2006-06-08
申请号：US11001798
申请日：2004-12-02
申请人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
发明人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
IPC分类号： B65D19/00
CPC分类号： H01L21/67333 , H01L21/67109
摘要： Embodiments of the present invention are directed to a frame component of a pallet assembly. In one embodiment, the frame comprises a plurality of arms for retaining at least one carrier component. The frame further comprises at least one spring disposed upon one of the plurality of arms. The spring for applying pressure upon the carrier.

4. 发明申请

US20060117762A1 Direct cooling pallet tray for temperature stability for deep ion mill etch process 有权
标题翻译：直接冷却托盘托盘用于深度离子磨蚀刻蚀工艺的温度稳定性
公开(公告)号：US20060117762A1
公开(公告)日：2006-06-08
申请号：US11001795
申请日：2004-12-02
申请人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
发明人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
IPC分类号： F25D25/00 , F25D17/04 , B65G17/16 , B65G17/32
CPC分类号： H01L21/67109 , H01L21/67333
摘要： Embodiments of the present invention are directed to a pallet assembly which facilitates direct cooling of the wafer carrier. In one embodiment, the pallet assembly comprises a frame which holds at least one carrier of a component. The pallet assembly further comprises a tray which is operable for being mechanically coupled with the frame. The tray comprises at least one discreet region which corresponds with the carrier when the tray is coupled with the frame. In embodiments of the present invention, the discreet region comprises at least one hole extending through the tray for permitting a coolant medium to dissipate heat from the carrier.
摘要翻译：本发明的实施例涉及一种有助于晶片载体的直接冷却的托盘组件。在一个实施例中，托盘组件包括保持部件的至少一个托架的框架。托盘组件还包括可操作以与框架机械联接的托盘。当托盘与框架联接时，该托盘包括至少一个对应于托架的离散区域。在本发明的实施例中，离散区域包括延伸穿过托盘的至少一个孔，用于允许冷却剂介质从载体中散发热量。

5. 发明授权

US07560225B2 Method of forming uniform features using photoresist 失效
标题翻译：使用光刻胶形成均匀特征的方法
公开(公告)号：US07560225B2
公开(公告)日：2009-07-14
申请号：US10448501
申请日：2003-05-29
申请人： Omar Eduardo Montero Camacho , Pei-C Chen , Cherngye Hwang , Diana Perez , Eric Yongjian Sun
发明人： Omar Eduardo Montero Camacho , Pei-C Chen , Cherngye Hwang , Diana Perez , Eric Yongjian Sun
IPC分类号： G03F7/40 , B44C1/22
CPC分类号： G11B5/3173 , G03F7/40 , G03F7/405 , G11B5/102
摘要： A process for ion milling using photoresist as a mask is described. In a preferred embodiment the invention is used in the fabricating air-bearing features on sliders for use in magnetic storage devices. According to the invention the photoresist (liquid or dry) is applied, developed and removed as in the prior art which includes baking steps. The embodiment of the invention includes an additional baking step beyond whatever baking steps are used in the photolithography process. The additional baking step is preferably performed immediately prior to ion milling. The additional baking step according to the invention yields increased uniformity of the depth of the ion milling which is believed to result from reduction of volatile material such as water in the photoresist. When the invention is used as part of the manufacturing process for ion milling the air-bearing features on a slider, the features are more uniform which improves the overall quality and performance.
摘要翻译：描述使用光致抗蚀剂作为掩模的离子铣削的方法。在优选实施例中，本发明用于制造用于磁存储装置的滑块上的空气轴承特征。根据本发明，如在包括烘烤步骤的现有技术中，应用，显影和去除光致抗蚀剂（液体或干燥）。本发明的实施例包括除了在光刻工艺中使用的任何烘烤步骤之外的额外的烘烤步骤。额外的烘烤步骤优选在离子研磨之前立即进行。根据本发明的另外的烘烤步骤产生离子研磨深度的均匀性，这被认为是通过光致抗蚀剂中的挥发性物质例如水的还原引起的。当将本发明用作离子铣削制造过程的一部分时，滑块上的空气轴承特征更加均匀，这提高了整体的质量和性能。

6. 发明授权

US08220136B2 Forming a planarized surface for at least one bar of sliders 有权
标题翻译：形成用于至少一个滑块的平坦化表面
公开(公告)号：US08220136B2
公开(公告)日：2012-07-17
申请号：US11800127
申请日：2007-05-03
申请人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
发明人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/4853 , G11B5/102 , G11B5/3163 , G11B5/3173 , Y10T29/49027 , Y10T29/49039 , Y10T29/49041 , Y10T29/49055 , Y10T29/53165 , Y10T156/10
摘要： A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.
摘要翻译：公开了一种用于形成至少一个用于硬盘驱动器的滑块的平面化表面的方法。通常，将至少一个滑杆放置在粘合剂层上。然后在至少一个滑杆上方设置单个热塑性层。然后将单个热塑性层加热到软化温度，使得单个热塑性层将在至少一个滑块之间流动。然后将单个热塑性层冷却以在所述粘合剂层处形成所述单一热塑性层和所述至少一个滑块条的平坦化表面。

7. 发明申请

US20080273270A1 Forming a planarized surface for at least one bar of sliders 有权
标题翻译：形成用于至少一个滑块的平坦化表面
公开(公告)号：US20080273270A1
公开(公告)日：2008-11-06
申请号：US11800127
申请日：2007-05-03
申请人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
发明人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
IPC分类号： G11B5/60 , G11B5/147 , B29C65/00
CPC分类号： G11B5/4853 , G11B5/102 , G11B5/3163 , G11B5/3173 , Y10T29/49027 , Y10T29/49039 , Y10T29/49041 , Y10T29/49055 , Y10T29/53165 , Y10T156/10
摘要： A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.
摘要翻译：公开了一种用于形成至少一个用于硬盘驱动器的滑块的平面化表面的方法。通常，将至少一个滑杆放置在粘合剂层上。然后在至少一个滑杆上方设置单个热塑性层。然后将单个热塑性层加热到软化温度，使得单个热塑性层将在至少一个滑块之间流动。然后将单个热塑性层冷却以在所述粘合剂层处形成所述单一热塑性层和所述至少一个滑块条的平坦化表面。

8. 发明授权

US07300556B2 Method for depositing a thin film adhesion layer 有权
标题翻译：沉积薄膜粘附层的方法
公开(公告)号：US07300556B2
公开(公告)日：2007-11-27
申请号：US10651632
申请日：2003-08-29
申请人： Cherngye Hwang , Eun Row , Ning Shi , Eric (Yongjian) Sun
发明人： Cherngye Hwang , Eun Row , Ning Shi , Eric (Yongjian) Sun
IPC分类号： C23C14/34
CPC分类号： C23C28/046 , C23C14/024 , C23C14/0605 , C23C14/165 , C23C28/04
摘要： A method of physical vapor deposition (PVD) is disclosed in which xenon is used as the operating gas in the vacuum chamber in the deposition of an adhesion layer, preferably silicon, which allows the adhesion layer to be ultra-thin with improved durability over prior art films. The use of argon as is typical in the prior art results in argon atoms being incorporated into the ultra-thin silicon film with deleterious results. In films that are only several angstroms thick, the contamination of the film with argon or other elements can yield a film with reduced adhesion performance and in some cases noble atoms such as argon can escape the film leaving voids or pinholes. The use of the larger and heavier xenon atoms in the vacuum chamber produces a substantially purer film with reduced risk of voids and pinholes. In a preferred embodiment the use of xenon as the operating gas for deposition of the silicon adhesion layer is combined with the use of a filtered cathodic arc (FCA) process to deposit the protective overcoat, preferably carbon based, on a magnetic recording head.
摘要翻译：公开了一种物理气相沉积（PVD）的方法，其中在沉积粘合层（优选硅）时，将氙用作真空室中的操作气体，其允许粘附层超薄，同时具有改善的耐久性艺术电影。如现有技术中典型的使用氩气导致氩原子被掺入到超薄硅膜中，具有有害的结果。在只有几埃厚的薄膜中，用氩气或其它元素污染薄膜可能产生具有降低的粘附性能的膜，并且在某些情况下，诸如氩气的贵重原子可以逸出留下空隙或针孔的膜。在真空室中使用更大和更重的氙原子产生基本上更纯的膜，具有降低的空隙和针孔的风险。在优选的实施方案中，将氙作为沉积硅粘合层的工作气体的使用与使用过滤的阴极电弧（FCA）方法结合，以将保护性外涂层，优选基于碳的沉积物沉积在磁性记录头上。

9. 发明授权

US08361284B2 Reducing the height of a defect associated with an air bearing surface 有权
标题翻译：降低与空气轴承表面相关的缺陷的高度
公开(公告)号：US08361284B2
公开(公告)日：2013-01-29
申请号：US11800182
申请日：2007-05-03
申请人： Roberto Cabral Frias , Mario Garcia De la Cruz , Cherngye Hwang , Tetsuya Matsusaki , Omar E. Montero Camacho , Yongjian Sun
发明人： Roberto Cabral Frias , Mario Garcia De la Cruz , Cherngye Hwang , Tetsuya Matsusaki , Omar E. Montero Camacho , Yongjian Sun
IPC分类号： C23C14/32
CPC分类号： G11B5/3169 , G11B5/3163 , G11B5/6005
摘要： A method for reducing the height of a defect associated with an air bearing surface of a hard disk drive slider is disclosed. The technology initially ion mills for a first period of time at a first angle relative to an air bearing surface of a disk drive slider to remove a first portion of the air bearing surface. Then the technology ion mills for a second period of time at a second angle relative to an air bearing surface of the disk drive slider to remove a second portion of the air bearing surface. The second portion of the air bearing surface comprises a defect wherein the ion milling at the second angle reduces the height of the defect with respect to the air bearing surface.
摘要翻译：公开了一种用于降低与硬盘驱动器滑块的空气轴承表面相关联的缺陷的高度的方法。该技术首先离开第一时间段相对于盘驱动器滑块的空气轴承表面以第一角度铣削以移除空气轴承表面的第一部分。然后，该技术离子相对于盘驱动器滑块的空气轴承表面以第二角度研磨第二时间段，以去除空气轴承表面的第二部分。空气轴承表面的第二部分包括缺陷，其中以第二角度的离子铣削相对于空气轴承表面减小缺陷的高度。

10. 发明授权

US07929251B2 Assembly, apparatus and method for fabricating a structural element of a hard disk drive air bearing 有权
标题翻译：用于制造硬盘驱动器空气轴承的结构元件的组装，装置和方法
公开(公告)号：US07929251B2
公开(公告)日：2011-04-19
申请号：US11329680
申请日：2006-01-10
申请人： Peter Dang , Eric W. Flint , Cherngye Hwang , Yongjian Sun
发明人： Peter Dang , Eric W. Flint , Cherngye Hwang , Yongjian Sun
IPC分类号： G11B5/60 , B44C1/22
CPC分类号： G11B5/6005 , Y10T29/49046
摘要： An assembly, apparatus and method for fabricating a structural element of a hard disk drive air bearing. The method and apparatus provide an improved protective layer, an improved structural element consisting of a single layer of structural material, and a method consisting of applying the improved protective layer, applying a uniform layer of structural material, applying a resist layer, etching the structural material layer, and removing the resist layer.
摘要翻译：一种用于制造硬盘驱动器空气轴承的结构元件的组件，装置和方法。该方法和装置提供改进的保护层，由单层结构材料组成的改进的结构元件，以及由改进的保护层，施加均匀的结构材料层，施加抗蚀剂层，蚀刻结构材料材料层，并除去抗蚀剂层。

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