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    • 9. 发明授权
    • Stackable process chambers
    • 可堆叠处理室
    • US06923192B2
    • 2005-08-02
    • US10171429
    • 2002-06-12
    • Chad M. HosackPaul PatelRaoul Standt
    • Chad M. HosackPaul PatelRaoul Standt
    • B08B3/02B08B3/12H01L21/00H01L21/304B08B7/04
    • H01L21/67051H01L21/67034Y10S134/902
    • A substrate processing system has a first substrate cleaner and a second substrate cleaner. The first substrate cleaner comprises a forward portion and a rear portion. The forward portion includes a rotatable substrate support. The rear portion is vertically thicker than the forward portion. The rear portion includes a device for rotating the support. The second substrate cleaner includes the elements included in the first substrate cleaner. The second substrate cleaner is stacked above the first substrate cleaner with the forward portions being vertically aligned and the rear portions being vertically aligned. A space is formed between the forward portions to permit access to the forward portion of the first substrate cleaner and to permit ample gas flow into the area between the forward portions of the first and the second substrate cleaners.
    • 衬底处理系统具有第一衬底清洁器和第二衬底清洁器。 第一衬底清洁器包括前部和后部。 前部包括可旋转的基板支撑件。 后部比前部部分垂直厚。 后部包括用于旋转支撑件的装置。 第二基板清洁器包括包括在第一基板清洁器中的元件。 第二基板清洁器堆叠在第一基板清洁器的上方,其中前部垂直对齐并且后部垂直对准。 在前部之间形成空间,以允许进入第一基板清洁器的前部并且允许充足的气体流入第一和第二基板清洁器的前部之间的区域。