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1. 发明授权

US06582890B2 Multiple wavelength photolithography for preparing multilayer microstructures 有权
公开(公告)号：US06582890B2
公开(公告)日：2003-06-24
申请号：US09799744
申请日：2001-03-05
申请人： Paul Michael Dentinger , Karen Lee Krafcik
发明人： Paul Michael Dentinger , Karen Lee Krafcik
IPC分类号： G03C558
CPC分类号： B81C1/00619 , C25D1/003 , C25D5/022 , G03F7/00 , G03F7/095 , Y10T428/24331
摘要： The invention relates to a multilayer microstructure and a method for preparing thereof. The method involves first applying a first photodefinable composition having a first exposure wavelength on a substrate to form a first polymeric layer. A portion of the first photodefinable composition is then exposed to electromagnetic radiation of the first exposure wavelength to form a first pattern in the first polymeric layer. After exposing the first polymeric layer, a second photodefinable composition having a second exposure wavelength is applied on the first polymeric layer to form a second polymeric layer. A portion of the second photodefinable composition is then exposed to electromagnetic radiation of the second exposure wavelength to form a second pattern in the second polymeric layer. In addition, a portion of each layer is removed according to the patterns to form a multilayer microstructure having a cavity having a shape that corresponds to the portions removed.

2. 发明授权

US06566030B2 Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores 失效
公开(公告)号：US06566030B2
公开(公告)日：2003-05-20
申请号：US10001467
申请日：2001-10-31
申请人： Robert David Grober , Scott Josef Bukofsky , Paul Michael Dentinger , James Welch Taylor
发明人： Robert David Grober , Scott Josef Bukofsky , Paul Michael Dentinger , James Welch Taylor
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/105
摘要： A method of imaging acids in chemically amplified photoresists involves exposing to radiation a chemically amplified photoresist comprising a pH-dependent fluorophore. Upon exposure to radiation, such as deep-UV radiation, the chemically amplified photoresist produces an acid, which is then visualized by the fluorescence of the pH-dependent fluorophore. An image is generated from the fluorescence of the pH-dependent fluorophore, thus providing a map of the location of the acid in the photoresist. The images are able to be visualized prior to a post-exposure bake of the resist composition. Chemically amplified photoresists comprising pH-dependent fluorophores are useful in the practice of the present invention. The method finds particular use in examining the efficiency of photoacid generators in chemically amplified photoresists, in that it allows the practitioner the ability to directly determine the amount of acid generated within the photoresist.

3. 发明授权

US06376149B2 Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores 失效
标题翻译：使用pH依赖性荧光团在化学放大光致抗体中成像酸的方法和组合物
公开(公告)号：US06376149B2
公开(公告)日：2002-04-23
申请号：US09320101
申请日：1999-05-26
申请人： Robert David Grober , Scott Josef Bukofsky , Paul Michael Dentinger , James Welch Taylor
发明人： Robert David Grober , Scott Josef Bukofsky , Paul Michael Dentinger , James Welch Taylor
IPC分类号： G03C516
CPC分类号： G03F7/0045 , G03F7/105
摘要： A method of imaging acids in chemically amplified photoresists involves exposing to radiation a chemically amplified photoresist comprising a pH-dependent fluorophore. Upon exposure to radiation, such as deep-UV radiation, the chemically amplified photoresist produces an acid, which is then visualized by the fluorescence of the pH-dependent fluorophore. An image is generated from the fluorescence of the pH-dependent fluorophore, thus providing a map of the location of the acid in the photoresist. The images are able to be visualized prior to a post-exposure bake of the resist composition. Chemically amplified photoresists comprising pH-dependent fluorophores are useful in the practice of the present invention. The method finds particular use in examining the efficiency of photoacid generators in chemically amplified photoresists, in that it allows the practitioner the ability to directly determine the amount of acid generated within the photoresist.
摘要翻译：在化学放大的光致抗蚀剂中成像酸的方法包括将包含pH依赖荧光团的化学放大的光致抗蚀剂暴露于辐射。在暴露于诸如深紫外辐射的辐射之后，化学放大的光致抗蚀剂产生酸，然后通过pH依赖性荧光团的荧光显现出酸。从pH依赖性荧光团的荧光产生图像，从而提供光致抗蚀剂中酸的位置的图。在抗蚀剂组合物的曝光后烘烤之前，图像能够被可视化。包含pH依赖性荧光团的化学放大光致抗蚀剂在本发明的实践中是有用的。该方法特别用于检查化学放大光致抗蚀剂中光酸产生剂的效率，因为其允许从业者直接测定光致抗蚀剂内产生的酸的量的能力。

4. 发明授权

US06869015B2 Tamper-indicating barcode and method 有权
标题翻译：防篡改条形码和方法
公开(公告)号：US06869015B2
公开(公告)日：2005-03-22
申请号：US10265477
申请日：2002-10-04
申请人： Eric B. Cummings , William R. Even, Jr. , Blake A. Simmons , Paul Michael Dentinger
发明人： Eric B. Cummings , William R. Even, Jr. , Blake A. Simmons , Paul Michael Dentinger
IPC分类号： G06K7/14 , G06K19/06 , G08K9/22
CPC分类号： G06K7/14 , G06K7/1473 , G06K19/06037
摘要： A novel tamper-indicating barcode methodology is disclosed that allows for detection of alteration to the barcode. The tamper-indicating methodology makes use of a tamper-indicating means that may be comprised of a particulate indicator, an optical indicator, a deformable substrate, and/or may be an integrated aspect of the barcode itself. This tamper-indicating information provides greater security for the contents of containers sealed with the tamper-indicating barcodes.
摘要翻译：公开了一种新颖的篡改指示条形码方法，其允许检测对条形码的改变。篡改指示方法利用可由微粒指示器，光学指示器，可变形基板组成的篡改指示装置，和/或可以是条形码本身的集成方面。这种篡改指示信息为使用篡改指示条形码密封的容器的内容提供了更大的安全性。

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