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1. 发明授权

US07694688B2 Wet clean system design 失效
标题翻译：湿清洁系统设计
公开(公告)号：US07694688B2
公开(公告)日：2010-04-13
申请号：US11620610
申请日：2007-01-05
申请人： Paul Lester , Scott Meyer , Wyland L. Atkins , Douglas Richards , Constantin Predoaica , Jeffrey Hudgens , Charles Carlson , Penchala Kankanala , Mike Rice , James S. Papanu , Evanson G. Baiya , John J. Rosato
发明人： Paul Lester , Scott Meyer , Wyland L. Atkins , Douglas Richards , Constantin Predoaica , Jeffrey Hudgens , Charles Carlson , Penchala Kankanala , Mike Rice , James S. Papanu , Evanson G. Baiya , John J. Rosato
IPC分类号： B08B3/04
CPC分类号： H01L21/67766 , H01L21/67051 , H01L21/68707 , Y10S134/902
摘要： The present invention generally provides an apparatus and method for processing and transferring substrates in a multi-chamber processing system that has the capability of receiving and performing single substrate processing steps performed in parallel, while using the many favorable aspects of batch processing. Embodiments of the invention described herein are adapted to maximize system throughput, reduce system cost, reduce cost per substrate during processing, increase system reliability, improve the device yield on the processed substrates, and reduce system footprint. In one embodiment, the cluster tool is adapted to perform a wet/clean process sequence in which various substrate cleaning processes are performed on a substrate in the cluster tool.
摘要翻译：本发明通常提供了一种在多室处理系统中处理和传送基板的装置和方法，该多室处理系统具有在使用批处理的许多有利方面的同时并行执行的单个基板处理步骤的能力。本文描述的本发明的实施例适用于最大化系统吞吐量，降低系统成本，在处理期间降低每个基板的成本，增加系统可靠性，提高处理的基板上的装置产量，并减少系统占用面积。在一个实施例中，群集工具适于执行湿/清洁处理序列，其中在群集工具中的基板上执行各种基板清洁处理。

2. 发明申请

US20080166208A1 WET CLEAN SYSTEM DESIGN 失效
标题翻译：湿清洁系统设计
公开(公告)号：US20080166208A1
公开(公告)日：2008-07-10
申请号：US11620610
申请日：2007-01-05
申请人： Paul Lester , Scott Meyer , Wyland L. Atkins , Douglas Richards , Constantin Predoaica , Jeffrey Hudgens , Charles Carlson , Penchala Kankanala , Mike Rice , James S. Papanu , Evanson G. Baiya , John J. Rosato
发明人： Paul Lester , Scott Meyer , Wyland L. Atkins , Douglas Richards , Constantin Predoaica , Jeffrey Hudgens , Charles Carlson , Penchala Kankanala , Mike Rice , James S. Papanu , Evanson G. Baiya , John J. Rosato
IPC分类号： H01L21/67
CPC分类号： H01L21/67766 , H01L21/67051 , H01L21/68707 , Y10S134/902
摘要： The present invention generally provides an apparatus and method for processing and transferring substrates in a multi-chamber processing system that has the capability of receiving and performing single substrate processing steps performed in parallel, while using the many favorable aspects of batch processing. Embodiments of the invention described herein are adapted to maximize system throughput, reduce system cost, reduce cost per substrate during processing, increase system reliability, improve the device yield on the processed substrates, and reduce system footprint. In one embodiment, the cluster tool is adapted to perform a wet/clean process sequence in which various substrate cleaning processes are performed on a substrate in the cluster tool.
摘要翻译：本发明通常提供了一种在多室处理系统中处理和传送基板的装置和方法，该多室处理系统具有在使用批处理的许多有利方面的同时并行执行的单个基板处理步骤的能力。本文描述的本发明的实施例适用于最大化系统吞吐量，降低系统成本，在处理期间降低每个基板的成本，增加系统可靠性，提高处理的基板上的装置产量，并减少系统占用面积。在一个实施例中，群集工具适于执行湿/清洁处理序列，其中在群集工具中的基板上执行各种基板清洁处理。

3. 发明申请

US20080163900A1 IPA DELIVERY SYSTEM FOR DRYING 审中-公开
标题翻译：用于干燥的IPA递送系统
公开(公告)号：US20080163900A1
公开(公告)日：2008-07-10
申请号：US11685426
申请日：2007-03-13
申请人： DOUGLAS RICHARDS , Evanson G. Baiya , John J. Rosato , Madhava Rao Yalamanchili
发明人： DOUGLAS RICHARDS , Evanson G. Baiya , John J. Rosato , Madhava Rao Yalamanchili
IPC分类号： B08B3/08
CPC分类号： H01L21/67057 , H01L21/67028 , H01L21/67034 , H01L21/67173 , H01L21/67751
摘要： A method and system for cleaning a batch of substrates is provided. The system includes a first cluster of vertical processing chambers, an IPA reservoir, and an IPA delivery system in fluid communication with the IPA reservoir and the first cluster of vertical processing chambers, wherein the IPA delivery system is adapted to transfer IPA vapor between the IPA reservoir and the first cluster of vertical processing chambers. In certain embodiments, the system further comprises a first main circulation tank, a second main circulation tank, a reservoir-cluster recirculation circuit in fluid communication with the first main circulation tank and the second main circulation tank and with each processing chamber in the first cluster of vertical processing chambers, and a dosing circuit comprising a plurality of additive sources in fluid communication with the first main circulation tank and the second main circulation tank.
摘要翻译：提供了清洗一批基板的方法和系统。该系统包括第一组垂直处理室，IPA储存器和与IPA储存器和第一垂直处理室群流体连通的IPA输送系统，其中IPA输送系统适于在IPA之间转移IPA蒸气水库和第一批垂直处理室。在某些实施例中，该系统还包括第一主循环罐，第二主循环罐，与第一主循环罐和第二主循环罐流体连通的储集器簇再循环回路，以及第一组中的每个处理室以及包括与第一主循环罐和第二主循环罐流体连通的多个添加剂源的计量回路。

4. 发明授权

US06878213B1 Process and system for rinsing of semiconductor substrates 失效
标题翻译：用于冲洗半导体衬底的工艺和系统
公开(公告)号：US06878213B1
公开(公告)日：2005-04-12
申请号：US09408279
申请日：1999-09-29
申请人： John J. Rosato , Jane Fahrenkrug , Curtis R. Olson , Paul G. Lindquist
发明人： John J. Rosato , Jane Fahrenkrug , Curtis R. Olson , Paul G. Lindquist
IPC分类号： H01L21/00 , H01L21/306 , C23G1/02
CPC分类号： H01L21/67028 , H01L21/02063 , Y10S438/906
摘要： Semiconductor substrates, particularly metallized substrates such as partially processed wafers, are rinsed with an aqueous medium, preferably deionized water, which further contains an anti-corrosive chemical agent or agents selected so as to minimize corrosion of metals resulting from contact with the water. The amount of anti-corrosive chemical agent is maintained in a controlled manner at a predetermined level or within a predetermined range preferably the rinsing with aqueous medium containing anticorrosive chemical agent is also carried out for a specified time, followed by further rinsing with deionized water alone. The rinsing may be combined, either in the same vessel or in a different vessel, with a subsequent drying step, such as a drying process utilizing a drying vapor introduced into the rinse tank or into a downstream vessel. The drying vapor condenses on the surface of the semiconductor material and reduces the surface tension of residual process fluid, causing the residual process fluid to flow off the surface.
摘要翻译：半导体衬底，特别是金属化衬底（例如部分处理的晶片）用水性介质，优选去离子水冲洗，其中还含有防腐蚀化学试剂或选择的试剂，以便最小化与由水接触而导致的金属腐蚀。防腐蚀化学试剂的量以受控方式保持在预定水平或预定范围内，优选用含有防锈化学试剂的含水介质进行漂洗特定时间，然后用去离子水单独进一步冲洗。冲洗可以在相同的容器中或在不同的容器中组合，随后的干燥步骤，例如使用引入到漂洗槽中的干燥蒸气或下游容器的干燥方法。干燥蒸汽在半导体材料的表面上冷凝并降低残余工艺流体的表面张力，导致残留的工艺流体流出表面。

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