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1. 发明授权

US06878895B1 Reticle sorter 有权
标题翻译：标线分选机
公开(公告)号：US06878895B1
公开(公告)日：2005-04-12
申请号：US09383508
申请日：1999-08-26
申请人： Patrick J. Ryan , Michael R. Conboy , Stephen P. Hovestol
发明人： Patrick J. Ryan , Michael R. Conboy , Stephen P. Hovestol
IPC分类号： B07C5/344
CPC分类号： B07C5/344 , Y10S209/939
摘要： A reticle sorter and a semiconductor fabrication facility employing one or more reticle sorters is provided. The reticle sorter(s) generally lies between a reticle storage system and a group of one or more photolithography exposure tools (e.g., steppers) and is configured for sorting reticles in one or more cassettes. The use of the reticle sorter provides sorting functionality apart from the reticle storage system and typically closer to the group of photolithography steppers with which it is associated. This can, for example, significantly increase the throughput of semiconductor wafers through the associated photolithography exposure tools as well as in the semiconductor fabrication plant as a whole.
摘要翻译：提供了采用一个或多个掩模版分拣机的掩模版分拣机和半导体制造设备。掩模版分选机通常位于掩模版存储系统和一组一个或多个光刻曝光工具（例如步进器）之间，并且被配置用于将一个或多个盒中的掩模版分类。标线分类器的使用提供了除了掩模版存储系统之外的分类功能，并且通常更接近与其相关联的光刻步进组。例如，这可以通过相关的光刻曝光工具以及整个半导体制造工厂显着提高半导体晶片的生产量。

2. 发明授权

US5972727A Reticle sorter 失效
标题翻译：标线分选机
公开(公告)号：US5972727A
公开(公告)日：1999-10-26
申请号：US107111
申请日：1998-06-30
申请人： Patrick J. Ryan , Michael R. Conboy , Stephen P. Hovestol
发明人： Patrick J. Ryan , Michael R. Conboy , Stephen P. Hovestol
IPC分类号： G03F7/20 , H01L21/00 , H01L21/66 , G01R31/26
CPC分类号： H01L21/67271 , G03F7/70541 , G03F7/70741 , Y10T29/41
摘要： A reticle sorter and a semiconductor fabrication facility employing one or more reticle sorters is provided. The reticle sorter(s) generally lies between a reticle storage system and a group of one or more photolithography exposure tools (e.g., steppers) and is configured for sorting reticles in one or more cassettes. The use of the reticle sorter provides sorting functionality apart from the reticle storage system and typically closer to the group of photolithography steppers with which it is associated. This can, for example, significantly increase the throughput of semiconductor wafers through the associated photolithography exposure tools as well as in the semiconductor fabrication plant as a whole.
摘要翻译：提供了采用一个或多个掩模版分拣机的掩模版分拣机和半导体制造设备。掩模版分选机通常位于掩模版存储系统和一组一个或多个光刻曝光工具（例如步进器）之间，并且被配置用于将一个或多个盒中的掩模版分类。标线分类器的使用提供了除了掩模版存储系统之外的分类功能，并且通常更接近与其相关联的光刻步进组。例如，这可以通过相关的光刻曝光工具以及整个半导体制造工厂显着提高半导体晶片的生产量。

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