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1. 发明授权

US5422724A Multiple-scan method for wafer particle analysis 失效
标题翻译：晶圆颗粒分析的多重扫描方法
公开(公告)号：US5422724A
公开(公告)日：1995-06-06
申请号：US116232
申请日：1993-08-31
申请人： Patrick D. Kinney , Yuri S. Uritsky , Harry Q. Lee
发明人： Patrick D. Kinney , Yuri S. Uritsky , Harry Q. Lee
IPC分类号： G01B11/00 , G01N15/00 , G01R31/305 , G01R31/307 , H01J37/22 , H01L21/66
CPC分类号： G01R31/305 , G01R31/307 , H01L22/20 , H01L22/12
摘要： A method for reducing targeting errors encountered when trying to locate contaminant particles in a high-magnification imaging device, based on estimates of the particle positions obtained from a scanning device. The method of the invention includes scanning a semiconductor wafer in a scanning device, then preferably moving the wafer to a different orientation, and scanning the wafer again, to obtain at least two sets of particle coordinates that may differ slightly because of uncertainties in the scanning process. The multiple sets of coordinates are averaged to reduce the targeting errors, but only after transforming the coordinates to a common coordinate system. The transformation step includes computing transformation parameters for each possible pair of particles detected in at least two scans, averaging the results, and then transforming all of the particle coordinates to the common coordinate system. Optionally, the method may include discarding any transformation parameters that deviate too far from the average, and then computing the average transformation parameters again.
摘要翻译：基于从扫描装置获得的粒子位置的估计，减少在高倍率成像装置中定位污染物颗粒时遇到的瞄准误差的方法。本发明的方法包括在扫描装置中扫描半导体晶片，然后优选地将晶片移动到不同的取向，并再次扫描晶片，以获得由于扫描中的不确定性而可能略有不同的至少两组粒子坐标处理。对多组坐标进行平均以减少目标误差，但仅在将坐标转换为公共坐标系之后。变换步骤包括计算在至少两次扫描中检测到的每个可能的一对颗粒的变换参数，对结果求平均值，然后将所有粒子坐标转换为公共坐标系。可选地，该方法可以包括丢弃偏离平均值太远的任何变换参数，然后再次计算平均变换参数。

2. 发明授权

US5267017A Method of particle analysis on a mirror wafer 失效
标题翻译：在镜片上进行粒子分析的方法
公开(公告)号：US5267017A
公开(公告)日：1993-11-30
申请号：US886541
申请日：1992-05-20
申请人： Yuri S. Uritsky , Harry Q. Lee , Patrick D. Kinney , Kang-Ho Ahn
发明人： Yuri S. Uritsky , Harry Q. Lee , Patrick D. Kinney , Kang-Ho Ahn
IPC分类号： G01R31/305 , G01R31/307 , G01B11/00
CPC分类号： G01R31/305 , G01R31/307
摘要： A method for reducing targeting errors encountered when trying to locate contaminant particles in a high-magnification imaging device, based on estimates of the particle positions obtained from a scanning device. The method of the invention uses three techniques separately and in combination. The first technique includes selecting at least three reference particles, to provide multiple unique pairs of reference particles for computation of an averaged set of coordinate transformation parameters, used to transform particle position coordinates from the coordinate system of the scanning device to the coordinate system of the imaging device. The averaged transformation parameters result in much smaller targeting errors between the estimated and actual positions of the particles. The targeting errors are further reduced by the use of multiple scans of the scanning device. In a third technique, accumulated reference particle targeting errors observed in prior processing of other wafers are used to reduce these targeting errors when processing a new wafer.
摘要翻译：基于从扫描装置获得的粒子位置的估计，减少在高倍率成像装置中定位污染物颗粒时遇到的瞄准误差的方法。本发明的方法分别使用三种技术组合。第一技术包括选择至少三个参考粒子，以提供用于计算平均坐标变换参数集合的多个独特的参考粒子对，用于将粒子位置坐标从扫描装置的坐标系转换为坐标系的坐标系成像装置。平均变换参数导致粒子的估计位置和实际位置之间的目标误差小得多。通过使用扫描设备的多次扫描，进一步减少了定位错误。在第三种技术中，在处理新晶片时，使用在其它晶片的先前处理中观察到的累积参考粒子瞄准误差来减少这些瞄准误差。

3. 发明授权

US5381004A Particle analysis of notched wafers 失效
标题翻译：缺口晶圆的粒子分析
公开(公告)号：US5381004A
公开(公告)日：1995-01-10
申请号：US115482
申请日：1993-08-31
申请人： Yuri S. Uritsky , Harry Q. Lee
发明人： Yuri S. Uritsky , Harry Q. Lee
IPC分类号： G01N15/00 , G01N15/10 , H01J37/256 , H01L21/66 , H01J37/26 , G01B11/00
CPC分类号： H01L22/20 , H01J37/256 , H01L22/12 , H01L2223/54453
摘要： A method for reducing targeting errors that arise when trying to locate contaminant particles on a notched semiconductor wafer using a high-magnification imaging device, based on estimates of wafer feature positions obtained from a scanning device. The present invention scans a notched semiconductor wafer with a scanning device to obtain scanning device coordinates for the positions of: (i) the wafer center; (ii) the wafer notch; and (iii) contaminant particles on the wafer. Next, the present invention finds the wafer notch and wafer center with an imaging device and obtains their estimated imaging device coordinates. Subsequently, the present invention calculates estimated transformation parameters for a coordinate transformation between the coordinate systems of the scanning device and the imaging device based on the scamping device coordinates and the estimated imaging device coordinates of the wafer notch and the wafer center. Finally, the present invention transforms the scanning device coordinates of the particles on the wafer to estimated imaging device coordinates using the estimated transformation parameters.
摘要翻译：一种用于减少基于从扫描装置获得的晶片特征位置的估计来尝试使用高倍率成像装置在缺口半导体晶片上定位污染物颗粒时产生的瞄准误差的方法。本发明用扫描装置扫描缺口半导体晶片，以得到以下位置的扫描装置坐标：（i）晶片中心; （ii）晶片切口; 和（iii）晶片上的污染物颗粒。接下来，本发明利用成像装置找到晶片切口和晶片中心，并获得其估计的成像装置坐标。随后，本发明基于扫描装置坐标和晶片切口和晶片中心的估计成像装置坐标来计算扫描装置的坐标系与成像装置之间的坐标变换的估计变换参数。最后，本发明使用估计的变换参数将晶片上的颗粒的扫描装置坐标转换为估计的成像装置坐标。

4. 发明授权

US5497007A Method for automatically establishing a wafer coordinate system 失效
标题翻译：自动建立晶圆坐标系的方法
公开(公告)号：US5497007A
公开(公告)日：1996-03-05
申请号：US379246
申请日：1995-01-27
申请人： Yuri S. Uritsky , Harry Q. Lee
发明人： Yuri S. Uritsky , Harry Q. Lee
IPC分类号： G01Q30/02 , H01J37/304 , G01B21/04
CPC分类号： H01J37/3045 , H01J2237/2442 , H01J2237/2594
摘要： An automated method for establishing a wafer coordinate system for a wafer characterization system. Specifically, under computer control, a high-magnification imaging system images a wafer at a low, initial magnification level. From this imaging process, the method first determines the location of the center of the semiconductor wafer mounted within the imaging system and then determines the wafer orientation therein. The method then repeats the imaging process at increased magnification levels until a desired degree of magnification is used to accurately define the location of the wafer center and the wafer orientation. Together the wafer center and orientation define a wafer coordinate system. This wafer coordinate system is then related to the coordinate system of the imaging system by a coordinate system transformation. As such, once the coordinate systems are related, the imaging system can quickly and accurately determine any point on a wafer. The method uses various wafer edge locations to determine the wafer center location and wafer orientation. These edge locations are determined by either: (1) using a scanning electron microscope in conjunction with an image processing technique, or (2) using an energy dispersive x-ray detector to detect changes in the SiK.sub..alpha. line intensity.
摘要翻译：一种用于建立晶片表征系统的晶片坐标系的自动化方法。具体地说，在计算机控制下，高倍率成像系统以低的初始放大级别对晶片进行成像。从该成像过程中，该方法首先确定安装在成像系统内的半导体晶片的中心的位置，然后确定其中的晶片取向。该方法然后以增加的放大级别重复成像过程，直到使用期望的放大倍率来精确地限定晶片中心和晶片取向的位置。晶片中心和方向一起定义晶片坐标系。然后，该晶片坐标系通过坐标系变换与成像系统的坐标系相关。因此，一旦坐标系相关，成像系统可以快速准确地确定晶片上的任何点。该方法使用各种晶片边缘位置来确定晶片中心位置和晶片取向。这些边缘位置可以通过以下方式确定：（1）使用扫描电子显微镜结合图像处理技术，或者（2）使用能量色散X射线检测器来检测SiKα线强度的变化。

5. 发明授权

US08755928B2 Automatic selection of reference spectra library 有权
标题翻译：自动选择参考光谱库
公开(公告)号：US08755928B2
公开(公告)日：2014-06-17
申请号：US13095802
申请日：2011-04-27
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
IPC分类号： G06F19/24
CPC分类号： B24B37/013 , B24B37/042 , B24B49/05 , B24B49/12 , G01J3/28
摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个最佳匹配多个序列的剩余序列，并存储确定为提供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

6. 发明授权

US08666665B2 Automatic initiation of reference spectra library generation for optical monitoring 有权
标题翻译：用于光学监测的自动启动参考光谱库生成
公开(公告)号：US08666665B2
公开(公告)日：2014-03-04
申请号：US13088144
申请日：2011-04-15
申请人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
发明人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
IPC分类号： G06F19/00 , H01L21/00
CPC分类号： G01J3/46 , B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.
摘要翻译：产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。

7. 发明授权

US08292693B2 Using optical metrology for wafer to wafer feed back process control 有权
标题翻译：使用光学测量技术进行晶圆反馈过程控制
公开(公告)号：US08292693B2
公开(公告)日：2012-10-23
申请号：US12625480
申请日：2009-11-24
申请人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
发明人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
IPC分类号： B24B49/00 , B24B51/00 , B24B1/00 , C23F1/00 , H01L21/306 , H01L21/302 , H01L21/461 , G01N21/55 , G01B11/06 , G06F19/00
CPC分类号： B24B37/013 , B24B49/12 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling the polishing of a substrate includes polishing a substrate on a first platen using a first set of parameters, obtaining first and second sequences of measured spectra from first and second regions of the substrate with an in-situ optical monitoring system, generating first and second sequences of values from the first and second sequences of measured spectra, fitting first and second linear functions to the first and second sequences of values, determining a difference between the first linear function and the second linear function, adjusting at least one parameter of the first set of parameters based on the difference, and polishing the second substrate on the first platen using the adjusted parameter.
摘要翻译：控制衬底抛光的方法包括使用第一组参数在第一压板上抛光衬底，用原位光学监测系统从衬底的第一和第二区域获得测量光谱的第一和第二序列，产生来自第一和第二测量光谱序列的第一和第二序列值，将第一和第二线性函数拟合到第一和第二序列序列，确定第一线性函数和第二线性函数之间的差异，调整至少一个参数基于所述差异的所述第一组参数，并且使用所述调整参数来研磨所述第一台板上的所述第二基板。

8. 发明申请

US20120028813A1 Selecting Reference Libraries For Monitoring Of Multiple Zones On A Substrate 有权
标题翻译：选择用于监视基板上多个区域的参考库
公开(公告)号：US20120028813A1
公开(公告)日：2012-02-02
申请号：US12847721
申请日：2010-07-30
申请人： Jun Qian , Boguslaw A. Swedek , Harry Q. Lee , Jeffrey Drue David , Sivakumar Dhandapani , Thomas H. Osterheld
发明人： Jun Qian , Boguslaw A. Swedek , Harry Q. Lee , Jeffrey Drue David , Sivakumar Dhandapani , Thomas H. Osterheld
IPC分类号： C40B20/00
CPC分类号： G05B23/0208 , G05B2219/31459 , G05B2219/45232
摘要： A method of configuring a polishing monitoring system includes receiving user input selecting a plurality of libraries, each library of the plurality of libraries comprising a plurality of reference spectra for use in matching to measured spectra during polishing, each reference spectrum of the plurality of reference spectra having an associated index value, for a first zone of a substrate, receiving user input selecting a first subset of the plurality of libraries, and for a second zone of the substrate, receiving user input selecting a second subset of the plurality of libraries.
摘要翻译：配置抛光监视系统的方法包括接收选择多个库的用户输入，多个库的每个库包括多个参考光谱，用于与抛光期间的测量光谱匹配，多个参考光谱的每个参考光谱具有相关联的索引值，对于衬底的第一区域，接收选择所述多个库的第一子集的用户输入以及所述衬底的第二区域，接收选择所述多个库的第二子集的用户输入。

9. 发明申请

US20110301847A1 Automatic Initiation Of Reference Spectra Library Generation For Optical Monitoring 有权
标题翻译：自动启动参考光谱库生成用于光学监测
公开(公告)号：US20110301847A1
公开(公告)日：2011-12-08
申请号：US13088144
申请日：2011-04-15
申请人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
发明人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
IPC分类号： G06F19/00
CPC分类号： G01J3/46 , B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.
摘要翻译：产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。

10. 发明申请

US20110282477A1 ENDPOINT CONTROL OF MULTIPLE SUBSTRATES WITH MULTIPLE ZONES ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：在化学机械抛光中在同一板上具有多个区域的多个基板的端点控制
公开(公告)号：US20110282477A1
公开(公告)日：2011-11-17
申请号：US12781654
申请日：2010-05-17
申请人： Harry Q. Lee , Jimin Zhang , Jeffrey Drue David , Boguslaw A. Swedek
发明人： Harry Q. Lee , Jimin Zhang , Jeffrey Drue David , Boguslaw A. Swedek
IPC分类号： G06F19/00
CPC分类号： B24B37/013 , B24B37/042
摘要： A plurality of substrates are polished simultaneously on the same polishing pad. A sequence of spectra is measured from each zone of each substrate, and for each measured spectrum in the sequence of spectra for each zone of each substrate, a best matching reference spectrum is determined from a library of reference spectra. For each zone of each substrate, a linear function is fit to a sequence of index values associated with the best matching reference spectra. For at least one zone, a projected time at which the zone will reach a target index value is determined based on the linear function, and the polishing parameter for at least one zone on at least one substrate is adjusted such that the at least one zone of the at least one substrate has closer to the target index at the projected time than without such adjustment.
摘要翻译：多个基板在同一抛光垫上同时被抛光。从每个底物的每个区域测量光谱序列，并且对于每个底物的每个区域的光谱序列中的每个测量的光谱，从参考光谱库确定最佳匹配的参考光谱。对于每个衬底的每个区域，线性函数适合于与最佳匹配参考光谱相关联的索引值序列。对于至少一个区域，基于线性函数确定区域将达到目标指标值的预计时间，并且调整至少一个基底上的至少一个区域的抛光参数，使得至少一个区域的至少一个基板在投影时间比没有这种调整更接近于目标指标。

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