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1. 发明申请

US20080297758A1 Lithographic support structure 审中-公开
标题翻译：光刻支撑结构
公开(公告)号：US20080297758A1
公开(公告)日：2008-12-04
申请号：US12213930
申请日：2008-06-26
申请人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Van Meer , Patrick Johannes Cornelus Smulders , Franciscus Andreas Cornelis Spanjers , Johannes Petrus Martinus Ber Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Van Meer , Patrick Johannes Cornelus Smulders , Franciscus Andreas Cornelis Spanjers , Johannes Petrus Martinus Ber Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.
摘要翻译：本发明涉及一种用于传送物体（W）的传送装置。传送装置包括用于在第一位置处夹持物体（W）的至少一个然后在靠近接收器（20）的第二位置处释放物体（W）的至少一个并且释放物体（W）的夹持器（15）在靠近接收器（20）的第二位置处夹持物体之后的第一位置。传送装置还设置有测量装置（22），该测量装置设置成在至少一个维度上测量夹具（15）相对于接收器（20）的相对位置。此外，基于测量的相对位置，相对于期望的相对位置来定义相对位置误差。调整夹持器（15）和接收器（20）的相对位置以最小化第二位置中的相对位置误差。

2. 发明授权

US07486384B2 Lithographic support structure 有权
标题翻译：光刻支撑结构
公开(公告)号：US07486384B2
公开(公告)日：2009-02-03
申请号：US10813687
申请日：2004-03-31
申请人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
摘要翻译：本发明涉及具有支撑结构以支撑和移动物体（如基底）的光刻投影装置。支撑结构可以是具有机器人臂的机器人，其具有支撑框架的支撑框架，例如。底物。支撑框架包括具有用于在移动期间保持基板的一个或多个夹具的夹持结构。机器人手臂包括一个或多个柔顺部件。夹具可以是具有氧化的上表面的Johnson-Raybeck效应型夹具。为了更好地去夹紧，可以向夹具提供RF AC衰减的去钳位电压。该装置可以仅用一个单一的衬底清洁。

3. 发明申请

US20080258365A1 Vibration Damper for Isolator 审中-公开
标题翻译：隔振器振动阻尼器
公开(公告)号：US20080258365A1
公开(公告)日：2008-10-23
申请号：US11568989
申请日：2005-05-09
申请人： Henricus Johannes Adrianus Van De Sande , Hubert Gerard Jean Joseph Amaury Vroomen
发明人： Henricus Johannes Adrianus Van De Sande , Hubert Gerard Jean Joseph Amaury Vroomen
IPC分类号： G03F7/20 , F16F15/00
CPC分类号： G03F7/709 , F16F15/0232 , F16F2230/105 , G03F7/70808 , G03F7/70833
摘要： A system for use in for example the production of semiconductors comprises a chamber (10) having a sealed inner space (11), such as a vacuum chamber. A heavy mass (14), such as a table, is arranged within the vacuum chamber and is supported or carried by one or more vibration dampers or isolators (15). Each vibration isolator comprises a hollow or tubular member (18) having an open inner end portion, which extends into the sealed space of the chamber (10). A support structure (21) is arranged at the inner end of the hollow member for supporting the mass or table (14). The opposite ends of a bellows (24) are sealingly connected to the hollow member (18) and the support structure (21), respectively, so as to seal the inner space (26) of the hollow member (18) from the inner space (11) of the chamber (10). A surface part of the support structure is exposed to a to a gas pressure different from that of the sealed inner space of the chamber, so as to at least partly balance the weight of the support structure (21) and the mass or payload (14) supported thereby.
摘要翻译：用于例如半导体生产的系统包括具有密封的内部空间（11）的室（10），例如真空室。重物（14），如桌子，布置在真空室内，由一个或多个减震器或隔离器（15）支撑或承载。每个隔振器包括中空或管状构件（18），其具有延伸到腔室（10）的密封空间中的敞开的内端部分。支撑结构（21）布置在中空构件的内端，用于支撑物料或台（14）。波纹管（24）的相对端分别密封地连接到中空构件（18）和支撑结构（21），以将中空构件（18）的内部空间（26）与内部空间（10）的（11）。支撑结构的表面部分暴露于与腔室的密封内部空间不同的气体压力，以至少部分地平衡支撑结构（21）和质量或有效载荷（14）的重量）。

4. 发明授权

US08377321B2 Method of forming a nozzle and an ink chamber of an ink jet device by etching a single crystal substrate 有权
标题翻译：通过蚀刻单晶基板形成喷墨装置的喷嘴和墨室的方法
公开(公告)号：US08377321B2
公开(公告)日：2013-02-19
申请号：US12959130
申请日：2010-12-02
申请人： Henricus Johannes Adrianus Van De Sande , Willem Maurits Hijmans , Gerardus Johannes Burger , Dionysius Antionius Petrus Oudejans
发明人： Henricus Johannes Adrianus Van De Sande , Willem Maurits Hijmans , Gerardus Johannes Burger , Dionysius Antionius Petrus Oudejans
IPC分类号： B44C1/22 , C03C15/00 , C23F1/00
CPC分类号： B41J2/1646 , B41J2/161 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1635 , B41J2/1642
摘要： A method of forming a nozzle and an ink chamber of an ink jet device, includes forming a nozzle passage by subjecting a substrate to a directional first etch process from one side of the substrate; applying a second etch process from the same side of the substrate for widening an internal part of the nozzle passage, to form a cavity forming at least a portion of the ink chamber adjacent to the nozzle; and controlling the shape of the cavity by providing, on the opposite side of the substrate, an etch accelerating layer buried under an etch stop layer and by allowing the second etch process to proceed into the etch accelerating layer. The following steps precede the first etch process: forming an annular trench in the substrate on the side of the substrate where the nozzle is to be formed; and passivating the walls of the trench so as to become resistant against the second etch process. The material surrounded by the trench is removed in the first etch process.
摘要翻译：形成喷墨装置的喷嘴和墨水室的方法包括：通过使基板从基板的一侧经受定向第一蚀刻工艺来形成喷嘴通道; 从基板的同一侧施加第二蚀刻工艺，以加宽喷嘴通道的内部部分，以形成形成与喷嘴相邻的墨室的至少一部分的空腔; 以及通过在衬底的相对侧上提供掩埋在蚀刻停止层下方的蚀刻加速层，并且允许第二蚀刻工艺进入蚀刻加速层来控制空腔的形状。在第一蚀刻工艺之前的以下步骤：在要在其上形成喷嘴的基板侧上的基板中形成环形沟槽; 并且钝化沟槽的壁以便抵抗第二蚀刻工艺。在第一蚀刻工艺中去除由沟槽包围的材料。

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