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1. 发明授权

US5514850A Defect compensation method for smoothing a surface of a transparent plate with an ArF excimer laser beam 失效
标题翻译：用ArF准分子激光束平滑透明板表面的缺陷补偿方法
公开(公告)号：US5514850A
公开(公告)日：1996-05-07
申请号：US64275
申请日：1993-05-19
申请人： Osamu Miyazaki , Kazuya Yoshimura , Syunji Nakai
发明人： Osamu Miyazaki , Kazuya Yoshimura , Syunji Nakai
IPC分类号： B23K26/06 , B23K26/40 , B29C35/08 , B29C59/16 , C03B29/00 , B23K26/00
CPC分类号： C03B29/00 , B23K26/066 , B23K26/402 , B29C59/16 , B23K2203/42 , B29C2035/0838 , B29K2995/0026 , Y02P40/57
摘要： A defect compensation method for smoothing a surface of a transparent plate by radiating an ArF excimer laser beam to a defect at the surface. The ArF excimer laser beam is radiated by use of a mask having an opening which is shaped in accordance with the shape of the defect, through a lens, or while the size of the beam at the defect is changed to a plurality of values. As the mask, an iris mask having an opening which is larger than the defect is usable. The size of the beam is changed by exchanging, a plurality of masks each having an opening of a different size from one another, or by use of a mask having a plurality of openings of different sizes. Alternatively, the ArF excimer laser beam is radiated so as to have an energy which is high at a center and low at a periphery of the defect. Or, the ArF excimer laser beam has a smaller size than the size of the defect, and the transparent plate having the defect is moved so as to allow different portions of the defect to be irradiated sequentially by the ArF excimer laser beam and simultaneously the number of shots of the ArF excimer laser beam is changed.
摘要翻译：一种用于通过将ArF准分子激光束照射到表面的缺陷来使透明板的表面平滑的缺陷补偿方法。通过使用具有根据缺陷的形状成形的开口的掩模，通过透镜，或者在缺陷处的光束的尺寸变为多个值的同时辐射ArF准分子激光束。作为掩模，可以使用具有大于缺陷的开口的虹膜掩模。通过交换具有彼此不同大小的开口的多个掩模，或者通过使用具有多个不同尺寸的开口的掩模来改变光束的尺寸。或者，ArF准分子激光束被辐射，以具有在缺陷的中心处为高的能量，在缺陷的周围为低的能量。或者，ArF准分子激光束的尺寸比缺陷的尺寸小，并且具有缺陷的透明板被移动，以使缺陷的不同部分被ArF准分子激光束依次照射，同时数量 ArF准分子激光束的射击发生变化。

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