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1. 发明授权

US08253930B2 Absorption spectrometric apparatus for semiconductor production process 失效
标题翻译：用于半导体生产过程的吸收光谱仪
公开(公告)号：US08253930B2
公开(公告)日：2012-08-28
申请号：US12707418
申请日：2010-02-17
申请人： Osamu Akiyama , Masashi Akimoto , Tsuyoshi Moriya , Jun Yamawaku
发明人： Osamu Akiyama , Masashi Akimoto , Tsuyoshi Moriya , Jun Yamawaku
IPC分类号： G01N21/00
CPC分类号： G01N21/3554 , G01N21/031 , G01N21/05 , G01N21/3504 , G01N21/9501 , H01L21/67253
摘要： This absorption spectrometric apparatus for semiconductor production process includes a flow passageway switching mechanism connected to a discharging flow passageway of a processing chamber for a semiconductor production process and a multiple reflection type moisture concentration measuring absorption spectrometric analyzer that allows a laser beam from a laser light source to undergo multiple reflection within a cell, detects a light absorbancy change by a gas within the cell, and measures a moisture concentration within the gas. The flow passageway switching mechanism connects the discharging flow passageway by switching between a measuring flow passageway through which the gas is discharged by passing through the cell and a bypass flow passageway through which the gas is discharged without passing through the cell.
摘要翻译：该半导体制造用吸收光谱测定装置包括与半导体制造工序的处理室的排出流路连接的流路切换机构以及多反射型水分浓度测定用吸收光谱分析装置，该分析装置允许来自激光光源在电池内进行多次反射，通过电池内的气体检测光吸收变化，并测量气体内的水分浓度。流动通道切换机构通过在通过电池的排出气体的测量流动通道和通过气体而不通过电池的旁路流动通道之间切换来连接排出流动通道。

2. 发明申请

US20100214557A1 ABSORPTION SPECTROMETRIC APPARATUS FOR SEMICONDUCTOR PRODUCTION PROCESS 失效
标题翻译：用于半导体生产工艺的吸收光谱仪器
公开(公告)号：US20100214557A1
公开(公告)日：2010-08-26
申请号：US12707418
申请日：2010-02-17
申请人： Osamu Akiyama , Masashi Akimoto , Tsuyoshi Moriya , Jun Yamawaku
发明人： Osamu Akiyama , Masashi Akimoto , Tsuyoshi Moriya , Jun Yamawaku
IPC分类号： G01N21/17
CPC分类号： G01N21/3554 , G01N21/031 , G01N21/05 , G01N21/3504 , G01N21/9501 , H01L21/67253
摘要： This absorption spectrometric apparatus for semiconductor production process includes a flow passageway switching mechanism connected to a discharging flow passageway of a processing chamber for a semiconductor production process and a multiple reflection type moisture concentration measuring absorption spectrometric analyzer that allows a laser beam from a laser light source to undergo multiple reflection within a cell, detects a light absorbancy change by a gas within the cell, and measures a moisture concentration within the gas. The flow passageway switching mechanism connects the discharging flow passageway by switching between a measuring flow passageway through which the gas is discharged by passing through the cell and a bypass flow passageway through which the gas is discharged without passing through the cell.
摘要翻译：该半导体制造用吸收光谱测定装置包括与半导体制造工序的处理室的排出流路连接的流路切换机构以及多反射型水分浓度测定用吸收光谱分析装置，该分析装置允许来自激光光源在电池内进行多次反射，通过电池内的气体检测光吸收变化，并测量气体内的水分浓度。流动通道切换机构通过在通过电池的排出气体的测量流动通道和通过气体而不通过电池的旁路流动通道之间切换来连接排出流动通道。

3. 发明授权

US08384902B2 Optical gas-analysis system and a gas flow cell 有权
标题翻译：光学气体分析系统和气体流通池
公开(公告)号：US08384902B2
公开(公告)日：2013-02-26
申请号：US12724034
申请日：2010-03-15
申请人： Osamu Akiyama , Tsuyoshi Moriya , Jun Yamawaku
发明人： Osamu Akiyama , Tsuyoshi Moriya , Jun Yamawaku
IPC分类号： G01N21/00
CPC分类号： G01N21/05 , G01N21/031 , G01N21/09 , G01N21/15 , G01N2021/8578
摘要： A gas flow cell for an optical gas-analysis system, including a cylindrical cell body; and a single sample-gas introduction port configured to introduce sample-gas. The single sample-gas introduction port is provided at a location at a substantial center of the cell body with respect to a long axis direction of the cell body, and the single sample-gas introduction port is aligned along a direction orthogonal to the long axis direction so that the cylindrical cell body and the single sample-gas introduction port together form a shape of a character T.
摘要翻译：一种用于光学气体分析系统的气体流通池，包括圆柱形电池体; 以及构成为引入取样气体的单个取样气体导入口。单个样品气体导入口相对于电池体的长轴方向设置在电池体的大致中央的位置，单个取样气体导入口沿着与长轴方向正交的方向方向，使得圆柱形电池体和单个样品气体导入口一起形成字符T的形状。

4. 发明申请

US20100018552A1 CLEANING DEVICE AND CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS 有权
标题翻译：清洁装置和清洁方法的半导体制造装置
公开(公告)号：US20100018552A1
公开(公告)日：2010-01-28
申请号：US12510314
申请日：2009-07-28
申请人： Takayuki Kokubo , Jun Yamawaku , Tsuyoshi Moriya
发明人： Takayuki Kokubo , Jun Yamawaku , Tsuyoshi Moriya
IPC分类号： B08B3/10 , B08B13/00
CPC分类号： B08B3/10 , B08B13/00 , B08B2230/01
摘要： Provided are a cleaning device and a cleaning method of a semiconductor manufacturing apparatus, capable of performing a cleaning process more effectively as compared to conventional cases and obtaining a high cleaning effect. A semiconductor manufacturing apparatus cleaning device 100 includes a pure water steam generating vessel 2 for generating pure water steam from pure water; a supply port 5 for supplying the pure water steam to a cleaning target portion; a supply line 4 for connecting the pure water steam generating vessel with the supply port; a collection port 6 for collecting steam used in cleaning from the cleaning target portion; a collection vessel 8 for condensing and collecting the used steam; and a collection line 7 for connecting the collection port 6 with the collection vessel 8.
摘要翻译：提供了一种半导体制造装置的清洁装置和清洁方法，与常规情况相比，能够更有效地进行清洁处理并获得高清洁效果。半导体制造装置清洁装置100包括用于从纯水产生纯水蒸汽的纯水蒸汽发生容器2，用于将纯水蒸汽供应到清洁目标部分的供应口5; 用于将纯水蒸汽发生容器与供给口连接的供应管线4; 用于从清洁目标部分收集用于清洁的蒸汽的收集口6; 用于冷凝和收集用过的蒸汽的收集容器8; 以及用于将收集口6与收集容器8连接的收集线7。

5. 发明授权

US08257498B2 Substrate transfer module and substrate processing system 有权
标题翻译：基板转移模块和基板处理系统
公开(公告)号：US08257498B2
公开(公告)日：2012-09-04
申请号：US12180028
申请日：2008-07-25
申请人： Jun Yamawaku , Tsuyoshi Moriya
发明人： Jun Yamawaku , Tsuyoshi Moriya
IPC分类号： H01L21/67
CPC分类号： H01L21/67766 , H01L21/67778 , H01L21/67781
摘要： A substrate transfer module that can prevent corrosion of components, adhesion of particles to the substrate, and increases in the manufacturing cost and the size of the substrate transfer module. A substrate transfer module is connected to a substrate processing module. The substrate processing module implements desired processing on a substrate. A substrate transfer device transfers a substrate and includes a holding unit and a moving unit. The holding unit holds the substrate, and the moving unit moves the holding unit. A transfer chamber houses the substrate transfer device in an interior thereof that is isolated from an external atmosphere. An isolation device isolates at least the holding unit and the substrate held by the holding unit from an interior atmosphere of the transfer chamber.
摘要翻译：可以防止组分腐蚀，颗粒粘附到基底上的衬底转移模块，以及衬底转移模块的制造成本和尺寸的增加。衬底转移模块连接到衬底处理模块。衬底处理模块在衬底上实现所需的处理。衬底传送装置传送衬底并且包括保持单元和移动单元。保持单元保持基板，移动单元移动保持单元。传送室在其内部容纳与外部气氛隔离的衬底传送装置。隔离装置至少将保持单元和由保持单元保持的基板与传送室的内部空气隔离。

6. 发明授权

US08845853B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US08845853B2
公开(公告)日：2014-09-30
申请号：US12042661
申请日：2008-03-05
申请人： Jun Yamawaku , Tsuyoshi Moriya
发明人： Jun Yamawaku , Tsuyoshi Moriya
IPC分类号： C23C16/50 , C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32 , H01L21/67 , H01L21/683
CPC分类号： H01L21/6831 , H01J37/3244 , H01J37/32642 , H01L21/67069 , H01L21/67109
摘要： A substrate processing apparatus that can improve the uniformity of plasma processing carried out on a wafer. The wafer is housed in a chamber of the substrate processing apparatus and subjected to plasma processing using plasma produced in the processing chamber. A temperature control mechanism jets a high-temperature gas toward at least part of an annular focus ring facing the plasma.
摘要翻译：一种能够提高在晶片上进行的等离子体处理的均匀性的基板处理装置。将晶片容纳在基板处理装置的室中，并使用在处理室中产生的等离子体处理等离子体处理。温度控制机构朝着面向等离子体的环形聚焦环的至少一部分喷射高温气体。

7. 发明授权

US08585831B2 Substrate cleaning method 失效
标题翻译：基材清洗方法
公开(公告)号：US08585831B2
公开(公告)日：2013-11-19
申请号：US13255723
申请日：2010-03-10
申请人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
发明人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
IPC分类号： B08B3/00
CPC分类号： H01L21/02101 , H01L21/02071 , H01L21/67051 , H01L21/67109
摘要： There is provided a substrate cleaning method capable of cleaning a substrate on which a fine pattern is being formed in a short time with a simple configuration without having a harmful influence on the fine pattern. In the method, the substrate is transferred from a processing chamber for performing a process on the surface of the substrate therein to a cleaning chamber for cleaning the substrate therein. The substrate is cooled to a temperature in the cleaning chamber. A superfluid is supplied to the surface of the substrate, and contaminant components in the fine pattern are flowed out along with the superfluid as the superfluid flows over from the surface of the substrate.
摘要翻译：提供一种基板清洗方法，其能够以简单的构造在短时间内清洁其上形成微细图案的基板，而不会对微细图案产生有害影响。在该方法中，将基板从用于在基板表面上进行处理的处理室转移到用于清洁基板的清洁室。将基板冷却至清洁室内的温度。将超流体供给到基板的表面，并且当超流体从基板的表面流过时，精细图案中的污染物成分与超流体一起流出。

8. 发明申请

US20080301972A1 EVACUATION METHOD AND STORAGE MEDIUM 有权
标题翻译：排放方法和储存介质
公开(公告)号：US20080301972A1
公开(公告)日：2008-12-11
申请号：US12134604
申请日：2008-06-06
申请人： Jun Yamawaku , Tsuyoshi Moriya , Hideaki Yakushiji , Kazumasa Abe
发明人： Jun Yamawaku , Tsuyoshi Moriya , Hideaki Yakushiji , Kazumasa Abe
IPC分类号： F26B5/04
CPC分类号： H01J37/3244 , H01J37/32449
摘要： An evacuation method which can reduce evacuation time without causing moisture-related problems. In a vacuum processing apparatus including a vacuum processing chamber, during the evacuation for the vacuum processing chamber, the pressure in the vacuum processing chamber is maintained at a pressure lower than or equal to the atmospheric pressure but higher than or equal to 6.7×102 Pa (5 Torr).
摘要翻译：可以减少疏散时间而不引起与潮湿有关的问题的疏散方法。在包括真空处理室的真空处理设备中，在真空处理室抽真空期间，真空处理室中的压力保持在低于或等于大气压力但高于或等于6.7×102Pa（ 5托）。

9. 发明授权

US08297292B2 Cleaning device and cleaning method of semiconductor manufacturing apparatus 有权
标题翻译：半导体制造装置的清洗装置及清洗方法
公开(公告)号：US08297292B2
公开(公告)日：2012-10-30
申请号：US12510314
申请日：2009-07-28
申请人： Takayuki Kokubo , Jun Yamawaku , Tsuyoshi Moriya
发明人： Takayuki Kokubo , Jun Yamawaku , Tsuyoshi Moriya
IPC分类号： B08B3/04
CPC分类号： B08B3/10 , B08B13/00 , B08B2230/01
摘要： Provided are a cleaning device and a cleaning method of a semiconductor manufacturing apparatus, capable of performing a cleaning process more effectively as compared to conventional cases and obtaining a high cleaning effect. A semiconductor manufacturing apparatus cleaning device 100 includes a pure water steam generating vessel 2 for generating pure water steam from pure water; a supply port 5 for supplying the pure water steam to a cleaning target portion; a supply line 4 for connecting the pure water steam generating vessel with the supply port; a collection port 6 for collecting steam used in cleaning from the cleaning target portion; a collection vessel 8 for condensing and collecting the used steam; and a collection line 7 for connecting the collection port 6 with the collection vessel 8.
摘要翻译：提供了一种半导体制造装置的清洁装置和清洁方法，与常规情况相比，能够更有效地进行清洁处理并获得高清洁效果。半导体制造装置清洁装置100包括用于从纯水产生纯水蒸汽的纯水蒸汽发生容器2，用于将纯水蒸汽供应到清洁目标部分的供应口5; 用于将纯水蒸汽发生容器与供给口连接的供应管线4; 用于从清洁目标部分收集用于清洁的蒸汽的收集口6; 用于冷凝和收集用过的蒸汽的收集容器8; 以及用于将收集口6与收集容器8连接的收集线7。

10. 发明授权

US08516715B2 Evacuation method and storage medium 有权
标题翻译：疏散方法和储存介质
公开(公告)号：US08516715B2
公开(公告)日：2013-08-27
申请号：US12134604
申请日：2008-06-06
申请人： Jun Yamawaku , Tsuyoshi Moriya , Hideaki Yakushiji , Kazumasa Abe
发明人： Jun Yamawaku , Tsuyoshi Moriya , Hideaki Yakushiji , Kazumasa Abe
IPC分类号： F26B5/04
CPC分类号： H01J37/3244 , H01J37/32449
摘要： An evacuation method which can reduce evacuation time without causing moisture-related problems. In a vacuum processing apparatus including a vacuum processing chamber, during the evacuation for the vacuum processing chamber, the pressure in the vacuum processing chamber is maintained at a pressure lower than or equal to the atmospheric pressure but higher than or equal to 6.7×102 Pa (5 Torr).
摘要翻译：可以减少疏散时间而不引起与潮湿有关的问题的疏散方法。在包括真空处理室的真空处理设备中，在真空处理室抽真空期间，真空处理室中的压力保持在低于或等于大气压力但高于或等于6.7×102Pa （5乇）。

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