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1. 发明公开

EP0032716A3 Illumination system for semiconductive wafers 失效
标题翻译：半导体照明系统
公开(公告)号：EP0032716A3
公开(公告)日：1982-09-01
申请号：EP81100206
申请日：1981-01-14
申请人： Optimetrix Corporation
发明人： Phillips, Edward H.
IPC分类号： G02B19/00 , G03B41/00
CPC分类号： G03F7/70058 , G02B19/0014 , G02B19/0047
摘要： A projection lens (18) is disposed directly above a vacuum chuck (131) for projecting an image of an illuminated portion of a semiconductive wafer (14) held thereby to an image plane (79) where that image may be viewed through a pair objective lenses (88) of a compound microscope (22). Microcircuitry contained on a reticle (12) held by a holder (17) positioned above the projection lens (18) is photometrically printed onto the semiconductive wafer (14) by passing exposure light through the reticle (12) and the projection lens (18) to the semiconductive wafer (14). At least one fiber optic source (140; 156) of illuminating light and one or more optical lenses (142, 144; 152; 158, 160) are employed for projecting an image of the fiber optic light source (140; 156) through the objective lens (88) to an entrance pupil of the projection lens (18) without passing through the reticle (12) to provide uniform illumination of the semiconductive wafer (14) and facilitate direct wafer alignment prior to photometrically printing on the semiconductive wafer (14).

2. 发明公开

EP0017759A3 Improved step-and-repeat projection alignment and exposure system 失效
标题翻译：改进的步进和重复投影对准和曝光系统
公开(公告)号：EP0017759A3
公开(公告)日：1981-01-14
申请号：EP80101307
申请日：1980-03-13
申请人： Optimetrix Corporation
发明人： Phillips, Edward H. , Johannsmeier, Karl-Heinz
IPC分类号： G03B41/00
CPC分类号： G03F9/70
摘要： Photometric printing apparatus comprising:
a holder for holding a first object; a holder for holding a second object; a light source unit disposed for selectively illuminating different portions of the first object; a projection lens, disposed between the holder and the stage, for projecting an image of an illuminated portion of the first object onto the second object; and control means for moving the stage to print the image of the illuminated portion of the first object at different regions of the second object.

3. 发明公开

EP0097380A3 A system for positioning a utilization device 失效
标题翻译：一种用于定位利用装置的系统
公开(公告)号：EP0097380A3
公开(公告)日：1984-08-29
申请号：EP83106381
申请日：1980-03-13
申请人： Optimetrix Corporation
发明人： Phillips, Edward H.
IPC分类号： G03B41/00 , G05D03/00
CPC分类号： G03F7/707 , G03F7/70241 , G03F9/70
摘要： A system for positioning a utilization device (33, 105), which forms part of an optical imaging system, parallel to a selected plane (X-Y), comprises a base structure (101), a plurality of spaced drive means (237-255) for supporting the utilization device (33, 105) for translational movement along a first axis (Z) normal to a plane (X-Y) of the base structure (101) and for rotational movement about second and third axes (X, Y) orthogonal to the first axis (Z) and parallel to said plane (X-Y) of the base structure (101); and constraining means (283, 297, 299), including the drive means (237-255), for kinematically constraining the utilization device (33, 105) to move only along the first axis (Z) and about the second and third axes (X, Y). The system may be applied for instance to position the small plane of a projection lens of said optical imaging system to achieve precise focusing of the surface of a simiconductive wafer.

4. 发明公开

EP0095088A3 Servo-control circuit 失效
标题翻译：伺服控制电路
公开(公告)号：EP0095088A3
公开(公告)日：1984-11-07
申请号：EP83104599
申请日：1980-09-26
申请人： Optimetrix Corporation
发明人： Phillips, Edward H. , Wise, Lawrence A.
IPC分类号： G05B19/35 , G05B19/39 , G03B09/58
CPC分类号： G03F7/70558 , G03B9/10 , G03B9/58
摘要： A drive unit (54) for unidirectionally rotating a shutter (48) with the same velocity profile to open and close the shutter aperture during each exposure period is controlled by a servo-control circuit. The servo-control circuit includes a feedback control loop (91) configurable for either position or velocity control of the shutter (48) as determined by a control command.

5. 发明公开

EP0103188A3 Improved shock and vibration isolation system 失效
标题翻译：改进的震动和振动隔离系统
公开(公告)号：EP0103188A3
公开(公告)日：1984-07-25
申请号：EP83108003
申请日：1980-09-26
申请人： Optimetrix Corporation
发明人： Phillips, Edward H. , Wise, Lawrence A.
IPC分类号： F16F15/04 , G12B05/00 , F16M07/00 , G03B41/00
CPC分类号： G03F7/70691 , F16F15/0275 , F16M7/00 , G03F7/709 , G12B5/00
摘要： A shock and vibration isolation system having a plurality of isolators supporting a utilization device is disclosed. Each isolator has two gas driven pistons, pivotally mounted in a frame and is connected to an accumulator/controller that supplies controlled amounts of pressurized gas. A sensor in each isolator senses the position of the utilization device with respect to a base sitting on the ground, and the accumulator/controller adds gas to or exhausts gas from the pistons to counteract changes in position detected by the sensor. An electric control circuit is connected between the sensor and the accumulator/controller to supply a properly compensated signal from the sensor to control the accumulator/controller.

6. 发明公开

EP0111660A3 Photometric printing apparatus 失效
标题翻译：光学印刷设备
公开(公告)号：EP0111660A3
公开(公告)日：1984-10-03
申请号：EP83110141
申请日：1980-03-13
申请人： Optimetrix Corporation
发明人： Phillips, Edward H. , Johannsmeier, Karl-Heinz
IPC分类号： G03B41/00
CPC分类号： G03F9/70
摘要： A photometric printing apparatus including a holder (16) for holding a first object (12) in a first plane; a stage (20) for holding a second object (14) in a second plane (77); a light source unit (24), optically disposed on one side of the holder (16), for illuminating the first object (12); a projection lens (18), optically disposed on the other side of the holder (16) and between the holder (16) and the stage (20) for projecting an image of illuminated portions of the first object (12) onto the second object (14); and control means (25, 27), for moving the stage (20) relatively to said holder to facilitate printing of an image of an illuminated portion (160) of the first object (12) at different regions (162) of the second object (14) comprises additionally viewing means (21,90,93) optically disposed between the projection lens (18) and the holder (16), for providing a viewing port to permit viewing of an aerial image of a portion (170) of the second object (14) illuminated by an image of another illuminated portion (172) of the first object (12).

7. 发明公开

EP0017044A3 Optical focusing system 失效
标题翻译：光学聚焦系统
公开(公告)号：EP0017044A3
公开(公告)日：1980-12-10
申请号：EP80101308
申请日：1980-03-13
申请人： Optimetrix Corporation
发明人： Phillips, Edward H.
IPC分类号： G03B41/00
CPC分类号： G03F7/707 , G03F7/70241 , G03F9/70
摘要： Full aperture focus detection apparatus produces an amplified differential signal having a magnitude and a polarity indicative of the extent and direction, relative to the image plane of a projection lens, that a selected portion of the upper surface of a semiconductive wafer is out of focus with respect to that image plane. Lens positioning apparatus moves the projection lens by an amount and in a direction corresponding to the magnitude and polarity of this signal to position the image plane of the projection lens at the selected portion of the upper surface of the semiconductive wafer. A chuck on which the semiconductive wafer is held may be differentially leveled at three selected off-center locations by leveling apparatus so that the chuck may be raised or lowered at any of those locations to position the selected portion of the upper surface of the semiconductive wafer in a plane parallel to the image plane of the projection lens.

8. 发明公开

EP0111661A3 Photometric printing apparatus 失效
公开(公告)号：EP0111661A3
公开(公告)日：1984-09-26
申请号：EP83110142
申请日：1980-03-13
申请人： Optimetrix Corporation
发明人： Phillips, Edward H. , Johannsmeier, Karl-Heinz
IPC分类号： G03B41/00
CPC分类号： G03F9/70
摘要： A photometric printing apparatus including a holder (16) for holding a first object (12) in a first plane; a stage (20) for holding a second object (14) in a second plane (77); a light source unit (24), optically disposed on one side of the holder (16), for illuminating the first object (12); a projection lens (18), optically disposed on the other side of the holder (16) and between the holder (16) and the stage (20), for projecting an image of illuminated portions of the first object (12) onto the second object (14); and control means (25,27), coupled to the stage (20), for moving the stage (20) to facilitate printing of an image of an illuminated portion (160) of the first object (12) at different regions (162) of the second object (14) comprises additionally adjustable mounting means by an indicium disposed on the stage (20) for being positioned in the second plane (77) to facilitate alignment of the image of the first object (12) with respect to one of the axes (X,Y) of motion of the stage (20).

9. 发明公开

EP0035639A3 Friction drive 失效
标题翻译：摩擦驱动
公开(公告)号：EP0035639A3
公开(公告)日：1982-05-26
申请号：EP81100638
申请日：1981-01-29
申请人： Optimetrix Corporation
发明人： Phillips, Edward H.
IPC分类号： F16H13/10 , G01P01/04
CPC分类号： F16H13/10 , Y10T74/19633
摘要： A motor-tachometer (12) rotates a drive shaft (14) rotatably supported on an upper support member (18) that is fixedly secured to a lower support member (40). The drive shaft (14) in turn rotates a compliant rotary member (48) of larger diameter fixedly secured to a driven shaft (36) for rotation therewith. This compliant rotary member (48) is provided with a circular central portion (52) and an annular outer portion (54) coupled together by three springs (56) symmetrically disposed around the periphery of the central portion (52), and is loaded against the drive shaft (14) so that the annular outer portion (54) is eccentrically offset relative to the circular central portion (52) in a radial direction opposite the drive shaft (14). The driven shaft (36) is rotatably supported by the lower support member (40) in engagement with a drive bar (78) for moving a stage (72) on which the upper (18) and lower (40) support members are mounted along the drive bar (78).

10. 发明公开

EP0027570A3 Two stage wafer prealignment system for an optical alignment and exposure machine 失效
标题翻译：光学对准和曝光机的两级抛光预处理系统
公开(公告)号：EP0027570A3
公开(公告)日：1981-11-18
申请号：EP80105862
申请日：1980-09-27
申请人： Optimetrix Corporation
发明人： Phillips, Edward H.
IPC分类号： G03B41/00
CPC分类号： G03F9/7011
摘要： In an optical alignment and exposure machine, particularly suited for printing microelectronic circuit patterns on semi-conductive wafers, two stages of wafer prealignment are performed, In the first stage of prealignment the periphery of the wafer engages three belt-driven rollers which turn the wafer to align a flat edge thereof with two of the rollers. A transfer arm then picks up the prealigned wafer and transfers itto a rotatable chuck on an X-Y addressable work stage. In the second stage of prealignment a pair of alignment members carried by the chuck index with the flat edge of the wafer, and another pair of alignment members carried by the chuck indexes either the center or a rounded edge of the wafer to a predetermined position. An optical alignment system permits rotation of the chuck to align alignment marks on the wafer with respect to projected images of alignment marks on the mask. The addressable work stage carrying the chuck includes apparatus for selectively moving the chuck and wafer into engagement with a stop carried by the work stage for accurately positioning the plane of an emulsion on the wafer with respect to a focal plane of the optical alignment system.

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