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1. 发明申请

US20110303150A1 TWIN-TYPE COATING DEVICE WITH IMPROVED SEPARATING PLATE 审中-公开
公开(公告)号：US20110303150A1
公开(公告)日：2011-12-15
申请号：US13215005
申请日：2011-08-22
申请人： Oliver Heimel , Hans Wolf , Joerg Krempel-Hesse , Frank Fuchs
发明人： Oliver Heimel , Hans Wolf , Joerg Krempel-Hesse , Frank Fuchs
IPC分类号： C23C14/00 , C23C14/34
CPC分类号： C23C14/562 , C03C17/002
摘要： The present invention refers to a coating device for coating of substrates comprising at least two process chambers (1, 2, 3, 4) being disposed adjacent to each other, a separating plate (9) between the two adjacent process chambers, and pumping means (12, 13) for evacuating the process chambers, wherein the separating plate (9) comprises a conduit having at least two ends, one end of which is connected with the pumping means and the other end has at least one suction opening for at least one of the process chambers.

2. 发明申请

US20090194027A1 TWIN-TYPE COATING DEVICE WITH IMPROVED SEPARATING PLATE 审中-公开
标题翻译：具有改进分离板的双型涂层装置
公开(公告)号：US20090194027A1
公开(公告)日：2009-08-06
申请号：US12024813
申请日：2008-02-01
申请人： Oliver Heimel , Hans Wolf , Joerg Krempel-Hesse , Frank Fuchs
发明人： Oliver Heimel , Hans Wolf , Joerg Krempel-Hesse , Frank Fuchs
IPC分类号： C23C16/44 , C23C14/00
CPC分类号： C23C14/562 , C03C17/002
摘要： The present invention refers to a coating device for coating of substrates comprising at least two process chambers (1, 2, 3, 4) being disposed adjacent to each other, a separating plate (9) between the two adjacent process chambers, and pumping means (12, 13) for evacuating the process chambers, wherein the separating plate (9) comprises a conduit having at least two ends, one end of which is connected with the pumping means and the other end has at least one suction opening for at least one of the process chambers.
摘要翻译：本发明涉及一种用于涂覆基材的涂布装置，其包括彼此相邻设置的至少两个处理室（1,2,3,4），位于两个相邻处理室之间的分离板（9）和泵送装置（12,13），用于抽空处理室，其中分离板（9）包括具有至少两个端部的管道，其一端与泵送装置连接，另一端具有至少一个至少一个吸入口其中一个处理室。

3. 发明申请

US20110303151A1 TWIN-TYPE COATING DEVICE WITH IMPROVED SEPARATING PLATE 审中-公开
公开(公告)号：US20110303151A1
公开(公告)日：2011-12-15
申请号：US13215059
申请日：2011-08-22
申请人： Oliver Heimel , Hans Wolf , Joerg Krempel-Hesse , Frank Fuchs
发明人： Oliver Heimel , Hans Wolf , Joerg Krempel-Hesse , Frank Fuchs
IPC分类号： C23C16/50 , C23C16/44 , C23C14/34
CPC分类号： C23C14/562 , C03C17/002
摘要： The present invention refers to a coating device for coating of substrates comprising at least two process chambers (1, 2, 3, 4) being disposed adjacent to each other, a separating plate (9) between the two adjacent process chambers, and pumping means (12, 13) for evacuating the process chambers, wherein the separating plate (9) comprises a conduit having at least two ends, one end of which is connected with the pumping means and the other end has at least one suction opening for at least one of the process chambers.

4. 发明申请

US20110303149A1 TWIN-TYPE COATING DEVICE WITH IMPROVED SEPARATING PLATE 审中-公开
标题翻译：具有改进分离板的双型涂层装置
公开(公告)号：US20110303149A1
公开(公告)日：2011-12-15
申请号：US13214970
申请日：2011-08-22
申请人： Oliver Heimel , Hans Wolf , Joerg Krempel-Hesse , Frank Fuchs
发明人： Oliver Heimel , Hans Wolf , Joerg Krempel-Hesse , Frank Fuchs
IPC分类号： C23C14/00 , C23C14/34 , C23C16/50 , B05C11/00 , C23C16/44
CPC分类号： C23C14/562 , C03C17/002
摘要： The present invention refers to a coating device for coating of substrates comprising at least two process chambers (1, 2, 3, 4) being disposed adjacent to each other, a separating plate (9) between the two adjacent process chambers, and pumping means (12, 13) for evacuating the process chambers, wherein the separating plate (9) comprises a conduit having at least two ends, one end of which is connected with the pumping means and the other end has at least one suction opening for at least one of the process chambers.
摘要翻译：本发明涉及一种用于涂覆基材的涂布装置，其包括彼此相邻设置的至少两个处理室（1,2,3,4），位于两个相邻处理室之间的分离板（9）和泵送装置（12,13），用于抽空处理室，其中分离板（9）包括具有至少两个端部的管道，其一端与泵送装置连接，另一端具有至少一个至少一个吸入口其中一个处理室。

5. 发明申请

US20070240977A1 Sputtering with cooled target 审中-公开
标题翻译：用冷却目标进行溅射
公开(公告)号：US20070240977A1
公开(公告)日：2007-10-18
申请号：US11708661
申请日：2007-02-20
申请人： Joerg Krempel-Hesse , Anke Hellmich , Gerd Orgeich , Thomas Hegemann
发明人： Joerg Krempel-Hesse , Anke Hellmich , Gerd Orgeich , Thomas Hegemann
IPC分类号： C23C14/34
CPC分类号： H01J37/32724 , H01J37/34 , H01J37/3408 , H01J37/3497
摘要： The present invention concerns a device and a method for coating substrates by means of sputtering a coating material in the form of a target, wherein the target is cooled during sputtering by means of a cooling medium fed at the target or past the region of the target or through the target, and the cooling medium has a feed temperature of less than 20° C.
摘要翻译：本发明涉及一种通过溅射靶材形式的涂层材料涂覆基材的装置和方法，其中靶材在溅射期间通过在目标物处供给的冷却介质或经过目标区域而被冷却或通过靶，并且冷却介质具有小于20℃的进料温度。

6. 发明申请

US20080173535A1 Magnetron Sputtering Source, Sputter-Coating Installation, and Method for Coating a Substrate 审中-公开
标题翻译：磁控溅射源，溅射涂布安装以及涂覆基板的方法
公开(公告)号：US20080173535A1
公开(公告)日：2008-07-24
申请号：US11904299
申请日：2007-09-24
申请人： Joerg Krempel-Hesse
发明人： Joerg Krempel-Hesse
IPC分类号： C23C14/35 , C23C14/56
CPC分类号： H01J37/3408 , C23C14/3407 , C23C14/35 , H01J37/3423 , H01J37/3455
摘要： A magnetron sputter source for a sputter-coating installation includes a cathode and a target assigned to the cathode or formed as the cathode. The target provides coating and/or treatment material for the coating and/or treatment of a substrate. Furthermore, the magnetron sputtering source has means for generating a coating plasma and a magnet arrangement for generating a magnetic field for the purpose of influencing the coating plasma such that a plasma channel is generated above a partial section of a surface of the target. The magnet arrangement and the surface of the target are arranged such that they can be moved relative to each other, and the plasma channel is traversable above the surface of the target. The magnetron sputtering source is adjustable such that, when the plasma channel moves over the surface of the target, a duration of exposure of the surface to the plasma is reduced by an increase in a relative velocity (v, v+u) between the magnet arrangement and the target.
摘要翻译：用于溅射涂覆装置的磁控溅射源包括阴极和分配给阴极或形成为阴极的靶。目标提供用于涂覆和/或处理基材的涂层和/或处理材料。此外，磁控管溅射源具有用于产生涂覆等离子体的装置和用于产生磁场以用于影响涂覆等离子体的磁体装置，使得在目标的表面的部分部分之上产生等离子体通道。磁体布置和靶的表面被布置成使得它们可以相对于彼此移动，并且等离子体通道在目标表面之上穿越。磁控溅射源是可调节的，使得当等离子体通道在目标表面上移动时，通过磁体之间的相对速度（v，v + u）的增加来减小表面暴露于等离子体的持续时间安排和目标。

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