专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07830495B2 Lithographic apparatus and position sensor 有权
标题翻译：平版印刷设备和位置传感器
公开(公告)号：US07830495B2
公开(公告)日：2010-11-09
申请号：US11822867
申请日：2007-07-10
申请人： Olaf Hubertus Wilhelmus Van Bruggen , Marcel Koenraad Marie Baggen , Johannes Roland Dassel , Remko Wakker , Stoyan Nihtianov , Frank Auer , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Tom Van Zutphen
发明人： Olaf Hubertus Wilhelmus Van Bruggen , Marcel Koenraad Marie Baggen , Johannes Roland Dassel , Remko Wakker , Stoyan Nihtianov , Frank Auer , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Tom Van Zutphen
IPC分类号： G03B27/42 , G01B7/14
CPC分类号： G03F7/70758 , G01D5/145 , G01D5/2451 , G03F7/70775
摘要： A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.
摘要翻译：具有用于驱动诸如衬底支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备可以设置有测量系统以测量所讨论的支撑件的位置，例如提供安全系统以防止支撑与另一部分的碰撞。测量系统可以被配置为测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度，和/或测量金属层中产生的涡流，屏蔽磁体组件与电感测量产生导致涡流的交变磁场的电磁体，和/或使用位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。

2. 发明申请

US20090015246A1 Lithographic apparatus and position sensor 有权
标题翻译：平版印刷设备和位置传感器
公开(公告)号：US20090015246A1
公开(公告)日：2009-01-15
申请号：US11822867
申请日：2007-07-10
申请人： Olaf Hubertus Wilhelmus Van Bruggen , Frank Auer , Marcel Koenraad Marie Baggen , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Johannes Roland Dassel , Stoyan Nihtianov , Remko Wakker , Tom Van Zutphen
发明人： Olaf Hubertus Wilhelmus Van Bruggen , Frank Auer , Marcel Koenraad Marie Baggen , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Johannes Roland Dassel , Stoyan Nihtianov , Remko Wakker , Tom Van Zutphen
IPC分类号： G03B27/42 , G01B7/14
CPC分类号： G03F7/70758 , G01D5/145 , G01D5/2451 , G03F7/70775
摘要： A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.
摘要翻译：具有用于驱动诸如衬底支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备可以设置有测量系统以测量所讨论的支撑件的位置，例如提供安全系统以防止支撑与另一部分的碰撞。测量系统可以被配置为测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度，和/或测量金属层中产生的涡流，屏蔽磁体组件与电感测量产生导致涡流的交变磁场的电磁体，和/或使用位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。

3. 发明申请

US20130093411A1 CIRCUIT ARRANGEMENT 有权
标题翻译：电路布置
公开(公告)号：US20130093411A1
公开(公告)日：2013-04-18
申请号：US13273251
申请日：2011-10-14
申请人： Benno Koeppl , Frank Auer , Andreas Kiep
发明人： Benno Koeppl , Frank Auer , Andreas Kiep
IPC分类号： G01R19/32 , G01R19/00
CPC分类号： G01R31/2628 , G01K7/01 , G01K2217/00 , G01R21/02 , G01R31/025 , G01R31/42 , H02M1/32 , H02M7/5387
摘要： According to various embodiments, a circuit arrangement is provided which includes a bridge circuit having at least two field effect transistors and a measurement circuit configured to measure a forward voltage of a body diode of any one of the at least two field effect transistors resulting from a predefined current flowing through the field effect transistor.
摘要翻译：根据各种实施例，提供了一种电路装置，其包括具有至少两个场效应晶体管的桥接电路和被配置为测量至少两个场效应晶体管中任一个的体二极管的正向电压的测量电路，流过场效应晶体管的预定电流。

4. 发明授权

US08203317B2 Control parameter adaptation dependent on rotational speed 有权
标题翻译：控制参数适应取决于转速
公开(公告)号：US08203317B2
公开(公告)日：2012-06-19
申请号：US12409991
申请日：2009-03-24
申请人： Frank Auer , Harald Panhofer , Pierre Lefaix
发明人： Frank Auer , Harald Panhofer , Pierre Lefaix
IPC分类号： H02H7/06
CPC分类号： H02P9/48
摘要： A method for controlling an output voltage of generator arrangement includes generating a controlled field current for a field winding dependent on the output voltage and dependent on at least one control parameter that depends on a rotational speed of the generator. The method also includes decreasing a rate of change of the controlled field current with respect to an output voltage change if the rotational speed decrease.
摘要翻译：用于控制发电机装置的输出电压的方法包括根据输出电压产生用于励磁绕组的受控励磁电流，并依赖于取决于发电机转速的至少一个控制参数。该方法还包括如果转速降低，则降低受控场电流相对于输出电压变化的变化率。

5. 发明授权

US08067859B2 Reverse polarity protection for MOSFETs 有权
标题翻译： MOSFET的反极性保护
公开(公告)号：US08067859B2
公开(公告)日：2011-11-29
申请号：US12332849
申请日：2008-12-11
申请人： Benno Koeppl , Karl-Dieter Hein , Frank Auer
发明人： Benno Koeppl , Karl-Dieter Hein , Frank Auer
IPC分类号： H01H35/00 , H02H11/00
CPC分类号： H02H7/0844 , H02H11/002 , H03K17/0822 , H03K2217/0045 , Y10T307/839
摘要： The invention relates to a control circuit and a corresponding method for controlling MOSFETs coupled to the control circuit. The MOSFETs are coupled to a load to couple the load to a power supply, or the MOSFETs are coupled to a generator. In case of inverted polarity, the control circuit switches the MOSFETs to their conducting state to prevent damaging the MOSFETs.
摘要翻译：本发明涉及一种用于控制耦合到控制电路的MOSFET的控制电路和相应的方法。 MOSFET耦合到负载以将负载耦合到电源，或者MOSFET耦合到发电机。在反相极性的情况下，控制电路将MOSFET切换到导通状态，以防止损坏MOSFET。

6. 发明授权

US07084956B2 Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device 有权
标题翻译：支撑装置，光刻设备和使用支撑装置的装置制造方法，以及布置用于支撑装置的位置控制系统
公开(公告)号：US07084956B2
公开(公告)日：2006-08-01
申请号：US10864806
申请日：2004-06-10
申请人： Johannes Adrianus Antonius Theodorus Dams , Frank Auer
发明人： Johannes Adrianus Antonius Theodorus Dams , Frank Auer
IPC分类号： G03B72/42 , G03B27/58 , G03B27/32
CPC分类号： F16F15/02 , G03F7/70833 , G03F7/709 , G03F7/70933
摘要： A supporting device for supporting in a lithographic projection apparatus a supported part relative to a supporting part, is presented. The supporting device includes a first part that engages the supporting part of the lithographic projection apparatus; a second part that engages the supported part of the lithographic projection apparatus; a supporting spring system disposed between the first part and the second part; and a position control system configured to control a position of the supported part. The position control system comprises at least one reference object that is movable relative to the supporting part; a reference support device that supports the reference object relative to the first part, wherein the reference object and the reference support device form a reference mass-spring system; at least one position sensor that detects at least one attribute of the position of the second part relative to at least one of the reference objects, the position sensor including a sensor output for outputting a position signal representing at least one of the attributes; and an actuator, communicatively coupled to the position sensor, that is configured to adjust the position of the second part relative to the first part, in response to the position signal.
摘要翻译：提供了一种用于在光刻投影设备中支撑相对于支撑部件的支撑部件的支撑装置。支撑装置包括接合光刻投影装置的支撑部分的第一部分; 第二部分，其接合所述光刻投影装置的所述支撑部分; 设置在所述第一部分和所述第二部分之间的支撑弹簧系统; 以及位置控制系统，被配置为控制所述被支撑部件的位置。位置控制系统包括可相对于支撑部分移动的至少一个参考对象; 参考支撑装置，其相对于所述第一部件支撑所述参考对象，其中所述参考对象和所述参考支撑装置形成参考质量弹簧系统; 至少一个位置传感器，其相对于所述参考对象中的至少一个检测所述第二部分的位置的至少一个属性，所述位置传感器包括用于输出表示所述属性中的至少一个的位置信号的传感器输出; 以及致动器，其通信地耦合到所述位置传感器，所述致动器被配置为响应于所述位置信号而调节所述第二部分相对于所述第一部分的位置。

7. 发明申请

US20050018160A1 Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device 有权
标题翻译：支撑装置，光刻设备和使用支撑装置的装置制造方法，以及布置用于支撑装置的位置控制系统
公开(公告)号：US20050018160A1
公开(公告)日：2005-01-27
申请号：US10864806
申请日：2004-06-10
申请人： Johannes Adrianus Dams , Frank Auer
发明人： Johannes Adrianus Dams , Frank Auer
IPC分类号： F16F15/023 , F16F15/03 , F16F15/04 , G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： F16F15/02 , G03F7/70833 , G03F7/709 , G03F7/70933
摘要： A supporting device for supporting in a lithographic projection apparatus a supported part relative to a supporting part, is presented. The supporting device includes a first part that engages the supporting part of the lithographic projection apparatus; a second part that engages the supported part of the lithographic projection apparatus; a supporting spring system disposed between the first part and the second part; and a position control system configured to control a position of the supported part. The position control system comprises at least one reference object that is movable relative to the supporting part; a reference support device that supports the reference object relative to the first part, wherein the reference object and the reference support device form a reference mass-spring system; at least one position sensor that detects at least one attribute of the position of the second part relative to at least one of the reference objects, the position sensor including a sensor output for outputting a position signal representing at least one of the attributes; and an actuator, communicatively coupled to the position sensor, that is configured to adjust the position of the second part relative to the first part, in response to the position signal.
摘要翻译：提供了一种用于在光刻投影设备中支撑相对于支撑部件的支撑部件的支撑装置。支撑装置包括接合光刻投影装置的支撑部分的第一部分; 第二部分，其接合所述光刻投影装置的所述支撑部分; 设置在所述第一部分和所述第二部分之间的支撑弹簧系统; 以及位置控制系统，被配置为控制所述被支撑部件的位置。位置控制系统包括可相对于支撑部分移动的至少一个参考对象; 参考支撑装置，其相对于所述第一部件支撑所述参考对象，其中所述参考对象和所述参考支撑装置形成参考质量弹簧系统; 至少一个位置传感器，其相对于所述参考对象中的至少一个检测所述第二部分的位置的至少一个属性，所述位置传感器包括用于输出表示所述属性中的至少一个的位置信号的传感器输出; 以及致动器，其通信地耦合到所述位置传感器，所述致动器被配置为响应于所述位置信号而调节所述第二部分相对于所述第一部分的位置。

8. 发明授权

US08487592B2 Circuit and method for de-energizing a field coil 有权
标题翻译：用于断电励磁线圈的电路和方法
公开(公告)号：US08487592B2
公开(公告)日：2013-07-16
申请号：US12703361
申请日：2010-02-10
申请人： Benno Koeppl , Michael Scheffer , Frank Auer
发明人： Benno Koeppl , Michael Scheffer , Frank Auer
IPC分类号： H02P9/10
CPC分类号： H02P9/02 , H02P9/102
摘要： A circuit includes a first half bridge including a first controllable semiconductor switch and a first diode. The first controllable semiconductor switch is coupled between a first constant supply potential and a center tap of the first half bridge. The first diode is coupled between the center tap and a constant reference potential. A second half bridge includes a second diode and a second controllable semiconductor switch. The second diode is coupled between a second constant potential higher than the first potential and a center tap of the second half bridge. The second controllable semiconductor switch is coupled between the center tap and the constant reference potential. Driver circuitry controls the conducting state of the first and the second semiconductor switch thus controlling the current flow through a field connectable between the center taps.
摘要翻译：电路包括包括第一可控半导体开关和第一二极管的第一半桥。第一可控半导体开关耦合在第一半桥的第一恒定电源电位和中心抽头之间。第一个二极管耦合在中心抽头和恒定的参考电位之间。第二半桥包括第二二极管和第二可控半导体开关。第二二极管耦合在高于第一电位的第二恒定电位和第二半桥的中心抽头之间。第二可控半导体开关耦合在中心抽头和恒定参考电位之间。驱动器电路控制第一和第二半导体开关的导通状态，从而控制通过中心抽头之间可连接的场的电流。

9. 发明授权

US08188658B2 Two-filament lamp 有权
标题翻译：双色灯
公开(公告)号：US08188658B2
公开(公告)日：2012-05-29
申请号：US12448331
申请日：2007-12-10
申请人： Frank Auer , Gerhard Behr , Peter Helbig , Christian Seichter , Klaus Wittmann , Sascha Zelt
发明人： Frank Auer , Gerhard Behr , Peter Helbig , Christian Seichter , Klaus Wittmann , Sascha Zelt
IPC分类号： H01K1/00
CPC分类号： H01K9/08 , H01K1/18 , H01K1/40
摘要： Disclosed is a lamp, particularly for a vehicle headlight, comprising two spiral-wound filaments which are retained by three feeders within a bulb that is inserted into a base. The feeders are arranged on top of one another when the lamp is adequately oriented. A tail of the first spiral-wound filament is connected to a dimming cap, said tail being located at a distance from the base, while a tail of the second spiral-wound filament is connected to the central feeder, said tail being close to the base. The second filament tail that faces away and is located at a distance from the base is connected to the upper feeder. According to the invention, the lower feeder is connected to the dimming cap by means of an end, some sections of which are angled away from a longitudinal axis of the lamp.
摘要翻译：公开了一种灯，特别是用于车辆头灯的灯，包括两个螺旋缠绕的灯丝，其由插入基座的灯泡内的三个馈电器保持。当灯具充分定向时，馈线彼此排列。第一螺旋缠绕灯丝的尾部连接到调光帽，所述尾部位于距离基座一定距离处，而第二螺旋卷绕灯丝的尾部连接到中央供料器，所述尾部接近基础。面向远离位于离基座一定距离的第二丝尾连接到上喂料器。根据本发明，下部进料器通过端部连接到调光盖，其一些部分远离灯的纵向轴线成角度。

10. 发明申请

US20100090578A1 Dipping Cap Comprising A Filament 有权
标题翻译：浸渍盖包括长丝
公开(公告)号：US20100090578A1
公开(公告)日：2010-04-15
申请号：US12448282
申请日：2007-12-05
申请人： Frank Auer , Gerhard Behr , Peter Helbig , Christian Seichter , Klaus Wittmann , Sascha Zelt
发明人： Frank Auer , Gerhard Behr , Peter Helbig , Christian Seichter , Klaus Wittmann , Sascha Zelt
IPC分类号： H01K1/26
CPC分类号： H01K9/08 , H01K1/26
摘要： The invention relates to a dipping cap comprising a filament for a dual-filament lamp. The dimension between an outlet of an outgoing section of the filament, on the side of the base, and the point on the outgoing section of the filament, arranged opposite the outgoing section of the filament on the side of the base and welded to the dipping cap, measures more than approximately 5.2 mm and less than 9.7 mm, and the dimension between the outlet of the outgoing section of the filament, on the side of the base, and the front surface of the dipping cap, which is adjacent to the outgoing section of the filament, welded to the dipping cap, measures more than approximately 5.9 mm and less than 11.9 mm.
摘要翻译：本发明涉及一种浸渍盖，其包括用于双色灯的灯丝。在灯丝的出口部分的出口部分与基部的出口部分之间的尺寸与灯丝的出口部分相对，并且焊接到浸渍部分帽的尺寸大于约5.2mm且小于9.7mm，并且在基部侧的长丝的出口部分的出口与浸渍盖的前表面之间的尺寸与出口焊接到浸渍盖上的细丝部分测量超过约5.9毫米，小于11.9毫米。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式