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1. 发明专利

JPH1157636A CLEANING METHOD 失效
公开(公告)号：JPH1157636A
公开(公告)日：1999-03-02
申请号：JP12963898
申请日：1998-04-23
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： KAWADA KAZUHIKO , NAKAMORI MITSUNORI , OMI TADAHIRO , NITTA TAKEHISA
IPC分类号： B08B3/08 , B08B3/12 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a cleaning method which enables a cleaning treatment at room temperature without heating and small use-amount of a chemical and water and dispenses with a particular device and a particular material. SOLUTION: This cleaning method comprises the first step of performing a cleaning treatment with a pure water containing an ozone, the second step of performing the cleaning treatment with a cleaning fluid containing HF, H2 O and a surfactant while giving a vibration at a frequency of 500 kHz or more, the third step of performing the cleaning treatment with the pure water containing the ozone, the fourth step of performing the cleaning treatment with the cleaning fluid containing HF and H2 O for removing an oxide coat, and the fifth step of performing the cleaning treatment with the pure water.

2. 发明专利

JP2000031109A METHOD OF DRYING 失效
公开(公告)号：JP2000031109A
公开(公告)日：2000-01-28
申请号：JP19348398
申请日：1998-07-08
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： II TOSHIHIRO , OMI TADAHIRO , NITTA TAKEHISA
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To dry a silicon wafer by removing humidity, remove water molecules from a silicon wafer surface having no oxide film, and simultaneously promote hydrogen termination of silicon atoms, by drying the semiconductor with inert gas that contains hydrogen radicals. SOLUTION: Hydrogen is added to inert gas to generate hydrogen radicals by using a heated metallic catalyzer to promote hydrogen termination after the drying. Usable catalyzer has a catalytic effect for the radical generation, for which nickel, platinum or the like are listed; however more preferable one in terms of the catalytic capability is platinum. In using the metallic catalyzer, its form preferably has as large surface area as possible, and a form of filter is preferable to increase effective contact area between the metallic catalyzer and hydrogen. The gas is required to be heated to approximately a temperature of blowing the wafer. The position of drying the wafer is preferably close to the point where the gas has just been released from the metallic catalyzer, because of short lifetime of the irradiating radicals.

3. 发明专利

JPH1157390A GAS RECOVERING DEVICE, EVACUATING METHOD AND EVACUATING DEVICE 失效
公开(公告)号：JPH1157390A
公开(公告)日：1999-03-02
申请号：JP16485298
申请日：1998-06-12
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： SHIRAI YASUYUKI , HASHIMOTO TAIJI , INO KAZUHIDE , OMI TADAHIRO , NITTA TAKEHISA
IPC分类号： B01D53/34 , B01D53/00 , B01D53/04 , B01D53/68 , B01D53/70 , B01D53/81 , B01D53/86 , B01J23/42 , F25J3/06 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To recover a toxic.useful gas so as to utilize it again without wasting by providing an adsorbing cylinder for exhaust gas component adsorption at the down stream of an exhaust line of a chamber, a means for introducing a reaction gas to the upstream of the adsorption cylinder and a cooling cylinder for liquefying and recovering the exhaust gas in the adsorption cylinder. SOLUTION: In the case of liquefying and removing an exhaust gas in an etching process for a silicon wafer, the exhaust gas from a process chamber, after an F2 gas is added, is introduced into a reaction column to be heated at about 300 deg.C and completely allowing the exhaust gas to react with the F2 gas to make the gas capable of being liquefied and recovered. The adsorption and reaction column are provided by 2 lines and one of the lines is alternately connected to an exhaust line. Moreover, after adsorption and reaction column, 3 lines of cooling cylinders are arranged and connected to each other in series and the exhaust gas is cooled to -20 deg.C, -88 deg.C and -150 deg.C in each of the cooling cylinders. The exhaust gas after being cooled is passed through a reaction column using a platinum catalyst for oxidizing carbon monoxide and completely oxidized to make it harmless by adding O2 here under heating.

4. 发明专利

JPH10312990A METHOD AND SYSTEM FOR CHEMICAL REACTION 失效
公开(公告)号：JPH10312990A
公开(公告)日：1998-11-24
申请号：JP12378397
申请日：1997-05-14
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： OMI TADAHIRO , TANAKA NOBUYOSHI , USHIKI TAKEO , SHINOHARA HISAKUNI , NITTA TAKEHISA
IPC分类号： C25D11/32 , C25D21/04 , H01L21/3063 , H01L21/762
摘要： PROBLEM TO BE SOLVED: To prevent a reaction by-product, i.e., gas molecules, from blocking high speed uniform reaction for forming porous silicon by performing a chemical reaction while controlling the concentration of a gas dissolved into the reaction liquid in a reaction tank below an under reaction saturation solubility. SOLUTION: A silicon wafer 200 is brought, on one side thereof, into contact a reaction liquid 201 and, on the other side thereof, to a conductive solution, i.e., an electrolyte 202. A negative voltage is applied to the reaction liquid 201 through a negative electrode 203 and a positive voltage is applied to the conductive solution 202 through a positive electrode 204. A PID cooler/heater or a heat-exchanger is set on a circulation line 210b in order to heat/cool the circulating reaction liquid. Preferably, the heating/cooling is performed to keep the temperature of the reaction liquid 201 in a reaction tank 30 within ±0.5. When the quantity of hydrogen dissolved into the reaction liquid 201 in the reaction tank 30 is observed under that state, it is about 1 ppb or less which is significantly lower than the saturation solubility, i.e., 1 ppm, during anodic formation.

5. 发明专利

JPH10227290A OIL ROTARY PUMP 失效
公开(公告)号：JPH10227290A
公开(公告)日：1998-08-25
申请号：JP28414597
申请日：1997-10-16
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： OMI TADAHIRO , NITTA TAKEHISA
IPC分类号： F04C18/16 , F04C25/02
摘要： PROBLEM TO BE SOLVED: To provide an oil rotary pump with a high exhaust speed in a wide pressure range by removing a foreign matter such as gas component and metal piece or/and a moisture included in the oil in a working oil rotary pump. SOLUTION: This oil rotary pump 101, built in such a structure in a case that a rotor rotates inside a cylinder to which an oil is supplied has an oil circulation mechanism outside the cylinder. The circulation mechanism is constituted by an oil circulation pump 103, a deaeration module 104 and a deaeration monitor 105. The circulation mechanism has a filter and a heat exchanger.

6. 发明专利

JP2000004165A METHOD AND DEVICE FOR PRODUCING CODE BOOK USED FOR VECTOR QUANTIZATION AND RECORDING MEDIUM 失效
公开(公告)号：JP2000004165A
公开(公告)日：2000-01-07
申请号：JP30980898
申请日：1998-10-30
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： OMI TADAHIRO , KOTANI KOJI , NAKADA AKIRA , IMAI MAKOTO , YODA MASAHIRO , MORIMOTO TATSURO , YONEZAWA TAKEMI , NOZAWA TOSHIYUKI , NAKAYAMA TAKAHIRO , FUJIBAYASHI MASANORI , NITTA TAKEHISA
IPC分类号： G10L19/00 , H03M7/30 , H04N7/24 , H04N19/00 , H04N19/126 , H04N19/136 , H04N19/189 , H04N19/196 , H04N19/423 , H04N19/94 , H04N19/98
摘要： PROBLEM TO BE SOLVED: To provide a code book which can handle to various images and has high flexibility by producing a data string by giving respective values which successively change values with desired increment to residual data in the data string with one piece or plural pieces of data in the data string constituting a code vector as reference. SOLUTION: A grouping part 2 performs grouping according to what point is set as an initial point by an initial point setting part. Next, the increment of luminance value between adjacent groups is set by using an increment setting part 3. The part 3 may also be formed by an input device such as a keyboard 3 and a mouse and a user may set optional increment. Also, an initial point luminance value setting part 4 sets the luminance value of an initial point in a block. When necessary information such as the luminance value of the initial point and luminance increment is set, those information are given to a code book producing part 5 and the part 5 produces a code vector.

7. 发明专利

JP2000004164A DEVICE AND METHOD FOR VECTOR QUANTIZATION AND RECORDING MEDIUM 失效
公开(公告)号：JP2000004164A
公开(公告)日：2000-01-07
申请号：JP20836698
申请日：1998-07-23
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： OMI TADAHIRO , KOTANI KOJI , NAKADA AKIRA , IMAI MAKOTO , YODA MASAHIRO , MORIMOTO TATSURO , YONEZAWA TAKEMI , NOZAWA TOSHIYUKI , NAKAYAMA TAKAHIRO , FUJIBAYASHI MASANORI , NITTA TAKEHISA
IPC分类号： H04N19/60 , H03M7/30 , H04N19/126 , H04N19/176 , H04N19/196 , H04N19/423 , H04N19/94 , H04N7/30
摘要： PROBLEM TO BE SOLVED: To decrease the operation quantity for similarity between template vector data and input vector data when vector quantization is performed. SOLUTION: To retrieve a template vector which is similar to the input vector data among pieces of template vector data stored in a template storage device 101, an operation omission decision part 106 compares the feature value of the input vector found by a feature value arithmetic part 105 with the feature value of the template vector stored in a feature quantity storage part 104 and selects the template vector to be retrieved according to the comparison result. Consequently, the amount of operation for finding the similarity between the input vector and template vector is reduced to perform operation for vector quantization fast on the whole.

8. 发明专利

JPH11627A CLEANING LIQUID SUPPLY SYSTEM AND CLEANING LIQUID SUPPLYING METHOD 失效
公开(公告)号：JPH11627A
公开(公告)日：1999-01-06
申请号：JP15624197
申请日：1997-06-13
申请人： URUTORA CLEAN TECHNOL KAIHATSU , BENKAN CORP , OMI TADAHIRO
发明人： TASHIRO KOICHIRO , NITTA TAKEHISA , KIMURA YOSHIRO , OMI TADAHIRO
IPC分类号： B08B3/02 , B08B3/08 , F17D1/08 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To control the pressure variation of a cleaning liquid to be generated by the switching ON/OFF of valves and curb the subsequent generation of a particle from piping by providing a means to control timing for switching ON/OFF a main valve and an auxiliary valve so that the pressure variation of the cleaning liquid to be generated by the switching ON/OFF of the main valve is suppressed. SOLUTION: When switching a main valve 102 from an ON position to an OFF position, a rapid pressure variation is generated in a system preceding the main valve 102 due to the casual switching OFF of the main valve 102. Therefore, first an auxiliary valve 105 is to be switched ON and the main valve 102 is to be switched OFF after the lapse of sufficient time and also the auxiliary valve 105 is to be switched OFF. When switching OFF the auxiliary valve 105, the pressure variation is likewise generated as is in a routine operation, resulting in the generation of a particle. Nevertheless, the particle does not affect the supply line side adversely by setting both valves 102, 105 apart adequately. In addition, it is possible to limit the pressure variation following the switching ON/OFF of the valves to the minimum allowable extent by prolonging time required for the operation to switch ON/OFF the auxiliary valve 105 compared to time required for the same operation of the main valve 102.

9. 发明专利

JPH1022246A CLEANING METHOD 失效
公开(公告)号：JPH1022246A
公开(公告)日：1998-01-23
申请号：JP17529796
申请日：1996-07-04
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： OMI TADAHIRO , NITTA TAKEHISA
IPC分类号： B01D19/00 , B08B3/12 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a cleaning method excellent in removing efficiency of fine particle in which even a substrate having a large area can be cleaned with excellent uniformity without causing any damage onto the substrate. SOLUTION: After a cleaning liquid is degassed to have a total quality of dissolved gas of 5ppm or less, an ultrasonic wave having frequency of 1MHz or above is imparted to the cleaning liquid for the purpose of cleaning thereof. Alternatively, after a cleaning liquid containing a surfactant is degassed to have a total quantity of disproved gas of 5ppm or less, an ultrasonic wave having frequency of 1MHz or above is imparted to the craning liquid for the purpose of cleaning thereof. Steam is employed as the sweep gas of a degassing unit.

10. 发明专利

JPH10328657A STERILIZATION PROCESS FOR ULTRAPURE WATER AND STERILIZED ULTRAPURE WATER SUPPLY SYSTEM 失效
公开(公告)号：JPH10328657A
公开(公告)日：1998-12-15
申请号：JP7727698
申请日：1998-03-25
申请人： OMI TADAHIRO , URUTORA CLEAN TECHNOL KAIHATSU
发明人： OMI TADAHIRO , KAWADA KAZUHIKO , JIZAIMARU TAKAYUKI , NITTA TAKEHISA
IPC分类号： C02F1/36
摘要： PROBLEM TO BE SOLVED: To improve the sterilization effect, by emitting supersonic waves of high frequency to ultrapure water in the middle of an ultrapure water supply line for supplying ultrapure water to a use point using the ultrapure water from a pure water tank for storing the ultrapure water. SOLUTION: Ultrapure water prepared by receiving primary pure water in a pure water tank 1, compression transferring the same by a pump 2 and treating the same by an ultraviolet oxidization device 3, an ion exchange device 4 and an ultrafiltration membrane 5 is used at a use point 6. The use point 6 is not used by a part of the ultrapure water but skipped over, and the ultrawater is passed through a branched line 8 and returned again to the ultrapure water tank 1, and a supersonic emission tank 7a is provided in the middle of an ultrapure water supply line 20 for supplying the ultrapure water to the use point 6, and supersonic waves of high frequency are emitted from the supersonic emission tank 7 to the ultrapure water. Viable bacteria in the ultrapure water can be sterilized efficiently by the arrangement.

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