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1. 发明授权

US06475818B1 Method for fabricating multi-channel array optical device 有权
标题翻译：制造多通道阵列光学器件的方法
公开(公告)号：US06475818B1
公开(公告)日：2002-11-05
申请号：US09498507
申请日：2000-02-04
申请人： O Kyun Kwon , Byueng Su Yoo , Jae Heon Shin , Jong Heob Baek
发明人： O Kyun Kwon , Byueng Su Yoo , Jae Heon Shin , Jong Heob Baek
IPC分类号： G01R3126
CPC分类号： H01L27/1443 , H01L27/1462 , H01L27/14625 , H01L31/0232 , Y10S438/942
摘要： A method for fabricating a multi-channel array optical device having uniform spacing between different wavelengths and for having precise wavelengths by accomplishing wavelength adjustment and by the forming of mirror layers simultaneously through a multi-layer binary mask and a selective oxidization process. This method is especially useful for fabricating multi-channel array optical devices including multi-channel passive filters and multi-channel surface emitting laser arrays. The method includes forming a plurality of semiconductor mirror layers on a semiconductor substrate; forming an oxidization protective layer on the plurality of semiconductor mirror layers; selectively removing the oxidization protective layer by using a binary mask to expose the semiconductor mirror layer which will adjust a wavelength; oxidizing the exposed semiconductor mirror layer.
摘要翻译：一种通过实现波长调整和通过多层二进制掩模和选择性氧化过程同时形成镜层来制造具有不同波长之间具有均匀间隔并且具有精确波长的多通道阵列光学器件的方法。该方法对于制造包括多通道无源滤波器和多通道表面发射激光器阵列的多通道阵列光学器件尤其有用。该方法包括在半导体衬底上形成多个半导体镜层; 在所述多个半导体镜层上形成氧化保护层; 通过使用二元掩模选择性地去除氧化保护层以暴露将调节波长的半导体镜层; 氧化暴露的半导体镜层。

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