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1. 发明专利

JP2011109035A Susceptor, film forming apparatus, and film forming method 有权
标题翻译： SUSCEPTOR，FILM FORMING APPARATUS和FILM FORMING METHOD
公开(公告)号：JP2011109035A
公开(公告)日：2011-06-02
申请号：JP2009265434
申请日：2009-11-20
申请人： Nuflare Technology Inc , Toshiba Corp , 株式会社ニューフレアテクノロジー , 株式会社東芝
发明人： AZUMA SHINYA , HIRATA HIRONOBU
IPC分类号： H01L21/205 , C23C16/458 , H01L21/683
CPC分类号： C30B25/12 , C23C16/4585 , H01L21/68735 , H01L21/68785
摘要： PROBLEM TO BE SOLVED: To provide a susceptor for reducing the sticking or metallic contamination of a wafer, and for achieving uniform temperature distribution and prevention of position deviation of the wafer, and to provide a film forming apparatus and a film forming method for reducing the occurrence of a slip, and for forming a film whose film thickness is uniform. SOLUTION: The outer peripheral section of a silicon wafer 101 is supported by a first susceptor part 102a. A second susceptor 102b is closely fit into the opening of the first susceptor section 102a so that any section other than the outer peripheral section of the silicon wafer 101 can be supported. Also, the second susceptor section 102b is brought into contact with the outer peripheral section of the first susceptor 102a, and arranged so that a clearance 201 with a prescribed interval can be formed between itself and the first susceptor section 102a between the opening and the outer peripheral section. Gas staying in the clearance 201 expanded due to heating is ejected through a hole 202 to a chamber 103. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于减少晶片的粘附或金属污染的基座，并且用于实现均匀的温度分布和防止晶片的位置偏差，并且提供成膜设备和成膜方法用于减少滑动的发生，以及用于形成膜厚均匀的膜。解决方案：硅晶片101的外周部分由第一基座部分102a支撑。第二基座102b紧密地配合到第一基座部102a的开口部，从而可以支撑除了硅晶片101的外周部以外的任何部分。此外，第二感受器部分102b与第一基座102a的外周部分接触，并且布置成使得能够在其与开口和外部的第一感受器部分102a之间形成具有规定间隔的间隙201 外围部分。滞留在由于加热而膨胀的间隙201中的气体通过孔202喷射到室103.版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2011014682A Susceptor, film forming apparatus, and film forming method 有权
标题翻译： SUSCEPTOR，FILM FORMING APPARATUS和FILM FORMING METHOD
公开(公告)号：JP2011014682A
公开(公告)日：2011-01-20
申请号：JP2009156809
申请日：2009-07-01
申请人： Nuflare Technology Inc , Toshiba Corp , 株式会社ニューフレアテクノロジー , 株式会社東芝
发明人： AZUMA SHINYA , HIRATA HIRONOBU
IPC分类号： H01L21/205 , C23C16/44 , H01L21/683
CPC分类号： H01L21/68785 , C23C16/4586 , H01L21/68735
摘要： PROBLEM TO BE SOLVED: To provide a susceptor effective to achieving a uniform temperature distribution of a wafer and to provide a film forming apparatus that can form a film having a uniform thickness while reducing the occurrence of slippage.SOLUTION: The susceptor 102 includes a ring-shaped first susceptor portion 102a for supporting the outer periphery of a silicon wafer 101 and a second susceptor portion 102b provided in contact with the outer periphery of the first susceptor portion 102a and shielding an opening of the first susceptor portion 102a. The second susceptor portion 102b is disposed in such a manner as to form a gap 201 having a predetermined distance H with respect to the silicon wafer 101 with the silicon wafer 101 being supported by the first susceptor portion 102a, and is so disposed as to form a gap 202 that is continuous with the gap 201 and has a distance H' substantially equal to the predetermined distance H with respect to the first susceptor 102a.
摘要翻译：要解决的问题：提供一种有效地实现晶片的均匀温度分布的感受器，并且提供一种可以在减少滑动的发生的同时减少滑动的发生而形成具有均匀厚度的膜的成膜装置。解决方案：基座102包括环形状的第一感受体部分102a，用于支撑硅晶片101的外周边和与第一基座部分102a的外周接触并屏蔽第一基座部分102a的开口的第二基座部分102b。第二感受器部分102b以这样的方式设置，以形成相对于硅晶片101具有预定距离H的间隙201，其中硅晶片101由第一基座部分102a支撑，并且被设置成形成间隙202与间隙201连续，并且具有相对于第一基座102a基本上等于预定距离H的距离H'。

3. 发明专利

JP2009170676A Manufacturing apparatus and manufacturing method for epitaxial wafer 有权
标题翻译：制造设备和制造方法
公开(公告)号：JP2009170676A
公开(公告)日：2009-07-30
申请号：JP2008007448
申请日：2008-01-16
申请人： Nuflare Technology Inc , Toshiba Corp , 株式会社ニューフレアテクノロジー , 株式会社東芝
发明人： AZUMA SHINYA , YANAGISAWA HIROTAKA , MITANI SHINICHI , HIRATA HIRONOBU
IPC分类号： H01L21/205 , C23C16/48
CPC分类号： C23C16/46 , C30B25/10 , C30B25/12
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing apparatus and a manufacturing method for an epitaxial wafer that reduce a temperature difference in a wafer holding section, lower the temperature of an internal heater, and increase temperature uniformity of the wafer to thereby have high productivity. SOLUTION: The manufacturing apparatus comprises a chamber 10, a gas introduction hole 20 provided in the chamber 10 to introduce a reaction gas into the chamber 10, a gas exhaust hole 30 provided in the chamber 10 to discharge the reaction gas, a rotary body unit 70 provided in the chamber 10, a wafer holding portion 50 provided at an upper part of the rotary body unit 70 to hold the wafer 40, the internal heater 100 provided in the rotary body unit 70 and an external heater 120 provided between the rotary body unit 70 and an internal wall 12 of the chamber 10. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于降低晶片保持部的温度差的外延晶片的制造装置和制造方法，降低内部加热器的温度，并且提高晶片的温度均匀性，从而具有生产力高。解决方案：制造装置包括室10，设置在室10中以将反应气体引入室10中的气体引入孔20，设置在室10中以排出反应气体的排气孔30，设置在室10中的旋转体单元70，设置在旋转体单元70的上部以保持晶片40的晶片保持部50，设置在旋转体单元70中的内部加热器100和设置在旋转体单元70内的外部加热器120 旋转体单元70和室10的内壁12.版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2012069689A Film formation apparatus and film formation method 有权
标题翻译：胶片形成装置和胶片形成方法
公开(公告)号：JP2012069689A
公开(公告)日：2012-04-05
申请号：JP2010212541
申请日：2010-09-22
申请人： Nuflare Technology Inc , Toshiba Corp , 株式会社ニューフレアテクノロジー , 株式会社東芝
发明人： DEURA KAORI , AZUMA SHINYA , SUZUKI KUNIHIKO , ITO HIDEKI
IPC分类号： H01L21/205 , C23C16/46 , C30B25/10 , H01L31/10
CPC分类号： C23C16/4584 , C23C16/46 , C30B25/10 , C30B29/403
摘要： PROBLEM TO BE SOLVED: To provide a film formation apparatus which can adjust the temperature distribution of a substrate as desired, and provide a film formation method which can form a film with desired thickness by homogeneously heating the substrate.SOLUTION: A film formation apparatus 100 comprises: a chamber 103; a susceptor 102 which is provided in the chamber 103 and on which a silicon wafer 101 is mounted; a rotation part 104 for rotating the susceptor 102; an inner heater 120 and an outer heater 121 located below the susceptor 102; and a reflector assembly part 105 located below these heaters. The reflector assembly part 105 is formed by combining an annular reflector and a disc-like reflector.
摘要翻译：要解决的问题：提供一种能够根据需要调节基板的温度分布的成膜装置，并且提供可以通过均匀加热基板来形成具有期望厚度的膜的成膜方法。解决方案：成膜装置100包括：室103; 设置在室103中并且安装硅晶片101的基座102; 用于旋转基座102的旋转部104; 位于基座102下方的内部加热器120和外部加热器121; 以及位于这些加热器下面的反射器组件部分105。反射器组件部分105通过组合环形反射器和盘状反射器而形成。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2009260291A Epitaxial wafer manufacturing apparatus and manufacturing method 有权
标题翻译：外延式制造设备和制造方法
公开(公告)号：JP2009260291A
公开(公告)日：2009-11-05
申请号：JP2009059202
申请日：2009-03-12
申请人： Toshiba Corp , 株式会社東芝
发明人： AZUMA SHINYA , AIZAWA MASAFUMI
IPC分类号： H01L21/205 , C23C16/455
CPC分类号： C23C16/4584 , C23C16/4401 , C23C16/45591
摘要： PROBLEM TO BE SOLVED: To provide an epitaxial wafer manufacturing apparatus and manufacturing method with high productivity by improving film deposition rate, gas utilization efficiency, and gas replacement efficiency by suppressing backflow of reaction gas.
SOLUTION: There is provided an epitaxial wafer manufacturing apparatus including: a chamber; a gas introduction port and a gas exhaust port provided in the chamber; a rotating unit provided inside the chamber; a wafer holder provided in an upper portion of the rotating unit and configured to hold a wafer; and an annular flow-regulating wall being spaced from the rotating unit and the wafer holder, surrounding the upper portion of the rotating unit and an upper portion of the wafer holder, and expanding downward, the flow-regulating wall has an upper end being located above the wafer holder, the upper end has a smaller inner diameter than an outer periphery of the wafer holder, the flow-regulating wall has a lower end being located below an upper surface of the rotating unit, and the lower end has a larger inner diameter than an outer periphery of the rotating unit.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：通过抑制反应气体的回流，通过提高成膜速度，气体利用效率和气体替换效率来提供高生产率的外延晶片制造装置和制造方法。解决方案：提供了一种外延晶片制造装置，包括：腔室; 设置在所述室中的气体导入口和排气口; 设置在所述室内的旋转单元; 晶片保持器，设置在所述旋转单元的上部并且被配置为保持晶片; 以及与所述旋转单元和所述晶片保持器间隔开的环形流动调节壁，所述环形流动调节壁围绕所述旋转单元的上部和所述晶片保持器的上部并向下扩张，所述流动调节壁的上端位于在晶片保持器的上方，上端具有比晶片保持器的外周更小的内径，流动调节壁的下端位于旋转单元的上表面下方，下端具有较大的内部直径大于旋转单元的外周。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2007165007A Fuel cell 审中-公开
标题翻译：燃料电池
公开(公告)号：JP2007165007A
公开(公告)日：2007-06-28
申请号：JP2005356299
申请日：2005-12-09
申请人： Toshiba Corp , 株式会社東芝
发明人： NAKAGAWA YASUTADA , YOSHIDA YUICHI , INOUE ATSUO , TERADA TAKAHIRO , AZUMA SHINYA
IPC分类号： H01M8/04 , H01M8/10
CPC分类号： Y02E60/523
摘要： PROBLEM TO BE SOLVED: To provide a fuel cell capable of cutting off effectively supply of fuel when power is not required.
SOLUTION: A shutter part 1 which adjusts the quantity of methanol is provided between a fuel holding part and a power generating part in the fuel cell. Two sheets of perforated plates 12, 13 are provided at the shutter part 11 mutually in parallel. A plurality of holes 15, 14 are respectively formed in matrix form in the perforated plates 12, 13. Then, when the fuel cell is operated to generate power, the perforated plate 13 is positioned at a first position in which the holes 14 and the holes 15 are overlapped with each other. On the other hand, when it is not required to operate the fuel cell to generate power, the perforated plate 13 is moved in diagonal direction to the perforated plate 12, that is, in a third row direction 23 with the third shortest sequence cycle of holes 14, and positioned in a second position. Thereby, the distance between the centers of the holes 14 and holes 15 is made as large as possible.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在不需要动力时能够有效地切断燃料供给的燃料电池。解决方案：在燃料电池中的燃料保持部和发电部之间设置有调节甲醇量的活门部1。两片多孔板12,13相互平行地设置在闸板部分11上。在多孔板12,13中分别以矩阵形式形成多个孔15,14。然后，当燃料电池被操作以产生动力时，多孔板13定位在第一位置，在该第一位置，孔14和孔15彼此重叠。另一方面，当不需要操作燃料电池来产生动力时，多孔板13沿对向的方向移动到多孔板12，即在第三行方向23上，以第三最短顺序循环孔14，并且定位在第二位置。因此，孔14和孔15的中心之间的距离尽可能大。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2006331926A Fuel cell 审中-公开
标题翻译：燃料电池
公开(公告)号：JP2006331926A
公开(公告)日：2006-12-07
申请号：JP2005155724
申请日：2005-05-27
申请人： Toshiba Corp , 株式会社東芝
发明人： AZUMA SHINYA , NAKAGAWA YASUTADA , TERADA TAKAHIRO , YOSHIDA YUICHI
IPC分类号： H01M8/02 , H01M8/10
CPC分类号： H01M8/04201 , H01M8/023 , H01M8/0258 , H01M8/0263 , H01M8/04186 , H01M8/1011 , Y02E60/523
摘要： PROBLEM TO BE SOLVED: To provide a fuel cell of a self-breathing type with equal fuel supply and high-efficiency power generation. SOLUTION: The fuel cell is provided with a fuel supply part having a diffusion part diffusing fuel supplied from a fuel supply port and an open-hole plate with a plurality of openings discharging fuel from the diffusion part, an oxygen guide-in part guiding in oxygen from outside, and a power generating part generating power with fuel supplied from the fuel supply part and oxygen supplied from the oxygen guide-in part. A numerical aperture of the plurality of openings fitted to the open-hole plate has nearly a radial distribution with a narrower aperture near the fuel supply port and a wider aperture away from the fuel supply port. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有相同燃料供应和高效发电的自呼吸型燃料电池。解决方案：燃料电池设置有燃料供给部分，其具有从燃料供给口供给的扩散燃料的扩散部分和具有从扩散部排出燃料的多个开口的露天板，氧气引入从外部引导氧气的部件，以及从燃料供给部供给的燃料和从氧气引入部供给的氧的发电部。安装在露天孔板上的多个开口的数值孔径具有靠近燃料供给口的较窄孔径和远离燃料供给口的较宽的孔径的径向分布。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2008049498A Division device and division method 审中-公开
标题翻译：部门设备和部门方法
公开(公告)号：JP2008049498A
公开(公告)日：2008-03-06
申请号：JP2006225567
申请日：2006-08-22
申请人： Shibaura Mechatronics Corp , Toshiba Corp , 株式会社東芝 , 芝浦メカトロニクス株式会社
发明人： YAMAZAKI HIDEKI , HAYASHI MASAKAZU , AZUMA SHINYA , OE ATSUSHI , YAHAGI SUSUMU
IPC分类号： B28D5/00 , C03B33/07 , C03B33/09
摘要： PROBLEM TO BE SOLVED: To provide a division device for freely adjusting the cut-off amount formed when a substrate to be processed is divided and especially suppressing the cut-off amount, and a division method using it.
SOLUTION: The division device is constituted so that the substrate 60 to be processed comprising a fragile material is locally heated and cooled along a division scheduled line 65 and a crack is formed to the substrate 60 to be processed by the stress caused at this time to divide the substrate 60 to be processed and equipped with a substrate holder 50 for holding the substrate 60 to be processed, a heating part 30 for locally heating the substrate 60 to be processed along the vicinity of the division scheduled line 65 of the substrate 60 to be processed held to a substrate holder 50 and a cooling part 40 for ejecting a cooling fluid C along the region heated by the laser beam LB2 from a laser heating part 30 of the substrate 60 to be processed held to the substrate holder 50. A horizontal distance control mechanism for adjusting the horizontal distance D1 from the division scheduled line 65 on the substrate 60 to be processed to the cooling part 40 is provided to the cooling part 40.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于自由调节当待处理的基板被划分时形成的截止量并且特别地抑制截止量的分割装置，以及使用它的分割方法。解决方案：分割装置构成为使得包含脆性材料的待处理基板60沿分割预定线65局部加热和冷却，并且对基板60形成裂纹，以通过在此时将要处理的基板60分割并配备有用于保持待处理的基板60的基板保持件50，用于局部加热待加工的基板60的加热部30，沿着分割预定线65的附近待处理的基板60保持在基板保持件50上，以及冷却部40，用于沿着由激光束LB2加热的区域，从被处理基板60的激光加热部30向基板保持件50排出冷却流体C. 用于将待处理基板60上的分割预定线65的水平距离D1调整到冷却部40的水平距离控制机构设置到冷却部4 （C）2008，JPO＆INPIT

9. 发明专利

JP2007305486A Fuel cell and electronic apparatus 审中-公开
标题翻译：燃料电池和电子设备
公开(公告)号：JP2007305486A
公开(公告)日：2007-11-22
申请号：JP2006134240
申请日：2006-05-12
申请人： Toshiba Corp , 株式会社東芝
发明人： INOUE ATSUO , NAKAGAWA YASUTADA , YOSHIDA YUICHI , TERADA TAKAHIRO , AZUMA SHINYA
IPC分类号： H01M8/04
CPC分类号： Y02E60/50
摘要： PROBLEM TO BE SOLVED: To provide a fuel cell allowing the remaining quantity of fuel to be readily recognized, and to provide an electronic apparatus.
SOLUTION: A fuel tank 2 of this fuel cell 1 is provided with a window 4 on its front side, and a window 5 on its back side, and a prism 6 is formed on the inside surface of the window 5. A display part 3 is formed on the back side of the fuel tank 2, and regions 7 and 8, having appearances different from each other, are set on the display part 3. Since fuel 100 exists in an optical path passing through the window 4, the prism 6 and the window 5 below a liquid surface 101 of the fuel 100, the optical path reaches the region 7. Since the fuel 100 is not included in the optical path passing through the window 4, however, the prism 6 and the window 5 above the liquid surface 101, the optical path will reach the region 8. As a result, the view from above the liquid surface 101 will be different from the view from below it, and the liquid surface 101 can be readily recognized.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够容易地识别剩余量的燃料的燃料电池，并提供电子设备。解决方案：该燃料电池1的燃料箱2在其前侧设置有窗口4，在其后侧设置有窗口5，并且在窗口5的内表面上形成有棱镜6。显示部分3形成在燃料箱2的后侧，并且具有彼此不同的外观的区域7和8被设置在显示部分3上。由于燃料100存在于通过窗口4的光路中，棱镜6和窗口5在燃料100的液面101下方，光路到达区域7.由于燃料100不包括在通过窗口4的光路中，所以棱镜6和窗口在液面101上方，光路将到达区域8.结果，液面101上方的视图与其下方的视图不同，并且可以容易地识别液面101。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2007257858A Fuel cell 审中-公开
标题翻译：燃料电池
公开(公告)号：JP2007257858A
公开(公告)日：2007-10-04
申请号：JP2006076906
申请日：2006-03-20
申请人： Toshiba Corp , 株式会社東芝
发明人： AZUMA SHINYA , NAKAGAWA YASUTADA , YOSHIDA YUICHI , INOUE ATSUO , TERADA TAKAHIRO
IPC分类号： H01M8/04
CPC分类号： Y02E60/50
摘要： PROBLEM TO BE SOLVED: To provide a fuel cell in which checking of the remaining amount of fuel is easy.
SOLUTION: A display window 7 is provided at the side face of a fuel tank 3 in the fuel cell and an incidence window 8 is provided at the bottom. Further, a light source 5 consisting of an LED is installed at the lower side of the incidence window 8. The region 52 which contacts the display window 7 in the liquid surface 51 of methanol 50 rises toward the display window 7 by the surface tension of the methanol 50. When the light source 5 is turned on in this state, the light L emitted from the light source 5 is transmitted through the incidence window 8 and enters into the methanol 50 and illuminates the liquid surface 51 from the bottom and is reflected sideways in the region 52 and is emitted to the outside of the fuel tank 3 by transmitting through the display window 7. By perceiving this light L, the liquid surface 51 can be recognized easily.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种容易检查剩余燃料量的燃料电池。解决方案：在燃料电池中的燃料箱3的侧面设有显示窗口7，底部设有入口窗口8。此外，由LED构成的光源5安装在入射窗8的下侧。与甲醇50的液面51中的显示窗7接触的区域52由于表面张力朝向显示窗7上升甲醇50.当在这种状态下光源5被接通时，从光源5发射的光L通过入射窗8传播并进入甲醇50并从底部照射液面51并被反射侧面在区域52中，并且通过透过显示窗口7而喷射到燃料箱3的外部。通过感知该光L，可以容易地识别液面51。版权所有（C）2008，JPO＆INPIT

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