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1. 发明授权

US06902868B2 Method of manufacturing integrated circuit 有权
标题翻译：集成电路制造方法
公开(公告)号：US06902868B2
公开(公告)日：2005-06-07
申请号：US10311456
申请日：2001-06-28
申请人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
发明人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
IPC分类号： G03F1/54 , G03F1/56 , G03F1/62 , G03F1/68 , G03F1/70 , G03F7/00 , G03F7/20 , H01L21/027
CPC分类号： G03F1/56 , G03F1/70 , G03F7/0035 , G03F7/70433 , G03F7/707 , H01L21/0274 , Y10S438/942 , Y10S438/945 , Y10S438/948 , Y10S438/95
摘要： In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with a light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.
摘要翻译：为了缩短开发和制造半导体集成电路器件的周期，在通过曝光处理将集成电路图案转印到晶片上时，使用光掩模PM 1，其部分地设置有遮光图案3 除了由金属形成的遮光图案之外还形成有抗蚀剂膜。

2. 发明授权

US06958292B2 Method of manufacturing integrated circuit 有权
标题翻译：集成电路制造方法
公开(公告)号：US06958292B2
公开(公告)日：2005-10-25
申请号：US10364707
申请日：2003-02-12
申请人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
发明人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
IPC分类号： G03F1/54 , G03F1/56 , G03F1/62 , G03F1/68 , G03F1/70 , G03F7/00 , G03F7/20 , H01L21/027 , H01L21/44
CPC分类号： G03F1/56 , G03F1/70 , G03F7/0035 , G03F7/70433 , G03F7/707 , H01L21/0274 , Y10S438/942 , Y10S438/945 , Y10S438/948 , Y10S438/95
摘要： In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.
摘要翻译：为了缩短开发和制造半导体集成电路器件的周期，在通过曝光处理将集成电路图案转印到晶片上时，使用部分地设置有遮光图案3a的光掩模PM 1 由抗蚀剂膜形成，除了由金属形成的遮光图案之外。

3. 发明授权

US06794207B2 Method of manufacturing integrated circuit 有权
标题翻译：集成电路制造方法
公开(公告)号：US06794207B2
公开(公告)日：2004-09-21
申请号：US10364706
申请日：2003-02-12
申请人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
发明人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
IPC分类号： H01L2166
CPC分类号： G03F1/56 , G03F1/70 , G03F7/0035 , G03F7/70433 , G03F7/707 , H01L21/0274 , Y10S438/942 , Y10S438/945 , Y10S438/948 , Y10S438/95
摘要： In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.
摘要翻译：为了缩短开发和制造半导体集成电路器件的周期，在通过曝光处理将集成电路图案转印到晶片上时，使用光掩模PM1，其部分地设置有由除了由金属形成的遮光图案之外的抗蚀剂膜。

4. 发明授权

US06936406B2 Method of manufacturing integrated circuit 有权
公开(公告)号：US06936406B2
公开(公告)日：2005-08-30
申请号：US10364702
申请日：2003-02-12
申请人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
发明人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
IPC分类号： G03F1/54 , G03F1/56 , G03F1/62 , G03F1/68 , G03F1/70 , G03F7/00 , G03F7/20 , H01L21/027
CPC分类号： G03F1/56 , G03F1/70 , G03F7/0035 , G03F7/70433 , G03F7/707 , H01L21/0274 , Y10S438/942 , Y10S438/945 , Y10S438/948 , Y10S438/95
摘要： In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.

5. 发明授权

US06846598B2 Manufacturing method of photomask and photomask 有权
标题翻译：光掩模和光掩模的制造方法
公开(公告)号：US06846598B2
公开(公告)日：2005-01-25
申请号：US10686723
申请日：2003-10-17
申请人： Norio Hasegawa , Toshihiko Tanaka , Joji Okada , Kazutaka Mori , Ko Miyazaki
发明人： Norio Hasegawa , Toshihiko Tanaka , Joji Okada , Kazutaka Mori , Ko Miyazaki
IPC分类号： G03F1/32 , G03F1/38 , G03F1/40 , G03F1/54 , G03F1/56 , G03F1/62 , G03F1/68 , G03F1/80 , G03F7/00 , H01L21/027 , G03F9/00
CPC分类号： G03F1/56 , G03F7/0035
摘要： In order to shorten the time required to change or correct a mask pattern over a mask, light-shielding patterns formed of a resist film for integrated circuit pattern transfer are partly provided over a mask substrate constituting a photomask in addition to light-shielding patterns formed of a metal for the integrated circuit pattern transfer.
摘要翻译：为了缩短在掩模上改变或校正掩模图案所需的时间，除了形成的遮光图案之外，在构成光掩模的掩模基板上部分地设置由用于集成电路图案转印的抗蚀剂膜形成的遮光图案的金属用于集成电路图案转移。

6. 发明授权

US06656644B2 Manufacturing method of photomask and photomask 有权
公开(公告)号：US06656644B2
公开(公告)日：2003-12-02
申请号：US09881701
申请日：2001-06-18
申请人： Norio Hasegawa , Toshihiko Tanaka , Joji Okada , Kazutaka Mori , Ko Miyazaki
发明人： Norio Hasegawa , Toshihiko Tanaka , Joji Okada , Kazutaka Mori , Ko Miyazaki
IPC分类号： G03F900
CPC分类号： G03F1/56 , G03F7/0035
摘要： In order to shorten the time required to change or correct a mask pattern over a mask, light-shielding patterns formed of a resist film for integrated circuit pattern transfer are partly provided over a mask substrate constituting a photomask in addition to light-shielding patterns formed of a metal for the integrated circuit pattern transfer.

7. 发明申请

US20060018866A1 Oil-in-water emulsified composition 审中-公开
标题翻译：油包水乳化组合物
公开(公告)号：US20060018866A1
公开(公告)日：2006-01-26
申请号：US11183965
申请日：2005-07-19
申请人： Kyoko Kawakami , Joji Okada
发明人： Kyoko Kawakami , Joji Okada
IPC分类号： A61K8/44
CPC分类号： A61K8/062 , A61K8/06 , A61K8/37 , A61K8/41 , A61K8/42 , A61K8/63 , A61Q17/04 , A61Q19/00
摘要： An oil-in-water emulsified composition containing; (A) ester oil which is in liquid state at 25° C. (B) sphingosines represented by the formula (1) (wherein, R1 represents hydrocarbon group which may have a substituent; Y represents a methylene group, a methine group or an oxygen atom; X1,X2 and X3 are H, OH or an acetoxy group; X4 represents H, an acetyl group or the like; R2 and R3 are H, OH and the like; R represents H or an amidino group; “a” stands for 2 or 3;) (C) an acid compound selected from the group consisting of inorganic acid or an organic acid having 5 or less carbon atoms, and (D) cholesterol or phytosterol, wherein the ratio of a liquid oil component containing Component (A) in the total amount of oil phase is 5 to 90 wt %.
摘要翻译：一种水包油乳化组合物，含有（A）在25℃处于液态的酯油（B）由式（1）表示的鞘氨醇（其中，R 1表示可以具有取代基的烃基; Y表示亚甲基，次甲基或氧原子; X 1，X 2和X 3是H，OH或乙酰氧基; X H 4表示H，乙酰基等; R 2和R 3均为H，OH等; R表示H或脒基;“a”表示2或3;（C）选自无机酸或碳原子数5以下的有机酸的酸化合物，（D）胆固醇或植物甾醇，其中，含有油相总量的成分（A）的液体油成分为5〜90重量％。

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