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1. 发明申请

US20100108106A1 SUBSTRATE CLEANING APPARATUS 审中-公开
标题翻译：基板清洁装置
公开(公告)号：US20100108106A1
公开(公告)日：2010-05-06
申请号：US12529875
申请日：2008-02-27
申请人： Norikazu Hoshi , Masato Tanaka
发明人： Norikazu Hoshi , Masato Tanaka
IPC分类号： B08B3/00
CPC分类号： B08B3/04 , B08B3/048 , G02F1/1303 , G02F2001/133302
摘要： A chemical solution is mixed to deionized water from a chemical cartridge 29 via a chemical supply unit 27 to produce a treating liquid. Then, the treating liquid is supplied to a treating tank via a supply pipe. The chemical cartridge 29 is not supplemented with the chemical solution through a supplementing line etc., and the chemical solution is not contaminated. As a result, cleanliness of the chemical solution can be kept high, and substrates can be cleaned at a high clean level. Moreover, the chemical cartridge 29 also has a residual quantity display portion 39. Thus a residual quantity of the chemical solution in the chemical cartridge 29 can easily be recognized, and periodic replacement timing of the chemical cartridge 29 can be recognized easily. Furthermore, the chemical cartridge 29 can control the flow rate by a nozzle portion 47. Consequently, the chemical cartridge 29 can directly be attached to the supply pipe, which can simplify the construction and thus can reduce apparatus cost.
摘要翻译：化学溶液通过化学品供应单元27从药物盒29混合到去离子水中以产生处理液。然后，经由供给管将处理液供给到处理槽。化学药剂盒29不通过补充线等补充化学溶液，并且化学溶液不被污染。结果，化学溶液的清洁度可以保持较高，并且可以以高清洁水平清洁基底。此外，化学药盒29也具有残留量显示部39.因此，可以容易地识别化学药剂盒29中的化学溶液的残留量，并且可以容易地识别化学药品盒29的定期更换定时。此外，化学药剂盒29可以通过喷嘴部47来控制流量。因此，药剂盒29可以直接附接到供给管，这可以简化结构，从而可以降低设备成本。

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