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    • 1. 发明授权
    • Diode
    • 二极管
    • US08476673B2
    • 2013-07-02
    • US13296832
    • 2011-11-15
    • Norihito TokuraSatoshi ShirakiShigeki TakahashiShinya SakuraiTakashi Suzuki
    • Norihito TokuraSatoshi ShirakiShigeki TakahashiShinya SakuraiTakashi Suzuki
    • H01L29/861H01L29/747H01L31/107
    • H01L21/76283H01L27/0814H01L27/1203H01L29/0619H01L29/0649H01L29/08H01L29/405H01L29/8611
    • A diode has a semiconductor layer and cathode and anode electrodes on a surface of the semiconductor layer. The semiconductor layer has cathode and anode regions respectively contacting the cathode and anode electrodes. The anode region has a first diffusion region having high surface concentration, a second diffusion region having intermediate surface concentration, and a third diffusion region having low surface concentration. The first diffusion region is covered with the second and third diffusion regions. The second diffusion region has a first side surface facing the cathode region, a second side surface opposite to the cathode region, and a bottom surface extending between the first and second side surfaces. The third diffusion region covers at least one of the first corner part connecting the first side surface with the bottom surface and the second corner part connecting the second side surface with the bottom surface.
    • 二极管在半导体层的表面上具有半导体层和阴极和阳极电极。 半导体层具有分别与阴极和阳极电极接触的阴极和阳极区域。 阳极区域具有表面浓度高的第一扩散区域,具有中间表面浓度的第二扩散区域和具有低表面浓度的第三扩散区域。 第一扩散区被第二和第三扩散区覆盖。 第二扩散区域具有面对阴极区域的第一侧表面,与阴极区域相对的第二侧表面和在第一和第二侧表面之间延伸的底表面。 第三扩散区域覆盖连接第一侧表面与底表面的第一角部和将第二侧表面与底表面连接的第二角部中的至少一个。
    • 2. 发明申请
    • DIODE
    • 二极管
    • US20120139079A1
    • 2012-06-07
    • US13296832
    • 2011-11-15
    • Norihito TOKURASatoshi ShirakiShigeki TakahashiShinya SakuraiTakashi Suzuki
    • Norihito TOKURASatoshi ShirakiShigeki TakahashiShinya SakuraiTakashi Suzuki
    • H01L29/47
    • H01L21/76283H01L27/0814H01L27/1203H01L29/0619H01L29/0649H01L29/08H01L29/405H01L29/8611
    • A diode has a semiconductor layer and cathode and anode electrodes on a surface of the semiconductor layer. The semiconductor layer has cathode and anode regions respectively contacting the cathode and anode electrodes. The anode region has a first diffusion region having high surface concentration, a second diffusion region having intermediate surface concentration, and a third diffusion region having low surface concentration. The first diffusion region is covered with the second and third diffusion regions. The second diffusion region has a first side surface facing the cathode region, a second side surface opposite to the cathode region, and a bottom surface extending between the first and second side surfaces. The third diffusion region covers at least one of the first corner part connecting the first side surface with the bottom surface and the second corner part connecting the second side surface with the bottom surface.
    • 二极管在半导体层的表面上具有半导体层和阴极和阳极电极。 半导体层具有分别与阴极和阳极电极接触的阴极和阳极区域。 阳极区域具有表面浓度高的第一扩散区域,具有中间表面浓度的第二扩散区域和具有低表面浓度的第三扩散区域。 第一扩散区被第二和第三扩散区覆盖。 第二扩散区域具有面对阴极区域的第一侧表面,与阴极区域相对的第二侧表面和在第一和第二侧表面之间延伸的底表面。 第三扩散区域覆盖连接第一侧表面与底表面的第一角部和将第二侧表面与底表面连接的第二角部中的至少一个。
    • 5. 发明授权
    • Semiconductor device having a vertical type semiconductor element
    • 具有垂直型半导体元件的半导体器件
    • US06982459B2
    • 2006-01-03
    • US10634819
    • 2003-08-06
    • Takashi SuzukiTsutomu UesugiNorihito Tokura
    • Takashi SuzukiTsutomu UesugiNorihito Tokura
    • H01L29/76
    • H01L29/7811H01L29/0634H01L29/0696H01L29/7813
    • A vertical type MOS field effect transistor has a super junction structure between a source electrode and an N+-type drain region. The super junction structure is constituted by a plurality of P-type single crystal silicon regions and a plurality of N-type single crystal silicon regions. Each of the plurality of P-type single crystal silicon regions and each of the plurality of N-type single crystal silicon regions are arrayed alternately. The super junction has two parts, that is, a cell forming region where a MOS structure is disposed and a peripheral region located at a periphery of the cell forming region. The source electrode contacts one of the P-type single crystal silicon regions in the peripheral region while disposed away from an end portion of the peripheral region that is located at an outermost in the peripheral region.
    • 垂直型MOS场效应晶体管在源电极和N + +型漏极区之间具有超结结构。 超结结构由多个P型单晶硅区域和多个N型单晶硅区域构成。 多个P型单晶硅区域和多个N型单晶硅区域中的每一个交替排列。 超结具有两部分,即设置MOS结构的电池形成区域和位于电池形成区域周边的周边区域。 源电极接触周边区域中的P型单晶硅区域中的一个,同时远离位于周边区域中最外侧的周边区域的端部设置。
    • 6. 发明授权
    • Semiconductor device having a vertical semiconductor element
    • 具有垂直半导体元件的半导体器件
    • US06639260B2
    • 2003-10-28
    • US10015917
    • 2001-12-17
    • Takashi SuzukiTsutomu UesugiNorihito Tokura
    • Takashi SuzukiTsutomu UesugiNorihito Tokura
    • H01L2976
    • H01L29/7811H01L29/0634H01L29/0696H01L29/7813
    • A vertical type MOS field effect transistor has a super junction structure between a source electrode and an N+-type drain region. The super junction structure is constituted by a plurality of P-type single crystal silicon regions and a plurality of N-type single crystal silicon regions. Each of the plurality of P-type single crystal silicon regions and each of the plurality of N-type single crystal silicon regions are arrayed alternately. The super junction has two parts, that is, a cell forming region where a MOS structure is disposed and a peripheral region located at a periphery of the cell forming region. The source electrode contacts one of the P-type single crystal silicon regions in the peripheral region while disposed away from an end portion of the peripheral region that is located at an outermost in the peripheral region.
    • 垂直型MOS场效应晶体管在源电极和N +型漏极区之间具有超结结构。 超结结构由多个P型单晶硅区域和多个N型单晶硅区域构成。 多个P型单晶硅区域和多个N型单晶硅区域中的每一个交替排列。 超结具有两部分,即设置MOS结构的电池形成区域和位于电池形成区域周边的周边区域。 源电极接触周边区域中的P型单晶硅区域中的一个,同时远离位于周边区域中最外侧的周边区域的端部设置。