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2. 发明授权

US06856395B2 Reflectometer arrangement and method for determining the reflectance of selected measurement locations of measurement objects reflecting in a spectrally dependent manner 有权
标题翻译：用于确定以光谱依赖方式反映的测量对象的选定测量位置的反射率的反射计布置和方法
公开(公告)号：US06856395B2
公开(公告)日：2005-02-15
申请号：US10120863
申请日：2002-04-11
申请人： Rainer Lebert , Ulf Heim , Lutz Aschke , Larissa Juschkin
发明人： Rainer Lebert , Ulf Heim , Lutz Aschke , Larissa Juschkin
IPC分类号： G01N23/203 , G01N21/55
CPC分类号： G01N21/55
摘要： In a reflectometer arrangement and a method for determining the reflectance of selected measurement locations on measurement objects reflecting in a spectrally dependent manner, the object of the invention is to reduce the time for measuring a measurement object with a robust and simple measurement structure to such an extent that compact radiation sources with low output compared to a synchrotron can be used at the site of production or of use of the measurement object to characterize the object characteristics in a manner suited to series production. A measurement beam bundle proceeding from a polychromatically emitting radiation source is directed onto the measurement location of the measurement object sequentially in modified manner by impressing spectral reference reflection characteristics and the radiation reflected from every measurement location is detected integrally. The arrangement and the method can be used with surfaces which reflect in a spectrally dependent manner and which are designed particularly for radiation in the extreme ultraviolet range.
摘要翻译：在以反射光谱依赖的方式反映的测量对象上的所选测量位置的反射率确定的方法中，本发明的目的是将测量对象的测量时间用鲁棒简单的测量结构减少到可以在生产或使用测量对象的场所使用与同步加速器相比具有低产量的紧凑辐射源，以适合于串联生产的方式来表征物体特性。从多色发射辐射源进行的测量光束束通过施加光谱参考反射特性以修改的方式顺序地被引导到测量对象的测量位置，并且从每个测量位置反射的辐射被一体地检测。该装置和方法可以用于以光谱依赖的方式反射并且被特别设计用于在极紫外范围内的辐射的表面。

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