专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090067959A1 Substrate processing apparatus, substrate transfer apparatus, substrate clamp apparatus, and chemical liquid treatment apparatus 审中-公开
标题翻译：基板处理装置，基板输送装置，基板夹紧装置和药液处理装置
公开(公告)号：US20090067959A1
公开(公告)日：2009-03-12
申请号：US11665963
申请日：2007-02-21
申请人： Nobuyuki Takahashi , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
发明人： Nobuyuki Takahashi , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
IPC分类号： H01L21/67
CPC分类号： H01L21/67219 , B24B37/345 , H01L21/6719 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/67766 , H01L21/68707
摘要： The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections (3a, 3b) each for polishing a semiconductor wafer (W), and a swing transporter (7) for transferring the wafer (W). The swing transporter (7) includes a wafer clamp mechanism (112) adapted to clamp the wafer (W), a vertically moving mechanism (104, 106) for vertically moving the wafer clamp mechanism (112) along a frame (102) of a casing of the polishing section (3a), and a swing mechanism (108, 110) for swinging the wafer clamp mechanism (112) about a shaft adjacent to the frame (102).
摘要翻译：本发明涉及能够提高基板处理的节拍时间的基板处理装置。作为基板处理装置的研磨装置包括：用于研磨半导体晶片（W）的多个研磨部（3a，3b）和用于转印晶片（W）的摆动传送装置（7）。摆动传送器（7）包括适于夹紧晶片（W）的晶片夹紧机构（112），用于沿着晶片夹持机构（102）的框架（102）垂直移动的垂直移动机构（104,106）抛光部分（3a）的外壳和用于使晶片夹紧机构（112）围绕与框架（102）相邻的轴摆动的摆动机构（108,110）。

2. 发明申请

US20120193506A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE TRANSFER APPARATUS, SUBSTRATE CLAMP APPARATUS, AND CHEMICAL LIQUID TREATMENT APPARATUS 审中-公开
标题翻译：基板加工装置，基板转印装置，基板夹装置和化学液体处理装置
公开(公告)号：US20120193506A1
公开(公告)日：2012-08-02
申请号：US13404409
申请日：2012-02-24
申请人： Nobuyuki TAKAHASHI , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
发明人： Nobuyuki TAKAHASHI , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
IPC分类号： F16M11/20
CPC分类号： H01L21/67219 , B24B37/345 , H01L21/6719 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/67766 , H01L21/68707
摘要： The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections each for polishing a semiconductor wafer (W), and a swing transporter for transferring the wafer (W). The swing transporter includes a wafer clamp mechanism adapted to clamp the wafer (W), a vertically moving mechanism for vertically moving the wafer clamp mechanism along a frame of a casing of the polishing section, and a swing mechanism for swinging the wafer clamp mechanism about a shaft adjacent to the frame.
摘要翻译：本发明涉及能够提高基板处理的节拍时间的基板处理装置。作为基板处理设备的抛光装置包括用于抛光半导体晶片（W）的多个抛光部分和用于传送晶片（W）的摆动传送器。摆动传送器包括适于夹紧晶片（W）的晶片夹持机构，用于沿着抛光部分的壳体的框架垂直移动晶片夹持机构的垂直移动机构，以及用于使晶片夹紧机构摆动的摆动机构靠近框架的轴。

3. 发明授权

US08087419B2 Substrate holding rotating mechanism, and substrate processing apparatus 有权
标题翻译：基板保持旋转机构，以及基板处理装置
公开(公告)号：US08087419B2
公开(公告)日：2012-01-03
申请号：US13073340
申请日：2011-03-28
申请人： Hiroyuki Kaneko , Takahiro Ogawa , Kenichi Sugita
发明人： Hiroyuki Kaneko , Takahiro Ogawa , Kenichi Sugita
IPC分类号： B08B3/02 , H01L21/68
CPC分类号： H01L21/68728 , B24B37/345 , B24B41/06 , H01L21/67219 , H01L21/68707 , Y10S134/902 , Y10T29/53091 , Y10T29/5313 , Y10T29/53174 , Y10T29/53196
摘要： A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
摘要翻译：使用基板保持旋转机构来保持和旋转待处理的基板。根据本发明的基板保持旋转机构包括至少三个主轴，分别安装在主轴上的用于保持基板周边的夹紧辊，用于使至少一个夹紧辊旋转的旋转装置，至少一个基座部件所述主轴中的至少一个被安装，以及适于允许所述基座构件旋转的旋转机构。

4. 发明申请

US20110168214A1 SUBSTRATE HOLDING ROTATING MECHANISM, AND SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板保持旋转机构和基板处理装置
公开(公告)号：US20110168214A1
公开(公告)日：2011-07-14
申请号：US13073340
申请日：2011-03-28
申请人： Hiroyuki KANEKO , Takahiro Ogawa , Kenichi Sugita
发明人： Hiroyuki KANEKO , Takahiro Ogawa , Kenichi Sugita
IPC分类号： B08B3/00 , H01L21/68
CPC分类号： H01L21/68728 , B24B37/345 , B24B41/06 , H01L21/67219 , H01L21/68707 , Y10S134/902 , Y10T29/53091 , Y10T29/5313 , Y10T29/53174 , Y10T29/53196
摘要： A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
摘要翻译：使用基板保持旋转机构来保持和旋转待处理的基板。根据本发明的基板保持旋转机构包括至少三个主轴，分别安装在主轴上的用于保持基板周边的夹紧辊，用于使至少一个夹紧辊旋转的旋转装置，至少一个基座部件所述主轴中的至少一个被安装，以及适于允许所述基座构件旋转的旋转机构。

5. 发明授权

US07938130B2 Substrate holding rotating mechanism, and substrate processing apparatus 有权
标题翻译：基板保持旋转机构，以及基板处理装置
公开(公告)号：US07938130B2
公开(公告)日：2011-05-10
申请号：US11730309
申请日：2007-03-30
申请人： Hiroyuki Kaneko , Takahiro Ogawa , Kenichi Sugita
发明人： Hiroyuki Kaneko , Takahiro Ogawa , Kenichi Sugita
IPC分类号： B08B3/02
CPC分类号： H01L21/68728 , B24B37/345 , B24B41/06 , H01L21/67219 , H01L21/68707 , Y10S134/902 , Y10T29/53091 , Y10T29/5313 , Y10T29/53174 , Y10T29/53196
摘要： A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
摘要翻译：使用基板保持旋转机构来保持和旋转待处理的基板。根据本发明的基板保持旋转机构包括至少三个主轴，分别安装在主轴上的用于保持基板周边的夹紧辊，用于使至少一个夹紧辊旋转的旋转装置，至少一个基座部件所述主轴中的至少一个被安装，以及适于允许所述基座构件旋转的旋转机构。

6. 发明申请

US20070226992A1 Substrate holding rotating mechanism, and substrate processing apparatus 有权
标题翻译：基板保持旋转机构，以及基板处理装置
公开(公告)号：US20070226992A1
公开(公告)日：2007-10-04
申请号：US11730309
申请日：2007-03-30
申请人： Hiroyuki Kaneko , Takahiro Ogawa , Kenichi Sugita
发明人： Hiroyuki Kaneko , Takahiro Ogawa , Kenichi Sugita
IPC分类号： H05K13/04 , B24B49/00
CPC分类号： H01L21/68728 , B24B37/345 , B24B41/06 , H01L21/67219 , H01L21/68707 , Y10S134/902 , Y10T29/53091 , Y10T29/5313 , Y10T29/53174 , Y10T29/53196
摘要： A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
摘要翻译：使用基板保持旋转机构来保持和旋转待处理的基板。根据本发明的基板保持旋转机构包括至少三个主轴，分别安装在主轴上的用于保持基板周边的夹紧辊，用于使至少一个夹紧辊旋转的旋转装置，至少一个基座部件所述主轴中的至少一个被安装，以及适于允许所述基座构件旋转的旋转机构。

7. 发明授权

US6143732A Sesquiterpene derivatives 失效
标题翻译：倍半萜衍生物
公开(公告)号：US6143732A
公开(公告)日：2000-11-07
申请号：US381273
申请日：1999-09-20
申请人： Kenichi Sugita , Naohiko Hattori
发明人： Kenichi Sugita , Naohiko Hattori
IPC分类号： C07D491/052 , C07D491/10 , C07D491/12 , C07D491/153 , C07F9/6561 , A61K31/407
CPC分类号： C07D491/10 , C07D491/12 , C07F9/6561
摘要： The Sesquiterpene derivatives are useful as antivirus agents, which are shown by the formula: ##STR1## wherein R.sup.1 is hydrogen or halogen; and R.sup.2 is hydrogen, halogen, --OR.sup.7 (wherein R.sup.7 is hydrogen etc.) or --NHR.sup.8 (wherein R.sup.8 is hydrogen etc.) etc., or R.sup.1 and R.sup.2 taken together may form oxo or .dbd.NR.sup.9 (wherein R.sup.9 is hydroxy etc.);R.sup.3 is hydrogen or halogen; R.sup.4 is hydrogen, halogen, --OR.sup.10 (wherein R.sup.10 is hydrogen etc.), or --NHR.sup.11 (wherein R.sup.11 is hydrogen etc.), or R.sup.3 and R.sup.4 taken together may form oxo or .dbd.NR.sup.12 (wherein R.sup.12 is hydroxy etc.) or R.sup.2 and R.sup.4 taken together may form an unsaturated bond or --O--;A is .dbd.NR.sup.5 (wherein R.sup.5 is hydrogen, lower alkyl etc.)R.sup.6 is hydrogen, cyano etc.,X is hydrogen, cyano etc.,Y.sup.1 and Y.sup.2 are both hydrogens, or taken together may form oxo;Z.sup.1 and Z.sup.2 are both hydrogens, or taken together may form oxo, or Z.sup.1 is hydrogen and Z.sup.2 is hydroxy etc.
摘要翻译： PCT No.PCT / JP98 / 00992 Sec。 371 1999年9月20日第 102（e）1999年9月20日PCT PCT 1998年3月11日PCT公布。公开号WO98 / 42714 日期1998年10月1日倍半萜衍生物可用作防病毒剂，其由下式表示：其中R1是氢或卤素; 和R 2是氢，卤素，-OR 7（其中R 7是氢等）或-NHR 8（其中R 8是氢等）等，或者R 1和R 2可以一起形成氧代或= NR 9（其中R 9是羟基等））; R3是氢或卤素; R4是氢，卤素，-OR10（其中R10是氢等）或-NHR11（其中R11是氢等）或R3和R4一起可以形成氧代或= NR12（其中R12是羟基等）或 R 2和R 4一起可以形成不饱和键或-O-; A是= NR5（其中R5是氢，低级烷基等）R6是氢，氰基等，X是氢，氰基等，Y1和Y2都是氢，或者可以一起形成氧代; Z1和Z2都是氢，或者可以一起形成氧代，或Z1是氢，Z2是羟基等。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式