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1. 发明授权

US07052995B2 Process of manufacturing semiconductor device including chemical-mechanical polishing 失效
标题翻译：制造半导体器件的工艺包括化学机械抛光
公开(公告)号：US07052995B2
公开(公告)日：2006-05-30
申请号：US10176666
申请日：2002-06-24
申请人： Nobuhito Katsumura , Yoshiteru Katsumura , Hidemi Sato , Norihiro Uchida , Fumiyuki Kanai
发明人： Nobuhito Katsumura , Yoshiteru Katsumura , Hidemi Sato , Norihiro Uchida , Fumiyuki Kanai
IPC分类号： H01L21/302
CPC分类号： H01L21/7684 , H01L21/31053 , H01L21/3212 , H01L21/76802 , H01L21/76804 , H01L21/76819
摘要： A buried film and a barrier film are polished together using a slurry in which the polishing rate on a substrate material (in particular, silicon oxide), that on a buried-film material (in particular, tungsten) and that on a barrier-film material (in particular, titanium oxide) are substantially equal to one another. This can materialize a buried structure free from any step or steps, at a high polishing rate.
摘要翻译：将掩埋膜和阻挡膜使用其中衬底材料（特别是氧化硅）上的抛光速率，掩埋膜材料（特别是钨）上的抛光速率和阻挡膜上的抛光速率材料（特别是氧化钛）基本上彼此相等。这可以以高抛光速率实现没有任何步骤或步骤的掩埋结构。

2. 发明授权

US08302443B2 Spring manufacturing apparatus 有权
标题翻译：弹簧制造装置
公开(公告)号：US08302443B2
公开(公告)日：2012-11-06
申请号：US12213446
申请日：2008-06-19
申请人： Katsuhide Tsuritani , Norihiro Uchida
发明人： Katsuhide Tsuritani , Norihiro Uchida
IPC分类号： B21F3/02 , B21C1/00
CPC分类号： B21F3/02 , Y10T29/5187
摘要： A spring manufacturing apparatus includes a supporting body which moves in X, Y, and Z-axes directions of a XYZ orthogonal coordinate system representing a moving direction of a wire rod fed from a wire rod feeding unit as a Z-axis. The supporting body is formed with an opening in which the quill is arranged. The supporting body further includes a tool holder for holding a processing tool for processing the wire rod to a spring. The supporting body arranged at the vicinity of the quill is moved to accurately adjust the relative position of the quill and the processing tool, thereby manufacturing a desired spring.
摘要翻译：弹簧制造装置包括：支承体，其以XYZ正交坐标系的X，Y和Z轴方向移动，代表从作为Z轴的线材供给单元供给的线材的移动方向。支撑体形成有布置有羽绒被的开口。支撑体还包括用于保持用于将线材加工成弹簧的加工工具的工具保持器。移动配置在套筒附近的支撑体，精确地调整套筒和加工工具的相对位置，从而制造期望的弹簧。

3. 发明授权

US07999653B2 Plant monitor-control apparatus 有权
标题翻译：工厂监控器
公开(公告)号：US07999653B2
公开(公告)日：2011-08-16
申请号：US11861917
申请日：2007-09-26
申请人： Yoji Kubo , Norihiro Uchida , Yoshifumi Koganemaru
发明人： Yoji Kubo , Norihiro Uchida , Yoshifumi Koganemaru
IPC分类号： G05B19/00
CPC分类号： G05B15/02 , G05B2219/24159 , G05B2219/36542
摘要： A plant monitor-control apparatus includes a control device which controls a to-be-controlled device of a plant, an operation/monitor device which delivers an operation instruction to the plant, operates the plant via the control device and monitors the plant, and a user skill level management device which manages respective user skill levels and determines an operation authority corresponding to each user skill level.
摘要翻译：工厂监视控制装置包括：控制装置的受控设备的控制装置，向工厂传送操作指令的操作/监视装置，经由控制装置操作工厂并监视工厂;以及用户技能水平管理装置，其管理各个用户技能水平并确定与每个用户技能水平相对应的操作权限。

4. 发明申请

US20080033588A1 PLANT MONITOR-CONTROL APPARATUS 有权
标题翻译：植物监测控制装置
公开(公告)号：US20080033588A1
公开(公告)日：2008-02-07
申请号：US11861917
申请日：2007-09-26
申请人： Yoji Kubo , Norihiro Uchida , Yoshifumi Koganemaru
发明人： Yoji Kubo , Norihiro Uchida , Yoshifumi Koganemaru
IPC分类号： G06F19/00
CPC分类号： G05B15/02 , G05B2219/24159 , G05B2219/36542
摘要： A plant monitor-control apparatus includes a control device which controls a to-be-controlled device of a plant, an operation/monitor device which delivers an operation instruction to the plant, operates the plant via the control device and monitors the plant, and a user skill level management device which manages respective user skill levels and determines an operation authority corresponding to each user skill level.
摘要翻译：工厂监视控制装置包括：控制装置的受控设备的控制装置，向工厂传送操作指令的操作/监视装置，经由控制装置操作工厂并监视工厂;以及用户技能水平管理装置，其管理各个用户技能水平并确定与每个用户技能水平相对应的操作权限。

5. 发明授权

US5574247A CVD reactor apparatus 失效
标题翻译： CVD反应器装置
公开(公告)号：US5574247A
公开(公告)日：1996-11-12
申请号：US263323
申请日：1994-06-21
申请人： Eisuke Nishitani , Susmu Tsuzuku , Natsuyo Chiba , Shigeru Kobayashi , Naoyuki Tamura , Norihiro Uchida
发明人： Eisuke Nishitani , Susmu Tsuzuku , Natsuyo Chiba , Shigeru Kobayashi , Naoyuki Tamura , Norihiro Uchida
IPC分类号： H01L21/285 , C23C16/02 , C23C16/44 , C23C16/455 , C23C16/458 , C23C16/48 , C23C16/54 , H01L21/205 , H01L21/31 , C23C16/00
CPC分类号： C23C16/45521 , C23C16/0245 , C23C16/4585 , C23C16/481 , C23C16/54
摘要： A CVD reactor apparatus includes a substrate clamp for clamping a peripheral edge of the front of a substrate disposed in a CVD reactor and, dividing a space in the reactor into a first space adjacent the front of the substrate and a second space adjacent the backside of the substrate. The apparatus also includes a unit for cooling the surface temperature of an inner wall of the reactor to a temperature equal to or less than a deposition lower limit, and a unit for supplying a CVD gas to the first space adjacent the substrate front and supplying an inert gas to the second space adjacent the substrate backside at different pressures and causing a reaction at only the substrate front, a reaction gas monitor and a substrate temperature monitor.
摘要翻译： CVD反应器装置包括用于夹持设置在CVD反应器中的衬底的前部的周边边缘并将反应器中的空间分成邻近衬底前部的第一空间的衬底夹具和邻近衬底前侧的第二空间底物。该装置还包括用于将反应器的内壁的表面温度冷却到等于或小于沉积下限的温度的单元，以及用于将CVD气体供应到邻近基板前部的第一空间并提供惰性气体在不同压力下靠近衬底背面的第二空间并且仅在衬底前部产生反应，反应气体监测器和衬底温度监测器。

6. 发明申请

US20080314110A1 Spring manufacturing apparatus 有权
标题翻译：弹簧制造装置
公开(公告)号：US20080314110A1
公开(公告)日：2008-12-25
申请号：US12213446
申请日：2008-06-19
申请人： Katsuhide Tsuritani , Norihiro Uchida
发明人： Katsuhide Tsuritani , Norihiro Uchida
IPC分类号： B21F35/02
CPC分类号： B21F3/02 , Y10T29/5187
摘要： A spring manufacturing apparatus includes a supporting body which moves in X, Y, and Z-axes directions of a XYZ orthogonal coordinate system representing a moving direction of a wire rod fed from a wire rod feeding unit as a Z-axis. The supporting body is formed with an opening in which the quill is arranged. The supporting body further includes a tool holder for holding a processing tool for processing the wire rod to a spring. The supporting body arranged at the vicinity of the quill is moved to accurately adjust the relative position of the quill and the processing tool, thereby manufacturing a desired spring.
摘要翻译：弹簧制造装置包括：支承体，其以XYZ正交坐标系的X，Y和Z轴方向移动，代表从作为Z轴的线材供给单元供给的线材的移动方向。支撑体形成有布置有羽绒被的开口。支撑体还包括用于保持用于将线材加工成弹簧的加工工具的工具保持器。移动配置在套筒附近的支撑体，精确地调整套筒和加工工具的相对位置，从而制造期望的弹簧。

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