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1. 发明公开

EP3458912A1 EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING 审中-公开
公开(公告)号：EP3458912A1
公开(公告)日：2019-03-27
申请号：EP17798827.6
申请日：2017-05-19
申请人： Nikon Corporation , Flagello, Donis, G. , Williamson, David, M. , Renwick, Stephen, P. , Smith, Daniel, Gene , Binnard, Michael, B.
发明人： FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B5/18

2. 发明申请

WO2017199096A1 EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING 审中-公开
标题翻译：用于密集线图案的EUV光刻系统
公开(公告)号：WO2017199096A1
公开(公告)日：2017-11-23
申请号：PCT/IB2017/000696
申请日：2017-05-19
申请人： NIKON CORPORATION , FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
发明人： FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B5/18
摘要： Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece (156) includes source of EUV radiation (114) : a pattern-source (144) defining ID pattern : an illumination unit (IU) configured to irradiate the pattern-source (144) : and projection optics (PO) configured to optically image, with a reduction factor N>1, the ID pattern on image surface that is optically-conjugate to the ID pattern. Irradiation of the pattern-source (144) can be on-axis or off-axis. While ID pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source (144) can be flat or curved. The IU may include a relay reflector (126). A PO' s reflector may include multiple spatially-distinct reflecting elements (130, 134) aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the ID pattern of the pattern-source (144).
摘要翻译：专门配置成在目标工件（156）上印刷一维线的极紫外（EUV）刻蚀引擎包括EUV辐射源（114）：图案源（144） ID图案;配置为照射图案源（144）的照明单元（IU）;以及被配置为以缩减因子N> 1光学地成像光学共轭的图像表面上的ID图案的投影光学器件（PO）到ID模式。图案源（144）的照射可以是同轴的或离轴的。当ID图案具有第一空间频率时，其光学图像具有第二空间频率，其至少是第一空间频率的两倍。图案源（144）可以是平坦的或弯曲的。 IU可以包括中继反射器（126）。 PO的反射器可以包括聚集地形成这种反射器的多个空间不同的反射元件（130,134）。该引擎被配置为不允许形成空间分辨率基本上等于图案源（144）的ID图案的节距的任何2D图案的光学图像。

3. 发明申请

WO2018208912A2 ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018208912A2
公开(公告)日：2018-11-15
申请号：PCT/US2018/031796
申请日：2018-05-09
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a ID EUV exposure tool that additionally includes (includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

4. 发明申请

WO2018208912A3 ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018208912A3
公开(公告)日：2018-11-15
申请号：PCT/US2018/031796
申请日：2018-05-09
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a ID EUV exposure tool that additionally includes (includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

5. 发明申请

WO2017222919A1 DENSE LINE EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM WITH DISTORTION MATCHING 审中-公开
标题翻译：具有畸变匹配的密集线极紫外光刻系统
公开(公告)号：WO2017222919A1
公开(公告)日：2017-12-28
申请号：PCT/US2017/037786
申请日：2017-06-15
申请人： NIKON CORPORATION , BINNARD, Michael, B.
发明人： BINNARD, Michael, B.
IPC分类号： G03F9/00
摘要： An extreme ultraviolet lithography system (10) that creates a new pattern (330) having a plurality of densely packed parallel lines (332) on a workpiece (22), the system (10) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13B) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22) to create a first stripe (364) of generally parallel lines (332) during a first scan (365); and a control system (24). The workpiece (22) includes an existing pattern (233) that is distorted. The control system (24) selectively adjusts a control parameter during the first scan (365) so that the first stripe (364) is distorted to more accurately overlay the portion of existing pattern (233) positioned under the first stripe (364).
摘要翻译：一种在工件（22）上形成具有多条密集平行线（332）的新图案（330）的极紫外光刻系统（10），所述系统（10）包括图案化元件（16）; 在图案化元件（16）处引导极紫外光束（13B）的EUV照明系统（12）; 投影光学组件（18），其在第一扫描（365）期间引导在工件（22）处衍射离开图案形成元件（16）的远紫外光束以形成大致平行线（332）的第一条带（364） ; 和控制系统（24）。工件（22）包括扭曲的现有图案（233）。控制系统（24）在第一扫描（365）期间选择性地调节控制参数，使得第一条纹（364）变形以更精确地覆盖位于第一条纹（364）下方的现有图案（233）的部分。 / p>

6. 发明申请

WO2010041771A2 PLANAR MOTOR WITH WEDGE SHAPED MAGNETS AND DIAGONAL MAGNETIZATION DIRECTIONS 审中-公开
标题翻译：具有楔形磁铁的平面电机和对角磁化方向
公开(公告)号：WO2010041771A2
公开(公告)日：2010-04-15
申请号：PCT/JP2009/067952
申请日：2009-10-09
申请人： NIKON CORPORATION , BINNARD, Michael, B. , GERY, Jean-Marc
发明人： BINNARD, Michael, B. , GERY, Jean-Marc
IPC分类号： H02K41/03 , H02K1/17
CPC分类号： H02K1/17 , H02K1/278 , H02K41/031 , H02K2201/18
摘要： A planar motor (32) for positioning a stage (44) along a first axis, and along a second axis that is perpendicular to the first axis includes a conductor array (52) and a magnet array (34). The conductor array (52) includes at least one conductor (256). The magnet array (34) is positioned near the conductor array (52) and is spaced apart from the conductor array (52) along a third axis that is perpendicular to the first axis and the second axis. The magnet array (34) includes a first magnet unit (264) having a first diagonal magnet (Dl) with a diagonal magnetization direction (268) that is diagonal to the first axis, the second axis and the third axis. This leads to strong magnetic fields above the magnet array (34) and strong force generation capability. Further, the planar motor (32) provided herein has less stray magnetic fields that extend beyond the magnet array (34) than a comparable prior art planar motor. Moreover, the first magnet unit (264) can include a second diagonal magnet (D2), a third diagonal magnet (D3), and a fourth diagonal magnet (D4) that cooperate to provide a first combined magnetic flux (276) that is somewhat aligned along the third axis in a first flux direction. In this embodiment, each diagonal magnet (Dl) (D2) (D3) (D4) has the diagonal magnetization direction (268) that is diagonal to the first axis, the second axis and the third axis. Moreover, each diagonal magnet (Dl) (D2) (D3) (D4) can be generally triangular wedge shaped and the diagonal magnets (Dl) (D2) (D3) (D4) are arranged together into the shape of a parallelepiped.
摘要翻译：用于沿着第一轴定位台（44）并且沿着垂直于第一轴的第二轴定位的平面马达（32）包括导体阵列（52）和磁体阵列（34）。导体阵列（52）包括至少一个导体（256）。磁体阵列（34）位于导体阵列（52）附近，并且沿着垂直于第一轴线和第二轴线的第三轴线与导体阵列（52）间隔开。磁体阵列（34）包括第一磁体单元（264），第一磁体单元（264）具有与第一轴线，第二轴线和第三轴线对角的具有对角线磁化方向（268）的第一对角磁体（D1）。这导致磁体阵列（34）上方的强磁场和强力产生能力。此外，本文提供的平面电动机（32）具有比可比现有技术的平面电动机更少的超过磁体阵列（34）的杂散磁场。此外，第一磁体单元（264）可以包括第二对角磁体（D2），第三对角线磁体（D3）和第四对角线磁体（D4），其协作以提供稍微有点的第一组合磁通（276）沿着第三轴在第一磁通方向对准。在该实施例中，每个对角线磁体（D1）（D2）（D3）（D4）具有与第一轴线，第二轴线和第三轴线对角的对角线磁化方向（268）。此外，每个对角磁体（D1）（D2）（D3）（D4）可以是大致三角形的楔形，并且对角磁体（D1）（D2）（D3）（D4）被布置成平行六面体形状。

7. 发明申请

WO2013070568A2 SYSTEM AND METHOD FOR CONTROLLING A TEMPERATURE OF A REACTION ASSEMBLY 审中-公开
标题翻译：用于控制反应组件温度的系统和方法
公开(公告)号：WO2013070568A2
公开(公告)日：2013-05-16
申请号：PCT/US2012/063646
申请日：2012-11-06
申请人： NIKON CORPORATION , PHARAND, Michel , MAHADESWARASWAMY, Chetan , BINNARD, Michael, B.
发明人： PHARAND, Michel , MAHADESWARASWAMY, Chetan , BINNARD, Michael, B.
IPC分类号： B01J8/00
CPC分类号： G03F7/70716 , B01J19/0093 , B01J2219/00783 , B01J2219/00873 , G03F7/70758 , G03F7/70858 , G03F7/70875 , H01L21/682
摘要： A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled to the stage (14) and a conductor array (36) that is coupled to the reaction assembly (18); (iv) a temperature adjuster (20); and (v) a control system (22) that selectively controls the temperature adjuster (20). The conductor array (36) includes a set of first zone conductor units (250), and a set of second zone conductor units (252). The temperature adjuster (20) independently adjusts the temperature of the set of first zone conductor units (250), and the set of second zone conductor units (252).
摘要翻译：一种舞台组件（10），包括（i）保持装置（26）的舞台（14）; （ii）与所述载物台（14）间隔开的反应组件（18）; （iii）移动所述载物台（14）的载物台移动器（16），所述载物台移动器（16）包括联接到所述载物台（14）的磁体阵列（38）和导体阵列（36），所述导体阵列反应组件（18）; （iv）温度调节器（20）; 和（v）选择性地控制温度调节器（20）的控制系统（22）。导体阵列（36）包括一组第一区导体单元（250）和一组第二区导体单元（252）。温度调节器（20）独立地调节该组第一区导体单元（250）和该组第二区导体单元（252）的温度。

8. 发明申请

WO2013112761A3 PLANAR MOTOR WITH ASYMMETRICAL CONDUCTOR ARRAYS 审中-公开
公开(公告)号：WO2013112761A3
公开(公告)日：2013-08-01
申请号：PCT/US2013/023023
申请日：2013-01-24
申请人： NIKON CORPORATION , BINNARD, Michael, B. , SHIBAZAKI, Yuichi , WELLS, J., Kyle
发明人： BINNARD, Michael, B. , SHIBAZAKI, Yuichi , WELLS, J., Kyle
IPC分类号： H02K41/02
摘要： A stage assembly (1 0) that moves a device (38) includes a stage mover (1 6) that moves the stage (14) along a first axis and along a second axis. The stage mover (16) includes a magnet assembly (20), and a conductor assembly (22). The conductor assembly (22) includes a plurality of first axis conductor units (24) and a plurality of second axis conductor units (26). The magnet assembly (20) includes a first axis magnet array (28A) and a second axis magnet array (30A). The first axis conductor units (24) are arranged in an alternating fashion with the second axis conductor units (26) along the first axis and along the second axis. The performance of the stage mover (16) can be different in the first and second axes. Either the conductor units (24) (26) and/or the magnet arrays (28A) (30A) can have a different geometry in the first and second axes.

9. 发明申请

WO2012033933A1 PARALLEL LINKAGE AND ACTUATOR MOTOR COIL DESIGNS FOR A TUBE CARRIER 审中-公开
标题翻译：并联连接和执行器电机线圈设计用于管道运输
公开(公告)号：WO2012033933A1
公开(公告)日：2012-03-15
申请号：PCT/US2011/050860
申请日：2011-09-08
申请人： NIKON CORPORATION , BJORK, Matthew, Parker-McCormick , BINNARD, Michael, B. , COAKLEY, Scott
发明人： BJORK, Matthew, Parker-McCormick , BINNARD, Michael, B. , COAKLEY, Scott
IPC分类号： G03F7/20
CPC分类号： F16H21/44 , G03F7/70716 , G03F7/70991 , Y10T74/18944
摘要： A stage apparatus includes at least one tube having a first section and a second section, the first section being coupled to a point of reference. The apparatus also includes at least one magnet, a precision stage, and a tube carrier. The precision stage is positioned at least partially over the at least one magnet, and has a first set of coils. The first set of coils cooperates with the at least one magnet to drive the precision stage. The tube carrier is at least partially positioned over the at least one magnet, and includes an end effector portion arranged to carry the second section, wherein the tube carrier further includes a second set of coils, the second set of coils being supported by the end effector portion and arranged to cooperate with the at least one magnet to control motion of the end effector portion.
摘要翻译：舞台装置包括具有第一部分和第二部分的至少一个管，第一部分耦合到参考点。该装置还包括至少一个磁体，精密级和管载体。精密级至少部分地位于至少一个磁体上，并且具有第一组线圈。第一组线圈与至少一个磁体配合以驱动精密级。管载体至少部分地定位在至少一个磁体上方，并且包括布置成承载第二部分的末端执行器部分，其中管载体还包括第二组线圈，第二组线圈由端部效应器部分并且布置成与所述至少一个磁体配合以控制末端执行器部分的运动。

10. 发明申请

WO2013112759A1 PLANAR MOTOR WITH ASYMMETRICAL MAGNET ARRAYS 审中-公开
标题翻译：平面电机与不对称磁铁阵列
公开(公告)号：WO2013112759A1
公开(公告)日：2013-08-01
申请号：PCT/US2013/023020
申请日：2013-01-24
申请人： NIKON CORPORATION , BINNARD, Michael, B. , SHIBAZAKI, Yuichi , WELLS, J., Kyle
发明人： BINNARD, Michael, B. , SHIBAZAKI, Yuichi , WELLS, J., Kyle
IPC分类号： H02K41/02
CPC分类号： H02K41/031 , G03F7/70758 , H02K2201/18
摘要： A stage assembly (10) that moves a device (38) includes a stage mover (16) that moves the stage (14) along a first axis and along a second axis. The stage mover (16) includes a magnet assembly (20), and a conductor assembly (22). The conductor assembly (22) includes a plurality of first axis conductor units (24) and a plurality of second axis conductor units (26). The magnet assembly (20) includes a first axis magnet array (28A) and a second axis magnet array (30A). The first axis conductor units (24) are arranged in an alternating fashion with the second axis conductor units (26) along the first axis and along the second axis. The performance of the stage mover (16) can be different in the first and second axes. Either the conductor units (24) (26) and/or the magnet arrays (28A) (30A) can have a different geometry in the first and second axes.
摘要翻译：移动装置（38）的台架组件（10）包括使台架（14）沿第一轴线和第二轴线移动的平台移动器（16）。载物台（16）包括磁体组件（20）和导体组件（22）。导体组件（22）包括多个第一轴导体单元（24）和多个第二轴导体单元（26）。磁体组件（20）包括第一轴磁体阵列（28A）和第二轴磁体阵列（30A）。第一轴导体单元（24）沿着第一轴线和第二轴线与第二轴线导体单元（26）交替地布置。在第一和第二轴上，载物台（16）的性能可以不同。导体单元（24）（26）和/或磁体阵列（28A）（30A）可以在第一和第二轴线上具有不同的几何形状。

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