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1. 发明授权

US06190841B1 Pattern forming process and a photosensitive composition 失效
标题翻译：图案形成工艺和光敏组合物
公开(公告)号：US06190841B1
公开(公告)日：2001-02-20
申请号：US09217580
申请日：1998-12-21
申请人： Naoko Kihara , Satoshi Saito , Toru Ushirogouchi
发明人： Naoko Kihara , Satoshi Saito , Toru Ushirogouchi
IPC分类号： G03C556
CPC分类号： G03F7/38 , G03F7/0045 , G03F7/039
摘要： The present invention provides a pattern forming process. The process comprises the following steps. (1) A photosensitive material is prepared by coating a photosensitive composition onto the surface of a substrate. The photosensitive composition comprises the following components: (a) an acid generator which generates an acid when irradiated with actinic radiation, and (b) a compound containing carboxyl groups, which can decompose upon decarboxylation. (2) The photosensitive material is subjected to pattern-wise exposure to actinic radiation, thereby allowing the acid generator (a) to generate an acid in the exposed area. (3) The acid generated in the exposed area is neutralized with a basic compound (c). (4) The carboxyl groups in the carboxyl-group-containing compound (b) in the unexposed area are decarboxylated by applying conditions under which the basic compound (c) can catalyze decarboxylation. (5) The photosensitive material, and composition used in the above process are developed. The basic compound (c) can be introduced in advance into the photosensitive material prepared in step (1). By using such a pattern forming process or a photosensitive composition, a pattern can successfully be formed with high reproducibility without being affected by the environment.
摘要翻译：本发明提供一种图案形成方法。该方法包括以下步骤：（1）通过将光敏组合物涂布在基材的表面上来制备感光材料。光敏组合物包含以下组分：（a）当用光化辐射照射时产生酸的酸产生剂，和（b）含羧基的化合物，其可在脱羧时分解;（2）感光材料经受图案（3）暴露区域产生的酸用碱性化合物（c）中和;（4）羧基基团（A）在酸性发生剂（a）通过施用碱性化合物（c）可以催化脱羧作用的条件，在未曝光区域的含羧基化合物（b）中脱羧。（5）显影在上述方法中使用的感光材料和组合物。基本化合物（c）可以预先引入到步骤（1）中制备的感光材料中。通过使用这种图案形成方法或光敏组合物，可以以不会受环境影响的方式，以高再现性成功地形成图案。

2. 发明授权

US06177229B1 Photosensitive composition 有权
标题翻译：感光组合物
公开(公告)号：US06177229B1
公开(公告)日：2001-01-23
申请号：US09237659
申请日：1999-01-27
申请人： Satoshi Saito , Naoko Kihara , Toru Ushirogouchi
发明人： Satoshi Saito , Naoko Kihara , Toru Ushirogouchi
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/115
摘要： Disclosed is a positive photosensitive composition, comprising an alkali soluble resin having at least some or all of the alkali soluble groups protected by a substituent which can be decomposed by an acid, a compound which generates an acid upon irradiation with an actinic radiation, and a compound which generates water under action of an acid catalyst.
摘要翻译：公开了一种正型光敏组合物，其包含碱溶性树脂，其具有至少部分或全部由可被酸分解的取代基保护的碱溶性基团，在用光化辐射照射时产生酸的化合物，以及在酸催化剂作用下产生水的化合物。

3. 发明授权

US5372914A Pattern forming method 失效
标题翻译：图案形成方法
公开(公告)号：US5372914A
公开(公告)日：1994-12-13
申请号：US36254
申请日：1993-03-24
申请人： Takuya Naito , Osamu Sasaki , Tsukasa Tada , Naoko Kihara , Toru Ushirogouchi , Satoshi Saito , Takashi Jonai , Hirokazu Niki
发明人： Takuya Naito , Osamu Sasaki , Tsukasa Tada , Naoko Kihara , Toru Ushirogouchi , Satoshi Saito , Takashi Jonai , Hirokazu Niki
IPC分类号： G03F7/004 , G03F7/09 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/094 , Y10S430/122
摘要： On a substrate a protective layer is formed which can suppress the diffusion of a contaminant from the substrate. On the protective layer, thus formed, a resin layer is formed. The resin layer comprises a photosensitive composition containing a compound which has a substituent group capable of being decomposed or cross-linked in the presence of an acid, and a compound which can generate an acid when exposed to light. The resin layer is pattern-exposed to light and then baked at a predetermined temperature. The resin layer is developed, whereby the exposed portions of the resin layer are removed or left, thus forming a pattern comprising lines and spaces each having a predetermined width. Each of the lines of the pattern has a cross-section having neither sloped profile nor undercut profile, and the pattern therefore has an improved resolution.
摘要翻译：在基板上形成保护层，其可以抑制污染物从基板的扩散。在形成的保护层上形成树脂层。树脂层包含含有在酸存在下具有能够分解或交联的取代基的化合物的光敏组合物和在暴露于光时可产生酸的化合物。将树脂层图案曝光，然后在预定温度下烘烤。树脂层被显影，由此树脂层的暴露部分被去除或留下，从而形成包括具有预定宽度的线和间隔的图案。图案的每条线具有既不具有倾斜轮廓也不具有底切轮廓的横截面，因此，该花纹具有改进的分辨率。

4. 发明授权

US06197473B1 Photosensitive composition and a pattern forming process using the same 有权
标题翻译：光敏组合物和使用其的图案形成方法
公开(公告)号：US06197473B1
公开(公告)日：2001-03-06
申请号：US09154733
申请日：1998-09-17
申请人： Naoko Kihara , Satoshi Saito , Toru Ushirogouchi
发明人： Naoko Kihara , Satoshi Saito , Toru Ushirogouchi
IPC分类号： G03F7023
CPC分类号： G03F7/0045 , G03F7/022 , Y10S430/106
摘要： The objectives of the present invention are to provide a photosensitive composition having high solubility to organic solvents as well as to alkaline developers or water-base developers of pH 11 or less, and to provide a pattern forming process for obtaining a high-resolution resist pattern. These objectives are achieved by means of a photosensitive composition comprising a compound which is glassy at room temperature and has a cyclic structure with three or more aromatic rings containing an acid-decomposable substituent, and a pattern forming process wherein a photosensitive material using said photosensitive composition is exposed to a light pattern and developed with an aqueous solution of an alkali or with a water-base developer of pH 11 or less.
摘要翻译：本发明的目的是提供一种对有机溶剂以及碱性显影剂或pH11或更低的水基显影剂具有高溶解度的光敏组合物，并提供用于获得高分辨抗蚀剂图案的图案形成方法这些目的通过光敏组合物实现，该组合物包含在室温下为玻璃状的化合物，并且具有带有三个或更多个含有酸可分解取代基的芳环的环状结构，以及图案形成方法，其中使用所述感光组合物暴露于光图案，并用碱的水溶液或pH11或更低的水性显影剂显影。

5. 发明授权

US5348838A Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group 失效
标题翻译：包含碱溶性粘合剂和具有磺酰基的光致酸发生剂的光敏组合物
公开(公告)号：US5348838A
公开(公告)日：1994-09-20
申请号：US921692
申请日：1992-07-30
申请人： Toru Ushirogouchi , Naoko Kihara , Osamu Sasaki , Tsukasa Tada , Takuya Naito , Satoshi Saito
发明人： Toru Ushirogouchi , Naoko Kihara , Osamu Sasaki , Tsukasa Tada , Takuya Naito , Satoshi Saito
IPC分类号： C08G8/28 , C08K5/41 , G03F7/004 , G03C1/492
CPC分类号： C08G8/28 , C08K5/41 , G03F7/0045 , Y10S430/11
摘要： A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.
摘要翻译：感光性组合物包含碱溶性树脂，具有可被酸分解的取代基的化合物，在分解取代基时产生碱溶性基团，或具有能够使碱溶性交联的取代基的化合物（1）表示的曝光时产生酸的化合物：其中R11表示一价有机基团或一价有机基团，其中在引入选自卤素原子，硝基和氰基中的至少一个，R 12，R 13和R 14各自独立地表示氢，卤素原子，硝基，氰基，一价有机基基团或其中引入选自卤素原子，硝基和氰基中的至少一种的一价有机基团。

6. 发明授权

US06280897B1 Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts 失效
标题翻译：光敏组合物，使用其形成图案的方法，以及电子部件的制造方法
公开(公告)号：US06280897B1
公开(公告)日：2001-08-28
申请号：US08997623
申请日：1997-12-23
申请人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
发明人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
IPC分类号： G03F7004
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by — (CH2)m—(m is an integer of 3 to 9), and R14 is a hydrophilic group.
摘要翻译：一种感光性组合物，其含有具有下述通式（1A）表示的重复链段的聚合物和能够通过照射光化辐射而产生酸的化合物。其中，R 11为氢原子，脂肪族烃基，烷氧基基团，卤素原子或氰基，R 12是脂族烃基或环状烯烃，R 13是（a）具有2〜12个碳原子的直链烯烃，环状烯烃或杂环基中的任一种和（ b）由 - （CH 2）m - （m为3〜9的整数）表示的烃基，R 14为亲水性基团。

7. 发明申请

US20050037284A1 Resist composition 有权
标题翻译：抗蚀组成
公开(公告)号：US20050037284A1
公开(公告)日：2005-02-17
申请号：US10937357
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
IPC分类号： G03F7/038 , G03F7/039 , G03C1/76
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译：根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

8. 发明授权

US07119156B2 Resist resin 有权
标题翻译：抵抗树脂
公开(公告)号：US07119156B2
公开(公告)日：2006-10-10
申请号：US10937313
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
IPC分类号： G03F7/04
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译：根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

9. 发明申请

US20050031991A1 Process for producing a semiconductor device 有权
标题翻译：半导体装置的制造方法
公开(公告)号：US20050031991A1
公开(公告)日：2005-02-10
申请号：US10937853
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
IPC分类号： G03F7/038 , G03F7/039 , G03C1/76
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译：根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性均优异的抗蚀剂图案。

10. 发明申请

US20050031990A1 Pattern forming process 有权
标题翻译：图案形成过程
公开(公告)号：US20050031990A1
公开(公告)日：2005-02-10
申请号：US10937577
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
IPC分类号： G03F7/038 , G03F7/039 , G03C1/76
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译：根据本发明，提供了具有特定含桥连键的脂族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性均优异的抗蚀剂图案。

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