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1. 发明专利

JP2000321996A METHOD FOR CORRECTING DEFECT OF DISPLAY SUBSTRATE AND DEFECT CORRECTING DEVICE 失效
公开(公告)号：JP2000321996A
公开(公告)日：2000-11-24
申请号：JP12598499
申请日：1999-05-06
申请人： NTN TOYO BEARING CO LTD
发明人： SHIMIZU SHIGEO
IPC分类号： B05D1/28 , B05C1/02 , B05D7/00 , G02F1/13 , G09F9/00
摘要： PROBLEM TO BE SOLVED: To provide a method for correcting a display substrate which is capable of rapidly applying a high-viscosity paste and allows the continuous coating of several times to several tens times without the replenishment of the paste. SOLUTION: The continuous coating is executed by making a needle 18 as an auxiliary member vertically movable by a sliding part 19 near a needle 17 having a flatly formed front end shape and vertically moving a positioning actuator 15 to adhere the paste to the needle 17, then thrusting the needle 18 to a stopper, upwardly moving the paste near the front end of the needle 17 and to make correction, then lowering the needle 18, supplying the paste to the needle 17 tip, butting the needle 18 against the stopper 16 and upwardly moving the needle to the state of allowing coating again.

2. 发明专利

JP2006221907A PATTERN CORRECTION METHOD 审中-公开
公开(公告)号：JP2006221907A
公开(公告)日：2006-08-24
申请号：JP2005032934
申请日：2005-02-09
申请人： NTN TOYO BEARING CO LTD
发明人： SHIMIZU SHIGEO , YADA YUJI , YAMAZAKI SHIZUKA
IPC分类号： H01J9/50 , G01B5/02 , G01B11/02 , H01J11/02 , H01J11/22 , H01J11/34 , H01J11/36
摘要： PROBLEM TO BE SOLVED: To provide a pattern correction method of which noise is less, and in which a protruding part of the top face of a rib can be removed accurately. SOLUTION: In this pattern correction method, a polishing headpin 41 of which its tip part is contacted with the rear face of an polishing tape 40 is movably installed in the Z direction, a polishing tape head is made to be descended toward a normal top face 55 of the rib 13 from upward, Z coordinates Z1 is detected when the polishing head pin 41 starts moving upward than a reference position, and the protruding part 56 is polished up to the normal top face 55 from upward based on that Z coordinates Z1. Therefore, the noise is less because of using the polishing tape 40. Furthermore, the height Z1 of the normal top face 55 can be detected precisely. COPYRIGHT: (C)2006,JPO&NCIPI

3. 发明专利

JP2002066778A METHOD AND APPARATUS FOR CORRECTING DEFECT 失效
公开(公告)号：JP2002066778A
公开(公告)日：2002-03-05
申请号：JP2000248049
申请日：2000-08-18
申请人： NTN TOYO BEARING CO LTD
发明人： SHIMIZU SHIGEO , YAMANAKA AKIHIRO
IPC分类号： G02F1/13 , B23K26/00 , B23K26/03 , B23K26/06 , B23K26/073 , B23K101/36 , G02F1/133 , G02F1/136 , G02F1/1368 , B23K26/02
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for correcting a defect capable of enhancing correction efficiency by correcting laser welding through a beam waste system. SOLUTION: A laser beam 16 from a laser irradiation mechanism 1 is corrected into a beam waste state with a correcting lens 19. The image of the corrected laser beam 16 is formed through an image formation lens 18 to irradiate the portion of a luminescent spot defect through an objective lens 15, so that electrodes are corrected, or shortcircuited, by laser welding.

4. 发明专利

JP2002042660A CORRECTION METHOD AND DEVICE FOR PATTERN 失效
公开(公告)号：JP2002042660A
公开(公告)日：2002-02-08
申请号：JP2000231247
申请日：2000-07-31
申请人： NTN TOYO BEARING CO LTD
发明人： YAMANAKA AKIHIRO , SHIMIZU SHIGEO
IPC分类号： B05C1/02 , H01J9/50 , H01J11/22 , H01J11/34 , H01J11/36 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a defect correcting method and device capable of correcting even if the width of a rib defect of a flat display is narrow. SOLUTION: The width of a rib defect 21 is widened with a cutting laser 2, and the widened width is coated with correcting paste with a paste coating mechanism 3 to correct the defect.

5. 发明专利

JP2002040385A PATTERN CORRECTION SYSTEM 失效
公开(公告)号：JP2002040385A
公开(公告)日：2002-02-06
申请号：JP2000228712
申请日：2000-07-28
申请人： NTN TOYO BEARING CO LTD
发明人： YAMANAKA AKIHIRO , SHIMIZU SHIGEO
IPC分类号： G02F1/13 , B23K26/03 , B23K26/351 , B23K26/361 , B23K101/36 , B23K26/00 , B23K26/02
摘要： PROBLEM TO BE SOLVED: To provide a pattern correction system capable of correcting in a short time without the need of turning over an LCD panel. SOLUTION: The LCD panel 2 is mounted on an XY axis table 6 and is movable in a horizontal direction. A camera 1 for an inspection is arranged at an upper part and a laser beam source 4 and the camera 5 for observation are arranged inside a case body at a lower part. A defect is inspected by the camera 1 for inspection from the upper part for the LCD panel 2, a laser beam is emitted while observing the defect by the camera 5 for observation from the lower part and thus, the defect is removed.

6. 发明专利

JP2003230861A DEFECT AMENDMENT METHOD AND DEFECT AMENDMENT APPARATUS 审中-公开
公开(公告)号：JP2003230861A
公开(公告)日：2003-08-19
申请号：JP2002032580
申请日：2002-02-08
申请人： NTN TOYO BEARING CO LTD
发明人： SHIMIZU SHIGEO , YAMANAKA AKIHIRO
IPC分类号： G02F1/13 , B05C5/00 , B05C9/12 , B05D1/26 , B05D7/00 , G09F9/00 , H01J9/50 , H01J11/22 , H01J11/34 , H01J11/36 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a defect amendment method and a defect amendment apparatus for carrying out amendment using the circumferential face of a coating probe. SOLUTION: Even if there is an electrode open defect 103 in a wall face of a rib 101 formed on a substrate, the defect can be stably and efficiently amended by identifying the defect 103, pressing and applying a paste 30 adhering to the circumferential face of a coating probe 20 to the identified defect part from the side face, and curing the applied paste 30. COPYRIGHT: (C)2003,JPO

7. 发明专利

JP2003115267A PATTERN CORRECTING METHOD, AND PATTERN CORRECTING DEVICE 审中-公开
公开(公告)号：JP2003115267A
公开(公告)日：2003-04-18
申请号：JP2001306394
申请日：2001-10-02
申请人： NTN TOYO BEARING CO LTD
发明人： YAMANAKA AKIHIRO , SHIMIZU SHIGEO
IPC分类号： H01J9/50 , G09F9/00 , H01J11/12 , H01J11/22 , H01J11/24 , H01J11/26 , H01J11/34 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a pattern correcting method, and a pattern correcting device, capable of performing the optimum correction even through glass, and reducing damage to other function films. SOLUTION: A laser beam from a laser 1 is applied through an objective lens 30 with a corrected PDP glass substrate thickness from the reverse side of a pattern formed surface of a glass substrate 64. Patterns for one picture element are linearly cut by the laser beam passing through the substrate to cut off a discharge electrode. Defects in luminescent spots can thus be corrected without damaging a dielectric layer 63.

8. 发明专利

JP2000052072A DEVICE AND METHOD FOR CORRECTING PATTERNS 失效
公开(公告)号：JP2000052072A
公开(公告)日：2000-02-22
申请号：JP21915098
申请日：1998-08-03
申请人： NTN TOYO BEARING CO LTD
发明人： SARUTA MASAHIRO , SHIMIZU SHIGEO
IPC分类号： G02F1/13 , B23K26/03 , H05K3/22 , B23K26/00 , B23K26/02
摘要： PROBLEM TO BE SOLVED: To carry out proper firing regardless of the dimension of the ratio of a pattern part by deciding a firing condition while radiating a laser light near a paste from the ratio obtained by an image processing mechanism for obtaining the ratio of the area where a pattern part and a paste part in the region irradiated with the laser light are added against the area of a substrate part on which patterns are not formed. SOLUTION: A portion 20 in a substrate, where a paste is applied, is monitored by a CCD camera. The size of a laser light radiation region 21 is decided by a slit mechanism, and the ratio of the area where a pattern part 23 and the paste part 20 in the region 21 are added against the area of a glass part 22 is obtained, so as to decide the radiation energy and the radiation time of the laser light. When the temperature in the region 21 is measured during firing, and the laser light ejecting device and an output control mechanism are fedback, a firing condition can be kept constant. Thereby, the paste is fired by size of the ratio of the pattern part 23, so that high precision correction can be carried out without remaining the distortion on the substrate.

9. 发明专利

JP2002040674A PATTERN CORRECTING DEVICE 失效
公开(公告)号：JP2002040674A
公开(公告)日：2002-02-06
申请号：JP2000230794
申请日：2000-07-31
申请人： NTN TOYO BEARING CO LTD
发明人： YAMANAKA AKIHIRO , SHIMIZU SHIGEO
IPC分类号： G02B5/20 , B08B3/10 , B08B7/00 , B23K26/00 , B23K26/351 , B23K26/361 , G02F1/1343 , G03F7/36 , G03F7/40 , H01J9/50 , H01J11/22 , H01J11/34 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a pattern correcting device which is capable of preventing deterioration in light transmittance by the splashes, when electrodes of short defective parts are removed. SOLUTION: The defective parts, where the patterns of a substrate 7 to be corrected on a Y-axis table 6 are connected to each other, are irradiated with a laser beam from a laser beam source 1, by which the unnecessary portions are cut away and, thereafter, the output of the laser beam source 1 is made smaller and the peripheries of the defective parts are irradiated with this laser, by which the splashes of the unnecessary portions are removed.

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